Robert T Small

US Patent:

7029508, Apr 18, 2006

Filed:

Feb 11, 2003

Appl. No.:

10/361822

Inventors:

Brandon Shane Scott - Castro Valley CA, US
Robert J. Small - Hayward CA, US

Assignee:

DuPont Air Products NanoMaterials L.L.C. - Tempe AZ

International Classification:

C09G 1/02
C09G 1/04
B24B 1/00

US Classification:

51307, 51308, 51309, 106 3, 438692, 438693

Abstract:

The present invention provides a composition for chemical-mechanical polishing which comprises at least one abrasive particle having a surface at least partially coated by a activator. The activator comprises a metal other than a metal of Group 4(b), Group 5(b) or Group 6(b). The composition further comprises at least one oxidizing agent. The composition is believed to be effective by virtue of the interaction between the activator coated on the surface of the abrasive particles and the oxidizing agent, at the activator surface, to form free radicals. The invention further provides a method that employs the composition in the polishing of a feature or layer, such as a metal film, on a substrate surface. The invention additionally provides a substrate produced this method.

US Patent:

7427305, Sep 23, 2008

Filed:

Apr 18, 2006

Appl. No.:

11/405485

Inventors:

Brandon Shane Scott - Castro Valley CA, US
Robert J. Small - Hayward CA, US

Assignee:

DuPont Air Products NanoMaterials LLC - Tempe AZ

International Classification:

C09G 1/02
C09G 1/04

US Classification:

51307, 51308, 51309, 106 3, 438692, 438693

Abstract:

This invention relates to a method of making selected oxidizers or other free radical-producing compounds become more effective chemical etchants and/or oxidizers for CMP activities by promoting the formation of the free radicals in a CMP composition with one or more activators. The activator comprises iron, copper or combinations thereof. The activator coated abrasive is particularly effective as it brings the activator in close proximity to the targeted material on the substrate surface, and thus facilitates or accelerates the removal reaction substantially at the site of the targeted material. The activator reacts with the per-type oxidizer to form at least one oxygen-containing free radical. The invention further provides a method that employs the composition in the polishing of a feature or layer, such as a metal film, on a substrate surface. The invention additionally provides a substrate produced by this method.

US Patent:

20090029553, Jan 29, 2009

Filed:

Sep 23, 2008

Appl. No.:

12/232712

Inventors:

Brandon Shane Scott - Castro Valley CA, US
Robert J. Small - Hayward CA, US

International Classification:

H01L 21/304
C09K 13/00

US Classification:

438693, 252 791, 257E21237

Abstract:

The present invention provides a composition for chemical-mechanical polishing which comprises at least one abrasive particle having a surface at least partially coated by a activator. The activator comprises a metal other than a metal of Group 4(b), Group 5(b) or Group 6(b). The composition further comprises at least one oxidizing agent. The composition is believed to be effective by virtue of the interaction between the activator coated on the surface of the abrasive particles and the oxidizing agent, at the activator surface, to form free radicals. The invention further provides a method that employs the composition in the polishing of a feature or layer, such as a metal film, on a substrate surface. The invention additionally provides a substrate produced this method.