Robert D Lindholm

US Patent:

49313517, Jun 5, 1990

Filed:

Jul 13, 1989

Appl. No.:

7/378471

Inventors:

William C. McColgin - Pittsford NY
Thomas B. Brust - Spencerport NY
Robert C. Daly - Rochester NY
Joseph Jech - Rochester NY
Robert D. Lindholm - Rochester NY

Assignee:

Eastman Kodak Company - Rochester NY

International Classification:

G03C 500
G03C 540

US Classification:

430323

Abstract:

A method for producing high resolution patterned resist images having excellent etch resistance and superior thermal and dimensional stability comprises the steps of: (a) forming a planarizing layer resistant to silicon uptake on a substrate; (b) providing a positive-working photoresist composition containing --OH or --NH-- groups over the planarizing layer, (c) imagewise exposing the resist to activating radiation, (d) developing the exposed resist, (e) contacting the developed resist with a vapor comprising a silicon-containing compound to effect silylation thereof and thereby impart etch resistance, the silicon-containing compound having the structural formula: ##STR1## wherein: X. sup. 1 and X. sup. 2 are individually chloro or ##STR2## wherein R. sup. 3 and R. sup. 4 are individually H or alkyl; and R. sup. 1 and R. sup.

US Patent:

41243927, Nov 7, 1978

Filed:

Sep 7, 1976

Appl. No.:

5/720874

Inventors:

Anthony Adin - Rochester NY
Thomas J. Huttemann - Rushville NY
Robert D. Lindholm - Rochester NY

Assignee:

Eastman Kodak Company - Rochester NY

International Classification:

G03C 140
G03C 152
G03C 100
G03C 524

US Classification:

96 77

Abstract:

An imaging system is provided wherein a blocked dye precursor is activated by an amine to an unblocked form which, in the presence of an inert cobalt (III) complex containing amine releasing ligands, undergoes a redox reaction to form a dye. The amine generated during the redox reaction causes further dye formation, giving increased speed.