Robert F Howe

US Patent:

7562898, Jul 21, 2009

Filed:

Oct 18, 2007

Appl. No.:

11/907845

Inventors:

Bill Hand - Pleasanton CA, US
Robert Howe - Danville CA, US

International Classification:

B62B 1/18

US Classification:

280653, 280 4718, 280 4731, 298 3

Abstract:

A storage and work place apparatus used in conjunction with a wheelbarrow or similar item. The apparatus includes an housing having a bottom portion and a side portion extending outwardly to form a open chamber the bottom portion is intended to a lie atop a wheelbarrow a cover is used in conjunction with the open chamber and is hinged attached to the housing in order to extend laterally from the housing. At least a first leg attainably connects to the housing and extends outwardly to contact a ground surface adjacent the wheel barrow. At least a second leg is rotatable attached to the cover and also extends outwardly therefrom to support the cover above the ground surface when the leg contacts the ground surface.

US Patent:

7988181, Aug 2, 2011

Filed:

Jun 1, 2009

Appl. No.:

12/457068

Inventors:

William Hand - Pleasanton CA, US
Robert Howe - Danville CA, US

International Classification:

B62B 1/18

US Classification:

280653, 280 4718, 280 4731, 298 3

Abstract:

A storage and work place apparatus used in conjunction with a wheelbarrow or similar item. The apparatus includes a housing having a bottom portion and a side portion extending outwardly to form an open chamber the bottom portion is intended to a lie atop a wheelbarrow a cover is used in conjunction with the open chamber and is hingedly or slidingly attached to the housing in order to extend laterally from the housing. At least a first leg attainably connects to the housing and extends outwardly to contact a ground surface adjacent the wheel barrow. At least a second leg is rotatable attached to the cover and also extends outwardly therefrom to support the cover above the ground surface when the leg contacts the ground surface.

US Patent:

39855090, Oct 12, 1976

Filed:

Feb 13, 1976

Appl. No.:

5/657789

Inventors:

Elmer Trone - Benecia CA
Robert Leslie Howe - Livermore CA

Assignee:

Varian Associates - Palo Alto CA

International Classification:

G01N 3112

US Classification:

23254EF

Abstract:

A flame ionization detector including means for monitoring the flame condition, so as to enable ignition of an extinguished flame. An igniter coil is mounted proximate the burner nozzle of the FID, and thermocouple means are provided including a hot junction in thermal contact with the nozzle, and a spaced cold junction. Means are provided for applying an electrical potential to the igniter coil to enable ignition of the flame upon a flame-out condition being detected as measured by the thermocouple output. In a preferable embodiment, the ends of the igniter coil are connected to a pair of electrical leads, with the connection zones defining the hot and cold junctions of the thermocouple. This permits the same lead pair to provide both the potential enabling the igniter function of the coil, and the interconnection for the thermocouple output signal. The same lead pair may also be utilized to provide the biasing potential to the burner nozzle.

US Patent:

48067741, Feb 21, 1989

Filed:

Jun 8, 1987

Appl. No.:

7/060090

Inventors:

Lawrence H. Lin - Alamo CA
Daniel L. Cavan - Woodside CA
Robert B. Howe - San Jose CA

Assignee:

Insystems, Inc. - San Jose CA

International Classification:

G02B 2742

US Classification:

250550

Abstract:

An inspection system (10, 100) employs a Fourier transform lens (34, 120) and an inverse Fourier transform lens (54, 142) positioned along an optic axis (48, 144) to produce from an illuminated area of a patterned specimen wafer (12) a spatial frequency spectrum whose frequency components can be selectively filtered to produce an image pattern of defects in the illuminated area of the wafer. Depending on the optical component configuration of the inspection system, the filtering can be accomplished by a spatial filter of either the transmissive (50) or reflective (102) type. The lenses collect light diffracted by a wafer die (14) aligned with the optic axis and light diffracted by other wafer dies proximately located to such die. The inspection system is useful for inspecting only dies having many redundant circuit patterns. The filtered image strikes the surface of a two-dimensional photodetector array (58) which detects the presence of light corresponding to defects in only the illuminated on-axis wafer die.

US Patent:

51720000, Dec 15, 1992

Filed:

Nov 2, 1990

Appl. No.:

7/608208

Inventors:

Victor A. Scheff - Alameda CA
Lawrence H. Lin - Alamo CA
Robert B. Howe - San Jose CA

Assignee:

Insystems, Inc. - San Jose CA

International Classification:

G02B 2742

US Classification:

250550

Abstract:

In an imaging system (10) for detecting defects in a specimen (14) having a repetitive pattern (16), a spatial filter (50) receives a spatial frequency spectrum produced by a Fourier transform lens (34) and blocks preselected spatial frequency components thereof. The spatial filter includes an array of substantially parallel opaque stripes (70a-70c) that are positioned on a substantially transparent substrate (72). In one embodiment, the stripes are spaced apart by equal distances (78) and are of increasing widths (76a-76c) that correspond to the orders of diffraction of the Fourier transform pattern (45) produced by the Fourier transform lens. The spatial filter can be used to filter light spots forming a Fourier transform pattern for specimens having repetitive pattern sizes included within a specified range of sizes.

US Patent:

RE339563, Jun 9, 1992

Filed:

Nov 14, 1990

Appl. No.:

7/613208

Inventors:

Lawrence H. Lin - Alamo CA
Daniel L. Cavan - Woodside CA
Robert B. Howe - San Jose CA

Assignee:

Insystems, Inc. - San Jose CA

International Classification:

G02B 2742

US Classification:

250550

Abstract:

An inspection system (10, 100) employs a Fourier transform lens (34, 120) and an inverse Fourier transform lens (54, 142) positioned along an optic axis (48, 144) to produce from an illuminated area of a patterned specimen wafer (12) a spatial frequency spectrum whose frequency components can be selectively filtered to produce an image pattern of defects in the illuminated area of the wafer. Depending on the optical component configuration of the inspection system, the filtering can be accomplished by a spatial filter of either the transmissive (50) or reflective (102) type. The lenses collect light diffracted by a wafer die (14) aligned with the optic axis and light diffracted by other wafer dies proximately located to such die. The inspection system is useful for inspecting only dies having many redundant circuit patterns. The filtered image strikes the surface of a two-dimensional photodetector array (58) which detects the presence of light corresponding to defects in only the illuminated on-axis wafer die.

US Patent:

47972076, Jan 10, 1989

Filed:

Sep 30, 1986

Appl. No.:

6/913356

Inventors:

Ronald E. Honganen - Campbell CA
Robert L. Howe - San Ramon CA
Leslie A. Miller - San Jose CA

Assignee:

Spectra Physics, Inc. - San Jose CA

International Classification:

B01D 1508

US Classification:

2101982

Abstract:

There is disclosed herein an apparatus and method for controlling a dual piston pump for a liquid chromatography system so as to pump a flow of solvent through the liquid chromatography column at a constant flow rate and with a solvent composition which is substantially equal to the desired solvent composition despite changing conditions of compressibility of the solvent. The control system uses a computer which measures the time it takes the pump shaft to move through an overlap region in the pump cycle when both pistons are simultaneously pumping as normalized to the time taken by the pump to move through a constant velocity portion of the piston travel defined by the user. This time is compared to the time stored in the computer for the particular flow rate used to measure the time defined above for the pump to move through the overlap region for an incompressible solvent at low pressure as normalized to the time taken by the input piston to move through the same user defined segment of the constant velocity portion of the travel of the input piston. The ratio of these two times is then used in an algorithm to derive a correction factor for compressibility. This correction factor is then used to control the flow rate and the makeup of the solvent composition to maintain the correct values over changing conditions of solvent compressibility.

US Patent:

47978341, Jan 10, 1989

Filed:

Sep 30, 1986

Appl. No.:

6/913709

Inventors:

Ronald E. Honganen - Campbell CA
Robert L. Howe - San Ramon CA
Leslie A. Miller - San Jose CA

International Classification:

G06F 1546
F17D 300

US Classification:

364510

Abstract:

An apparatus and method controls a dual piston pump for a liquid chromatography system so as to pump a flow of solvent through the liquid chromatography column at a constant flow rate and with a solvent composition which is substantially equal to the desired solvent composition despite changing conditions of compressibility of the solvent. A computer is used which measures the time it takes the pump shaft to move through an overlap region in the pump cycle when both pistons are simultaneously pumping as normalized to the time taken by the pump to move through a constant velocity portion of the piston travel defined by the user. This time is compared to the time stored in the computer for the particular flow rate used to measure the time defined above for the pump to move through the overlap region for an incompressible solvent at low pressure as normalized to the time taken by the input piston to move through the same user defined segment of the constant velocity portion of the travel of the input piston. The ratio of these two times is then used in an algorithm to derive a correction factor for compressibility. This correction factor is then used to control the flow rate and the makeup of the solvent composition to maintain the correct values over changing conditions of solvent compressibility.