Robert Alan Lang

US Patent:

7314700, Jan 1, 2008

Filed:

Dec 5, 2002

Appl. No.:

10/537259

Inventors:

Wenjie Li - Poughkeepsie NY, US
Wayne Moreau - Wappingers Falls NY, US
David R. Medeiros - Ossining NY, US
Karen E. Petrillo - Mahopac NY, US
Robert N. Lang - Pleasant Valley NY, US
Marie Angelopoulos - Cortlandt Manor NY, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G03C 1/492
G03C 1/494
G03C 1/76
G03C 5/00

US Classification:

4302701, 430322, 430324, 430325, 430326, 430330

Abstract:

The resist compositions having an acid sensitive imaging polymer and a radiation sensitive acid generator component comprising: (i) a first radiation sensitive acid generator selected from the group consisting of dissolution-inhibiting acid generators, and (ii) a second radiation sensitive acid generator selected from the group consisting of unprotected acidic group-functionalized acid generators and acid labile group-protected acidic group-functionalized radiation sensitive acid generators; enables formation of high sensitivity resists suitable for use in EPL, EUV, soft x-ray, and other low energy intensity lithographic imaging applications. The resist compositions may be useful in other lithographic processes as well.

US Patent:

20020139374, Oct 3, 2002

Filed:

Aug 13, 2001

Appl. No.:

09/928679

Inventors:

Susan Iliff - Scotch Plains NJ, US
Richard Bilka - Holmdel NJ, US
Robert Hill - Old Bridge NJ, US
Gregory King - Carteret NJ, US
John Kovacs - Avenel NJ, US
Alison Kulick - Parlin NJ, US
Robert Lang - Parlin NJ, US
James Michels - Bloomfield NJ, US
Lisa Stanislawczyk - Monroe Township NJ, US

International Classification:

A61F013/00

US Classification:

128/846000

Abstract:

A safety shield suitable for removable attachment to a restraint chair. The shield, adjustable movably in a vertical position, characterized as a rigid, planar member adapted for removable attachment to a support member of an animal, restraining chair.

US Patent:

52408124, Aug 31, 1993

Filed:

Nov 18, 1991

Appl. No.:

7/793884

Inventors:

Willard E. Conley - Cornwall NY
Ranee W. Kwong - Wappingers Falls NY
Richard J. Kvitek - Wappingers Falls NY
Robert N. Lang - Pleasant Valley NY
Christopher F. Lyons - La Grangeville NY
Steve S. Miura - Poughkeepsie NY
Wayne M. Moreau - Wappingers Falls NY
Harbans S. Sachdev - Hopewell Junction NY
Robert L. Wood - Poughkeepsie NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G03C 1492

US Classification:

430273

Abstract:

A protective material for use as an overcoating film for acid catalyzed resist compositions comprising a polymeric film forming compound, the films of which are impermeable to vapors of organic and inorganic bases.

US Patent:

51150905, May 19, 1992

Filed:

Mar 30, 1990

Appl. No.:

7/503401

Inventors:

Krishna G. Sachdev - Wappingers Falls NY
John P. Hummel - Verbank NY
Ranee W. Kwong - Wappingers Falls NY
Robert N. Lang - Pleasant Valley NY
Leo L. Linehan - Beacon NY
Harbans S. Sachdev - Wappingers Falls NY

International Classification:

C08G 6926
C08G 6928

US Classification:

528353

Abstract:

Viscosity stable, essentially gel-free linear polyamic acids are provided by a process utilizing offset stoichiometry. Polyimides formed from such polyamic acids have low TCE and low dielectric constants. Methods for improved adhesion of polyimides are also disclosed.

US Patent:

59767103, Nov 2, 1999

Filed:

Apr 10, 1997

Appl. No.:

8/838757

Inventors:

Krishna Gandhi Sachdev - Hopewell Junction NY
John Patrick Hummel - Verbank NY
Sundar Mangalore Kamath - Hyde Park NY
Robert Neal Lang - Pleasant Valley NY
Charles Hampton Perry - Poughkeepsie NY
Harbans Sachdev - Hopewell Junction NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

H01L 2912

US Classification:

428620

Abstract:

A multilevel high density interconnect structure of a semiconductor device or package including a substrate having at least one conductive feature therein, a film of a polyimide composition on the substrate and selected from the group consisting of a cured product of a polyamic acid and a cured product of a polyamic ester. The polyamic acid is prepared by reacting a stoichiometric excess of a linear aromatic diamine and aromatic dianhydride to form a first reaction product where the molar ratio of said diamine to said aromatic anhydride is in the range from 100:97 to 100:99. 5 and then reacting the first reaction product with an aromatic anhydride. The polyamic ester is prepared by reacting a stoichiometric excess of a linear aromatic diamine and an aromatic diester diacyl chloride to form a second reaction product where the molar ratio of said diamine to said diester diacyl chloride is in the range from 100:97 to 100:99. 5 and then reacting the second reaction product with aromatic anhydride. There is at least one interconnective conductive metallurgical feature in the film a polyimide composition in contact with said conductive feature in said substrate.

US Patent:

39897982, Nov 2, 1976

Filed:

Jul 23, 1973

Appl. No.:

5/381369

Inventors:

David F. Greene - Westfield NJ
Robert J. Lang - Watchung NJ
Albert B. Welty - Westfield NJ

Assignee:

Exxon Research and Engineering Company - Linden NJ

International Classification:

B01J 800
C01B 1700

US Classification:

423244

Abstract:

Flue gas is desulfurized by absorbing it onto a selective absorbent-catalytic material. The absorbed SO. sub. 2 is recovered by contacting it in a desorption cycle with a reducing desorption gas. In one embodiment, multiple absorbent beds are employed and alternate absorption-desorption cycles are used in each of the multiple beds with the flue gas and the desorption gas used alternately. The sulfur oxide is recovered in concentrated form in the desorption gas stream and is then utilized as feed in a conventional sulfuric acid plant yielding concentrated sulfuric acid.

US Patent:

53994620, Mar 21, 1995

Filed:

Jul 13, 1994

Appl. No.:

8/274571

Inventors:

Krishna G. Sachdev - Hopewell Junction NY
Premlatha Jagannathan - Patterson NY
Robert N. Lang - Pleasant Valley NY
Harbans S. Sachdev - Hopewell Junction NY
Ratnam Sooriyakumaran - Fishkill NY
Joel R. Whitaker - Port Ewen NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G03F 730
G03F 736
G03F 7023

US Classification:

430323

Abstract:

A method is provided for forming a microlithographic relief image having a width of less than one half micron in a bilayer resist composition. The resist composition comprises a single component, silicon-containing photoimageable layer and a polymeric underlayer having a high optical density and a refractive index similar to the refractive index of the overlaying resist. The method provides for the formation of a relief image in the top layer using an i-line (365 nm) or deep ultra violet (170 to 300 nm) light source, followed by O. sub. 2 RIE transfer of the relief image into the polymeric underlayer.

US Patent:

20220242667, Aug 4, 2022

Filed:

Feb 1, 2022

Appl. No.:

17/590666

Inventors:

- San Jose CA, US
David Dymesich - New York NY, US
Uwe Meister - El Dorado CA, US
Mason Cole - Lambertville MI, US
Lonai Anthraper - San Jose CA, US
Sarah Elliott - San Jose CA, US
Louis Abastas - San Jose CA, US
Robert Lang - San Jose CA, US
Melonee Wise - San Jose CA, US
Stefan Nusser - Palo Alto CA, US
David Robson - San Jose CA, US

International Classification:

B65G 1/137

Abstract:

A method includes: obtaining a task definition for a mobile robot, the task definition including (i) a position on an item support carried by the mobile robot, and (ii) an identifier of an item to be placed at the position to form a unit load with the item support; controlling the mobile robot carrying the item support to travel to a pick location for receiving the item from a picker; controlling an output device to render an indication of the position for the picker at the pick location; responsive to placement of the item at the position by the picker, controlling the mobile robot to travel to a handling location.