Robert L Allison

US Patent:

8303172, Nov 6, 2012

Filed:

Dec 16, 2010

Appl. No.:

12/969834

Inventors:

Paul Zei - Burlingame CA, US
Bryant Lin - Menlo Park CA, US
Robert C. Allison - Rancho Palos Verdes CA, US
Kenneth Carr - Woolwich ME, US

International Classification:

G01J 5/10
A61B 5/01

US Classification:

374122, 374120, 374163, 600407, 600549, 600474, 702131

Abstract:

The disclosure relates to methods and devices for monitoring e. g. , fatigue levels by measuring a subject's body core temperature. In one embodiment, microwave radiometry is used to measure such core temperature.

US Patent:

53386302, Aug 16, 1994

Filed:

Nov 18, 1993

Appl. No.:

8/154603

Inventors:

Euisik Yoon - Sunnyvale CA
Robert W. Allison - San Jose CA
Ronald P. Kovacs - Mountain View CA

Assignee:

National Semiconductor Corporation - Santa Clara CA

International Classification:

G03C 500
H01L 2100
G01R 3126

US Classification:

430 30

Abstract:

A method of and apparatus for processing semiconductor wafers which include observing optical characteristics of exposed undeveloped photoresist, without removing the wafers from the stepper is disclosed. The present invention includes the steps of loading a wafer having a layer of photoresist into a photolithography system, exposing the photoresist in accordance with an initial set of control parameters including exposure time, position of the wafer within the photolithography system, and/or focus change. Prior to developing the photoresist, optical characteristics of the exposed photoresist are observed using a phase contrast microscope which detects latent images. Then, according to the observations of the latent image, the initial set of control parameters are adjusted to generate a second set of control parameters.

US Patent:

52831418, Feb 1, 1994

Filed:

Mar 5, 1992

Appl. No.:

7/846590

Inventors:

Euisik Yoon - Sunnyvale CA
Robert W. Allison - San Jose CA
Ronald P. Kovacs - Mountain View CA

Assignee:

National Semiconductor - Santa Clara CA

International Classification:

G03C 500
H01L 2100
G01R 3126

US Classification:

430 30

Abstract:

A method of and apparatus for processing semiconductor wafers which include observing optical characteristics of exposed undeveloped photoresist, without removing the wafers from the stepper is disclosed. The present invention includes the steps of loading a wafer having a layer of photoresist into a photolithography system, exposing the photoresist in accordance with an initial set of control parameters including exposure time, position of the wafer within the photolithography system, and/or focus change. Prior to developing the photoresist, optical characteristics of the exposed photoresist are observed using a phase contrast microscope which detects latent images. Then, according to the observations of the latent image, the initial set of control parameters are adjusted to generate a second set of control parameters.

US Patent:

20160324567, Nov 10, 2016

Filed:

Mar 7, 2016

Appl. No.:

15/063380

Inventors:

- Santa Clara CA, US
Josef Vincent Koblish - Sunnyvale CA, US
John F. McCarthy - Newbury NH, US
Robert Chris Allison - Rancho Palos Verdes CA, US

Assignee:

Meridian Medical Systems, LLC - Portland ME

International Classification:

A61B 18/12
A61B 18/02
A61B 18/14

Abstract:

According to some embodiments, systems for energy delivery to targeted tissue comprise a catheter with an ablation member, a radiometer configured to detect temperature data from the targeted tissue, a processor configured to determine a calculated temperature (e.g., an extreme temperature, such as a peak or trough temperature) within the tissue by applying at least one factor to the temperature data detected by the radiometer, the processor configured to compare the calculated temperature to a setpoint and an energy source configured to energize the ablation member and to regulate delivery of ablative energy to the targeted tissue of the subject based at least in part on the comparison. In some embodiments, the factor depends on at least one characteristic of the targeted tissue. Information regarding a tissue characteristic can be provided using information from an imaging set (e.g., intracardiac echo) or an electrical signal of the subject (e.g., electrocardiogram).

US Patent:

20150105765, Apr 16, 2015

Filed:

May 22, 2014

Appl. No.:

14/285337

Inventors:

- Santa Clara CA, US
Josef Vincent Koblish - Sunnyvale CA, US
John F. McCarthy - Newbury NH, US
Robert Chris Allison - Rancho Palos Verdes CA, US

Assignee:

Advanced Cardiac Therapeutics, Inc. - Santa Clara CA
Meridian Medical Systems, LLC - Portland ME

International Classification:

A61B 18/12
A61B 18/14

US Classification:

606 34

Abstract:

According to some embodiments, systems for energy delivery to targeted tissue comprise a catheter with an ablation member, a radiometer configured to detect temperature data from the targeted tissue, a processor configured to determine a calculated temperature (e.g., an extreme temperature, such as a peak or trough temperature) within the tissue by applying at least one factor to the temperature data detected by the radiometer, the processor configured to compare the calculated temperature to a setpoint and an energy source configured to energize the ablation member and to regulate delivery of ablative energy to the targeted tissue of the subject based at least in part on the comparison. In some embodiments, the factor depends on at least one characteristic of the targeted tissue. Information regarding a tissue characteristic can be provided using information from an imaging set (e.g., intracardiac echo) or an electrical signal of the subject (e.g., electrocardiogram).