Robert Jk Jacob

US Patent:

39924246, Nov 16, 1976

Filed:

Oct 1, 1975

Appl. No.:

5/618525

Inventors:

Richard J. Lagow - Manchester MA
Lois L. Gerchman - Stoneham MA
Robert A. Jacob - Grand Forks ND

Assignee:

Massachusetts Institute of Technology - Cambridge MA

International Classification:

C07F 500
C07F 506

US Classification:

2604291

Abstract:

Trifluoromethyl-substituted compounds, are formed in a corona discharge or glow discharge plasma of trifluoromethyl radicals from an organic trifluoromethyl source. A substrate possessing easily replaceable ligands such as halogen or carbonyl, is initially contacted either in the plasma and within a short distance from a downstream visible edge of the plasma or outside of the visible portion of the plasma and within a short distance from the downstream visible edge, to effect a substitution of the halogen or carbonyl ligand on the substrate with a trifluoromethyl radical without substantial decomposition of the substrate.

US Patent:

39545857, May 4, 1976

Filed:

Feb 21, 1974

Appl. No.:

5/444465

Inventors:

Richard J. Lagow - Manchester MA
Lois L. Gerchman - Stoneham MA
Robert A. Jacob - Grand Forks ND

Assignee:

Massachusetts Institute of Technology - Cambridge MA

International Classification:

B01K 100
C07F 500
C07F 700
C07F 1700

US Classification:

204165

Abstract:

Trifluoromethyl-substituted compounds are formed in a corona discharge or glow discharge plasma of trifluoromethyl radicals from an organic trifluoromethyl source. A substrate possessing easily replaceable ligands such as halogen or carbonyl, is initially contacted either in the plasma and within a short distance from a downstream visible edge of the plasma or outside of the visible portion of the plasma and within a short distance from the downstream visible edge, to effect a substitution of the halogen or carbonyl ligand on the substrate with a trifluoromethyl radical without substantial decomposition of the substrate.