Jon S. Hsu - Congers NY Bhola N. De - Congers NY Rodney L. Robison - Kingston NY Tugrul Yasar - Woodstock NY
Assignee:
Materials Research Corporation - Orangeburg NY
International Classification:
G01J 400 G02F 101
US Classification:
356369
Abstract:
An ellipsometric measuring system is set-up in association with a vacuum chamber on a production line for thin film samples. The ellipsometer has a scanner for directing the incident light beam to different locations on a thin film sample, and the ellipsometer also has an aperture for limiting the reflected light beam received by the photodetector. The scanner implements a method of aligning the incident beam to a selected surface of the sample. The scanner and the aperture are used to provide a finer adjustment of the incident beam with respect to the selected surface. The ellipsometric measuring system further uses test thin film samples with known film thicknesses and index or refractions to calculate a value for the angle of incidence of the incident light beam.