Roland W. Gooch - Dallas TX Mark V. Wadsworth - Richardson TX
Assignee:
Pharmarcopeia, Inc. - Cranbury NJ
International Classification:
G01J 510
US Classification:
250332, 2503384
Abstract:
An array of bolometers suspended over a substrate by support arms located beneath the corresponding bolometer to allow maximum fill factor in the array.
Vacuum Package Fabrication Of Microelectromechanical System Devices With Integrated Circuit Components
A method for vacuum packaging MEMS devices is provided that comprises forming a plurality of MEMS devices ( ) on a device wafer ( ). A first sealing ring ( ) is formed surrounding one of the MEMS devices ( ) and any associated mating pads ( ). A plurality of integrated circuit devices ( ) is formed on a lid wafer ( ) where each integrated circuit device ( ) has one or more associated mating pads ( ) and one or more associated bonding pads ( ). A plurality of second sealing rings ( ) is formed on the lid wafer ( ) where each of the second sealing rings ( ) surrounds one of the integrated circuit devices ( ) and any associated bonding pads ( ). The second sealing ring ( ) is positioned between the perimeter of the integrated circuit device ( ) and the associated bonding pads ( ). A sealing layer is formed on either each first sealing ring ( ) or each second sealing ring ( ). The device wafer ( ) is mated with the lid wafer ( ) in a vacuum environment to form a plurality of vacuum packages where each vacuum package encloses one or more of the MEMS devices ( ) and one or more of the integrated circuit devices ( ).
Vacuum Package Fabrication Of Integrated Circuit Components
Roland W. Gooch - Dallas TX Thomas R. Schimert - Ovilla TX
Assignee:
Raytheon Company - Lexington MA
International Classification:
H01L 2144
US Classification:
438106, 438 50, 438 51, 438113, 438401, 438909
Abstract:
A method for vacuum packaging MEMS or similar devices during device fabrication comprises forming a plurality of MEMS devices ( ), or similar devices, on a device wafer ( ). A device sealing ring ( ) is formed between the MEMS devices ( ) and bonding pads ( ) connected to a MEMS device. A solder adhesion layer ( ) forms part of the device sealing ring ( ) surrounding each MEMS or similar device ( ). A lid wafer ( ) is formed having a plurality of lid sealing rings ( ) corresponding in number and location to the device sealing rings ( ). Each lid sealing ring ( ) surrounds a cavity ( ). The device wafer ( ) is aligned with the lid wafer ( ) to align each device sealing ring ( ) with the corresponding lid sealing ring ( ), leaving a gap between the lid wafer ( ) and the device wafer ( ). The resulting assembly ( ) is placed in a vacuum furnace. The vacuum furnace is evacuated and heated to a temperature sufficient to allow outgassing of all surface areas of the lid wafer ( ) and the device ( ).
Vacuum Package Fabrication Of Integrated Circuit Components
A vacuum package for integrated circuit devices includes a sealing ring having multiple control spacers of uniform thickness distributed around the sealing ring. The sealing ring is in a designated area on a substrate, material and surrounds one or more integrated circuit devices. The vacuum package also includes a sealing layer on the sealing ring. A vacuum package lid is sealed to the sealing ring by the sealing layer on the sealing ring. The vacuum package lid provides a vacuum cell for the one or more integrated circuit devices.
Roland W. Gooch - Dallas TX Thomas R. Schimert - Ovilla TX William L. McCardel - Plano TX Bobbi A. Ritchey - Allen TX
Assignee:
Raytheon Company - Waltham MA
International Classification:
H01L 310376
US Classification:
2503384, 438 72, 438 96
Abstract:
A microbolometer is provided that includes an absorber element having material properties to change temperature in response to absorbing infrared radiation. An amorphous silicon detector is thermally coupled to the absorber element and is suspended above a silicon substrate at a height of one-quarter wavelength of the infrared radiation to be detected. The amorphous silicon detector changes electrical resistance in response to the absorber element changing temperature. The microbolometer also includes electrode arms coupled to the silicon substrate to provide structural support for the amorphous silicon detector above the surface of the silicon substrate. The electrode arms further provide electrical connectivity for the microbolometer.
Vacuum Package Fabrication Of Integrated Circuit Components
Athanasios J. Syllaios - Richardson TX, US Roland W. Gooch - Dallas TX, US Thomas R. Schimert - Ovilla TX, US
International Classification:
H01L023/12
US Classification:
257704, 257684, 257678, 438106, 438456
Abstract:
A method for manufacturing integrated circuit device lids includes creating a lid cavity on the surface of a lid wafer, forming a sealing surface on the lid wafer that surrounds the lid cavity, and forming a trench on the lid wafer between the lid cavity and the sealing surface. The resulting structure uptakes excess sealing surface material and prevents such material from entering the lid cavity.
Sub-Wavelength Structures For Reduction Of Reflective Properties
Athanasios J. Syllaios - Richardson TX, US Roland W. Gooch - Dallas TX, US Thomas R. Schimert - Ovilla TX, US Edward G. Meissner - Richardson, Dallas County TX, US
International Classification:
H01L029/06 H01L023/12
US Classification:
257 10, 257680, 257704
Abstract:
A method for manufacturing optically-transparent lids includes etching sub-wavelength structures on a surface of a lid wafer. The structures may be arrayed in a hexagonally closed-packed pattern.
Vacuum Package Fabrication Of Integrated Circuit Components
Athanasios J. Syllaios - Richardson TX, US Roland W. Gooch - Dallas TX, US Thomas R. Schimert - Ovilla TX, US
Assignee:
L-3 Communications Corporation - New York NY
International Classification:
H01L 21/44 H01L 21/48 H01L 21/50
US Classification:
438125, 438109, 438456
Abstract:
A method for manufacturing integrated circuit device lids includes creating a lid cavity on the surface of a lid wafer, forming a sealing surface on the lid wafer that surrounds the lid cavity, and forming a trench on the lid wafer between the lid cavity and the sealing surface. The resulting structure uptakes excess sealing surface material and prevents such material from entering the lid cavity.
Technical Consultant
L-3 Communications 2005 - 2009
Senior Principal Engineer
Raytheon 1998 - 2004
Senior Principal Engineer
Texas Instruments 1966 - 1998
Member, Group Technical Staff
Education:
Baylor University 1962 - 1967
Master of Science, Masters, Bachelors, Bachelor of Science, Physics
Skills:
Thin Films Mems Patents Semiconductor Fab Processing and Development Processing Image Processing Sensors Semiconductors Process Simulation Materials Science R&D Manufacturing Vacuum Optics Testing Engineering Ic Physics Automation Characterization Mechanical Engineering Metal Fabrication Semiconductor Process
Name / Title
Company / Classification
Phones & Addresses
Roland Gooch Principal
R W Gooch Co Business Services at Non-Commercial Site
6936 Sedgwick Dr, Dallas, TX 75231
Youtube
Roland Go:Piano and Go:Keys Full Review!
The folks over at Roland are putting out incredible products all the t...
Duration:
8m 47s
Getting Started with the Roland GO:PIANO and ...
The GO:PIANO is a complete solution for learning to play the piano for...
Duration:
6m 4s
Roland Go Keys Keyboard | Demonstration & Rea...
Demoing the Roland Go Keys, we have Graham Blackledge. Follow the link...
Duration:
7m 47s
Roland GO:KEYS revisited - Man this thing is ...
Gear at the Gearfacts studio comes and goes at a very high rate. I rev...
Duration:
13m 2s
Roland GO 88-Key Digital Piano Review
Roland's GO:PIANO 88 offers a light, portable keyboard that has everyt...