Walter H. Nagy - Raleigh NC, US Ricardo M. Borges - Morrisville NC, US Jeffrey D. Brown - Garner NC, US Apurva D. Chaudhari - Raleigh NC, US James W. Cook - Raleigh NC, US Allen W. Hanson - Cary NC, US Jerry Wayne Johnson - Raleigh NC, US Kevin J. Linthicum - Angier NC, US Edwin Lanier Piner - Cary NC, US Pradeep Rajagopal - Raleigh NC, US John Claassen Roberts - Hillsborough NC, US Sameer Singhal - Apex NC, US Robert Joseph Therrien - Apex NC, US Andrei Vescan - Herzogenrath, DE
Assignee:
Nitronex Corporation - Durham NC
International Classification:
H01L 31/00
US Classification:
257192, 257194
Abstract:
Gallium nitride material transistors and methods associated with the same are provided. The transistors may be used in power applications by amplifying an input signal to produce an output signal having increased power. The transistors may be designed to transmit the majority of the output signal within a specific transmission channel (defined in terms of frequency), while minimizing transmission in adjacent channels. This ability gives the transistors excellent linearity which results in high signal quality and limits errors in transmitted data. The transistors may be designed to achieve low ACPR values (a measure of excellent linearity), while still operating at high drain efficiencies and/or high output powers. Such properties enable the transistors to be used in RF power applications including third generation (3G) power applications based on W-CDMA modulation.
Gallium Nitride Material Transistors And Methods Associated With The Same
Walter H. Nagy - Raleigh NC, US Jerry Wayne Johnson - Raleigh NC, US Edwin Lanier Piner - Cary NC, US Pradeep Rajagopal - Raleigh NC, US John Claassen Roberts - Hillsborough NC, US Sameer Singhal - Raleigh NC, US Robert Joseph Therrien - Apex NC, US Andrei Vescan - Herzogenrath, DE Ricardo M. Borges - Morrisville NC, US Jeffrey D. Brown - Charlotte NC, US Apurva D. Chaudhari - Raleigh NC, US James W. Cook - Raleigh NC, US Allen W. Hanson - Cary NC, US Kevin J. Linthicum - Cary NC, US
Assignee:
Nitronex Corporation - Durham NC
International Classification:
H01L 31/072
US Classification:
257192, 257194
Abstract:
Gallium nitride material transistors and methods associated with the same are provided. The transistors may be used in power applications by amplifying an input signal to produce an output signal having increased power. The transistors may be designed to transmit the majority of the output signal within a specific transmission channel (defined in terms of frequency), while minimizing transmission in adjacent channels. This ability gives the transistors excellent linearity which results in high signal quality and limits errors in transmitted data. The transistors may be designed to achieve low ACPR values (a measure of excellent linearity), while still operating at high drain efficiencies and/or high output powers. Such properties enable the transistors to be used in RF power applications including third generation (3G) power applications based on W-CDMA modulation.
Thermal Designs Of Packaged Gallium Nitride Material Devices And Methods Of Packaging
Sameer Singhal - Raleigh NC, US Andrew Edwards - Cary NC, US Chul H. Park - Cary NC, US Quinn Martin - Morrisville NC, US Isik C. Kizilyalli - Raleigh NC, US
Assignee:
International Rectifier Corporation - El Segundo CA
International Classification:
H01L 23/373 H01L 21/58
US Classification:
257712, 257720, 257E23109, 438122
Abstract:
Gallium nitride material devices and methods associated with the devices are described. The devices may be designed to provide enhanced thermal conduction and reduced thermal resistance. The increased thermal conduction through and out of the gallium nitride devices enhances operability of the devices, including providing excellent RF operation, reliability, and lifetime.
Nanoscale Surface Plasmonics Sensor With Nanofluidic Control
A microfluidically-controlled transmission mode nanoscal surface plasmonics sensor device comprises one or more arrays of aligned nanochannels in fluid communication with inflowing and outflowing fluid handling manifolds that control the flow of fluid through the array(s). Fluid comprising a sample for analysis is moved from an inlet manifold, through the nanochannel array, and out through an exit manifold. The fluid may also contain a reagent used to modify the interior surfaces of the nanochannels, and/or a reagent required for the detection of an analyte.
Gallium Nitride Material Transistors And Methods Associated With The Same
Walter H. Nagy - Raleigh NC, US Ricardo M. Borges - Morrisville NC, US Jeffrey D. Brown - Charlotte NC, US Apurva D. Chaudhari - Raleigh NC, US Allen W. Hanson - Cary NC, US Jerry W. Johnson - Raleigh NC, US Kevin J. Linthicum - Cary NC, US Edwin L. Piner - Cary NC, US Pradeep Rajagopal - Raleigh NC, US John C. Roberts - Hillsborough NC, US Sameer Singhal - Apex NC, US Robert J. Therrien - Apex NC, US Andrei Vescan - Herzogenrath, DE
Assignee:
International Rectifier Corporation - El Segundo CA
International Classification:
H01L 31/0328
US Classification:
257192, 330277
Abstract:
Gallium nitride material transistors and methods associated with the same are provided. The transistors may be used in power applications by amplifying an input signal to produce an output signal having increased power. The transistors may be designed to transmit the majority of the output signal within a specific transmission channel (defined in terms of frequency), while minimizing transmission in adjacent channels. This ability gives the transistors excellent linearity which results in high signal quality and limits errors in transmitted data. The transistors may be designed to achieve low ACPR values (a measure of excellent linearity), while still operating at high drain efficiencies and/or high output powers. Such properties enable the transistors to be used in RF power applications including third generation (3G) power applications based on W-CDMA modulation.
Gallium Nitride Material Structures Including Isolation Regions And Methods
Jerry Johnson - Raleigh NC, US Ricardo Borges - Morrisville NC, US Jeffrey Brown - Garner NC, US James Cook - Raleigh NC, US Allen Hanson - Cary NC, US Edwin Piner - Cary NC, US Pradeep Rajagopal - Raleigh NC, US John Roberts - Hillsborough NC, US Sameer Singhal - Apex NC, US Robert Therrien - Apex NC, US Andrei Vescan - Herzogenrath, DE
Assignee:
Nitronex Corporation - Raleigh NC
International Classification:
H01L029/15
US Classification:
257076000
Abstract:
Gallium nitride material structures, including devices, and methods associated with the same are provided. In some embodiments, the structures include one or more isolation regions which electrically isolate adjacent devices. One aspect of the invention is the discovery that the isolation regions also can significantly reduce the leakage current of devices (e.g., transistors) made from the structures, particularly devices that also include a passivating layer formed on a surface of the gallium nitride material. Lower leakage currents can result in increased power densities and operating voltages, amongst other advantages.
Gallium Nitride Material Transistors And Methods Associated With The Same
Walter Nagy - Raleigh NC, US Ricardo Borges - Morrisville NC, US Jeffrey Brown - Charlotte NC, US Apurva Chaudhari - Raleigh NC, US James Cook - Raleigh NC, US Allen Hanson - Cary NC, US Jerry Johnson - Raleigh NC, US Kevin Linthicum - Cary NC, US Edwin Piner - Cary NC, US Pradeep Rajagopal - Raleigh NC, US John Roberts - Hillsborough NC, US Sameer Singhal - Apex NC, US Robert Therrien - Apex NC, US Andrei Vescan - Herzogenrath, DE
Assignee:
Nitronex Corporation - Raleigh NC
International Classification:
H01L029/15
US Classification:
257500000
Abstract:
Gallium nitride material transistors and methods associated with the same are provided. The transistors may be used in power applications by amplifying an input signal to produce an output signal having increased power. The transistors may be designed to transmit the majority of the output signal within a specific transmission channel (defined in terms of frequency), while minimizing transmission in adjacent channels. This ability gives the transistors excellent linearity which results in high signal quality and limits errors in transmitted data. The transistors may be designed to achieve low ACPR values (a measure of excellent linearity), while still operating at high drain efficiencies and/or high output powers. Such properties enable the transistors to be used in RF power applications including third generation (3G) power applications based on W-CDMA modulation.
Gallium Nitride Material Devices And Associated Methods
Jerry Johnson - Raleigh NC, US Sameer Singhal - Apex NC, US Allen Hanson - Cary NC, US Robert Therrien - Apex NC, US
Assignee:
Nitronex Corporation - Raleigh NC
International Classification:
H01L 29/78 H01L 21/336
US Classification:
257289000, 438285000, 257E29255, 257E21401
Abstract:
Gallium nitride material devices and methods associated with the same. In some embodiments, the devices may be transistors which include a conductive structure connected to a source electrode. The conductive structure may form a source field plate which can be formed over a dielectric material and can extend in the direction of the gate electrode of the transistor. The source field plate may reduce the electrical field (e.g., peak electrical field and/or integrated electrical field) in the region of the device between the gate electrode and the drain electrode which can lead to a number of advantages including reduced gate-drain feedback capacitance, reduced surface electron concentration, increased breakdown voltage, and improved device reliability. These advantages enable the gallium nitride material transistors to operate at high drain efficiencies and/or high output powers. The devices can be used in RF power applications, amongst others.
Cfd Research Corporation
President and Chief Executive Officer
Cfd Research Corporation
Vice President and Chief Operating Officer
Cfd Research Corporation May 2014 - Dec 2015
Vice President, Biomedical and Energy Technologies
Cfd Research Corporation Jun 2008 - Apr 2014
Director, Micro Power and Sensing Technologies
Nitronex Corporation Feb 2007 - May 2008
Manager, Reliability Engineering
Education:
Stanford University 1999 - 2001
Master of Science, Masters, Materials Science, Engineering
Georgia Institute of Technology 1995 - 1999
Bachelors, Bachelor of Science, Materials Science, Engineering
Skills:
Nanotechnology Design of Experiments Simulations R&D Characterization Semiconductors Jmp Thin Films Engineering Management Silicon Failure Analysis Semiconductor Industry Biomedical Engineering Leadership Research and Development Rf Sputtering Labview Sensors Commercialization