Richard W Lowery

US Patent:

41697723, Oct 2, 1979

Filed:

Nov 6, 1978

Appl. No.:

5/958124

Inventors:

Richard K. Lowery - Garfield Heights OH
William J. Willis - North Royalton OH

Assignee:

R. O. Hull & Company, Inc. - Cleveland OH

International Classification:

C25D 322

US Classification:

204 55R

Abstract:

An aqueous acidic plating bath for the electrodeposition of a bright zinc deposit on a substrate is disclosed and comprises zinc ions and an amount, sufficient to provide a level and bright deposit, of at least one bath-soluble composition obtained by the reaction of a nitrogen-containing heterocyclic compound with formaldehyde, an epihalohydrin or glycerol halohydrin and at least one amino compound selected from the group consisting of (i) ammonia, (ii) an aliphatic amine, or (iii) an amidine. Additionally, the plating baths of the invention may contain a nitrogen-containing compound obtained by the reaction of ammonia, an aliphatic amine containing at least one primary amine group, or mixtures thereof with one or more epihalohydrins, glycerol halohydrins or mixtures thereof. Thioureas and anionic aromatic sulfonic acids or salts thereof also are contemplated as being useful in the plating baths of the invention. Methods for depositing a bright zinc coating over a wide range of current densities also are described.

US Patent:

42292689, Oct 21, 1980

Filed:

Jul 9, 1979

Appl. No.:

6/055803

Inventors:

Richard K. Lowery - Garfield Heights OH
Thomas W. Starinshak - Berea OH

Assignee:

Rohco, Inc. - Cleveland OH

International Classification:

C25D 322

US Classification:

204 55R

Abstract:

An aqueous acidic plating bath for the electrodeposition of a bright zinc deposit on a substrate is disclosed and comprises zinc ions, and an amount sufficient to provide a level and bright zinc electrodeposit, of a polymeric sulfur-containing compound having the general formula RS(R'O--. sub. n H, or (I) (S[(R'). sub. n H]. sub. 2 (II) wherein R is an alkyl group containing up to about 24 carbon atoms, each R' is independently an alkylene group containing 2 or 3 carbon atoms and each n is independently an integer of from 1 to about 100. Additionally, the plating baths of the invention may contain at least one aromatic carbonyl-containing compound and particularly aromatic aldehydes and aromatic carboxylic acids. Aromatic sulfonic acids and ethylene oxide condensates of such sulfonic acids also are useful in the plating baths of the invention. Other ethylene oxide condensates can be included in the baths including those derived from carboxylic acids, amides, amines, alcohols, phenols and naphthols.