A magnetron with mechanisms for smoothly and continuously adjusting a DC power applied to its targets to compensate for the changes in the sputtering characteristics of the targets that occur with target aging. A magnetron according to the present teachings includes a set of concentric targets for sputtering a film onto a wafer in response to an AC power and a DC power applied to the targets and a power controller that adjusts the DC power. The adjustments to the DC power enable the magnetron to maintain uniformity in the thicknesses of films formed with the magnetron throughout the life of its targets.
Kendra J. Gallup - Marina del Rey CA, US Frank S. Geefay - Cupertino CA, US Ronald Shane Fazzio - Loveland CO, US Martha Johnson - Greeley CO, US Carrie Ann Guthrie - Fort Collins CO, US Tanya Jegeris Snyder - Edna MN, US Richard C. Ruby - Menlo Park CA, US
Assignee:
Agilent Technologies, Inc. - Palo Alto CA
International Classification:
H01L023/495
US Classification:
257678, 257684, 257704, 257778, 257779
Abstract:
A wafer-level package includes a first wafer comprising a bonding pad, an optoelectronic device on the first wafer, and a second wafer comprising a gasket. The second wafer is attached to the first wafer by a bond between the gasket and the bonding pad.
Kendra J. Gallup - Marina del Rey CA, US Frank S. Geefay - Cupertino CA, US Ronald Shane Fazzio - Loveland CO, US Martha Johnson - Graeley CO, US Carrie Ann Guthrie - Fort Collins CO, US Tanya Jegeris Snyder - Edna MN, US Richard C. Ruby - Menlo Park CA, US
In an embodiment, the invention provides a method for forming a wafer-level package. A bonding pad is formed on a first wafer. After forming the bonding pad, an optoelectronic device is located on the first wafer. A gasket is formed on a second wafer. After a gasket is formed on a second wafer, the second wafer is attached to the first wafer with a bond between the gasket and the bonding pad.
Yury Oshmyansky - Camarillo CA, US Sergey Mishin - Goleta CA, US Richard Ruby - Menlo Park CA, US John Larson - Palo Alto CA, US
International Classification:
C23C014/34
US Classification:
204/298180, 204/298170, 204/298190
Abstract:
A magnetron with mechanisms for controlling the magnetic field that acts on its targets in such a manner as to provide control over erosion patterns and independent control of stress, uniformity, deposition rate, and coupling coefficient of a deposited film. A magnetron according to the present teachings includes a set of targets each for eroding a material for deposition onto a wafer contained in the magnetron and a mechanism for adjusting a racetrack position on each target. The racetrack position defines the areas of the targets from which a predominant amount of the material is eroded. The control of racetrack position enables precise control of erosion characteristics and control over stress, uniformity, deposition rate, and coupling coefficient.
Richard Ruby, Pang's former boss at Avago attended a conference in China in late 2001 and toured the new Tianjin lab created by the defendants, according to the indictment. During that tour, Ruby recognized technology stolen from Avago and confronted Wei Pang and Jingpin Chen, a college dean.
Les Lawrence, Theresa Vickers, Donna Harrell, Diane Debord, James Brandt, Anna Ordean, William Abell, Rose Thompson, Charles Sprague, Betty Smith, Nancy Musser, Nadine Long