Ruby L Robertson

US Patent:

60457120, Apr 4, 2000

Filed:

Feb 23, 1998

Appl. No.:

9/030540

Inventors:

Allyson D. Yarbrough - Hermosa Beach CA
Samuel S. Osofsky - Torrance CA
Ruby E. Robertson - Los Angeles CA
Robert C. Cole - Rancho Palos Verdes CA

Assignee:

The Aerospace Corporation - El Segundo CA

International Classification:

C23F 100
H01B 1300
B29D 1100

US Classification:

216 2

Abstract:

A method of manufacturing a micromachined reflector antenna onto a substrate firstly etches a reflector aperture surface defining a dish cavity in an oxide layer and secondly rotates a hinge over the reflector aperture surface with the hinge being used as the reflector central feed. The micromachined reflector can be made into an array of reflector antennas and integrated onto a single substrate with front end receiver circuits operating as a high frequency receiver on a chip reduced in size and cost and operating at hundreds of GHz.

US Patent:

62385801, May 29, 2001

Filed:

Dec 14, 1999

Appl. No.:

9/460738

Inventors:

Robert C. Cole - Rancho Palos Verdes CA
Ruby E. Robertson - Los Angeles CA
Allyson D. Yarbrough - Hermosa Beach CA

Assignee:

The Aerospace Corporation - El Segundo CA

International Classification:

H01L 2102
H01L 21302

US Classification:

216 2

Abstract:

A wet and vapor acid etching method releases a microelectromechanical systems (MEMS) structure from a substrate by dissolving a sacrificial layer disposed between the MEMS and the substrate. The sacrificial layer may be a silicon dioxide (SiO. sub. 2) layer having a field portion over which the MEMS does not extend and a support portion over which the MEMS does extend. The field portion of the SiO. sub. 2 layer is quickly removed using conventional wet hydrofluoric (HF) etching followed by rinsing and drying and then the support portion is removed using conventional vapor HF etching from a solution greater than 45% by weight percent. The wet HF chemical etch quickly removes the large field portion of the sacrificial layer. The HF vapor etch removes the small support portion of the sacrificial layer below the MEMS to release the MEMS from the substrate without stiction thereby preventing damage to the MEMS when released.

US Patent:

60087765, Dec 28, 1999

Filed:

Feb 18, 1998

Appl. No.:

9/028584

Inventors:

Allyson D. Yarbrough - Hermosa Beach CA
Samuel S. Osofsky - Torrance CA
Ruby E. Robertson - Los Angeles CA
Robert C. Cole - Rancho Palos Verdes CA

Assignee:

The Aerospace Corporation - El Segundo CA

International Classification:

H01Q 2100
H01Q 1514

US Classification:

343853

Abstract:

A micromachined reflector antenna system is integrated onto a substrate by firstly etching a reflector aperture surface defining a dish cavity in an oxide layer and secondly rotating a hinge over the reflector aperture surface with the hinge being used as the reflector central feed. The micromachined reflector antenna system can be made with an array of reflector antennas and integrated onto a single substrate with front end receiver circuits operating as a high frequency receiver on a chip with reduced size and cost and operating at hundreds of GHz.