Sameer A Singhal

age ~48

from Gurley, AL

Also known as:
  • Nora Burnett
  • Nora Thompson
Phone and address:
9 Braewick Pl SE, Gurley, AL 35748
9193426246

Sameer Singhal Phones & Addresses

  • 9 Braewick Pl SE, Gurley, AL 35748 • 9193426246
  • Nashville, TN
  • Owens Cross Roads, AL
  • Raleigh, NC
  • 1002 Cantrell Ln, Apex, NC 27502
  • Stanford, CA
  • Huntsville, AL
  • Clinton Township, MI
  • Laingsburg, MI
  • Cedar Rapids, IA
  • 6811 Hampton Bend Cir SE, Owens Cross Roads, AL 35763

Us Patents

  • Gallium Nitride Material Transistors And Methods Associated With The Same

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  • US Patent:
    7352016, Apr 1, 2008
  • Filed:
    Nov 13, 2006
  • Appl. No.:
    11/598551
  • Inventors:
    Walter H. Nagy - Raleigh NC, US
    Ricardo M. Borges - Morrisville NC, US
    Jeffrey D. Brown - Garner NC, US
    Apurva D. Chaudhari - Raleigh NC, US
    James W. Cook - Raleigh NC, US
    Allen W. Hanson - Cary NC, US
    Jerry Wayne Johnson - Raleigh NC, US
    Kevin J. Linthicum - Angier NC, US
    Edwin Lanier Piner - Cary NC, US
    Pradeep Rajagopal - Raleigh NC, US
    John Claassen Roberts - Hillsborough NC, US
    Sameer Singhal - Apex NC, US
    Robert Joseph Therrien - Apex NC, US
    Andrei Vescan - Herzogenrath, DE
  • Assignee:
    Nitronex Corporation - Durham NC
  • International Classification:
    H01L 31/00
  • US Classification:
    257192, 257194
  • Abstract:
    Gallium nitride material transistors and methods associated with the same are provided. The transistors may be used in power applications by amplifying an input signal to produce an output signal having increased power. The transistors may be designed to transmit the majority of the output signal within a specific transmission channel (defined in terms of frequency), while minimizing transmission in adjacent channels. This ability gives the transistors excellent linearity which results in high signal quality and limits errors in transmitted data. The transistors may be designed to achieve low ACPR values (a measure of excellent linearity), while still operating at high drain efficiencies and/or high output powers. Such properties enable the transistors to be used in RF power applications including third generation (3G) power applications based on W-CDMA modulation.
  • Gallium Nitride Material Transistors And Methods Associated With The Same

    view source
  • US Patent:
    7569871, Aug 4, 2009
  • Filed:
    Mar 31, 2008
  • Appl. No.:
    12/059182
  • Inventors:
    Walter H. Nagy - Raleigh NC, US
    Jerry Wayne Johnson - Raleigh NC, US
    Edwin Lanier Piner - Cary NC, US
    Pradeep Rajagopal - Raleigh NC, US
    John Claassen Roberts - Hillsborough NC, US
    Sameer Singhal - Raleigh NC, US
    Robert Joseph Therrien - Apex NC, US
    Andrei Vescan - Herzogenrath, DE
    Ricardo M. Borges - Morrisville NC, US
    Jeffrey D. Brown - Charlotte NC, US
    Apurva D. Chaudhari - Raleigh NC, US
    James W. Cook - Raleigh NC, US
    Allen W. Hanson - Cary NC, US
    Kevin J. Linthicum - Cary NC, US
  • Assignee:
    Nitronex Corporation - Durham NC
  • International Classification:
    H01L 31/072
  • US Classification:
    257192, 257194
  • Abstract:
    Gallium nitride material transistors and methods associated with the same are provided. The transistors may be used in power applications by amplifying an input signal to produce an output signal having increased power. The transistors may be designed to transmit the majority of the output signal within a specific transmission channel (defined in terms of frequency), while minimizing transmission in adjacent channels. This ability gives the transistors excellent linearity which results in high signal quality and limits errors in transmitted data. The transistors may be designed to achieve low ACPR values (a measure of excellent linearity), while still operating at high drain efficiencies and/or high output powers. Such properties enable the transistors to be used in RF power applications including third generation (3G) power applications based on W-CDMA modulation.
  • Thermal Designs Of Packaged Gallium Nitride Material Devices And Methods Of Packaging

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  • US Patent:
    8026596, Sep 27, 2011
  • Filed:
    Aug 15, 2007
  • Appl. No.:
    11/839030
  • Inventors:
    Sameer Singhal - Raleigh NC, US
    Andrew Edwards - Cary NC, US
    Chul H. Park - Cary NC, US
    Quinn Martin - Morrisville NC, US
    Isik C. Kizilyalli - Raleigh NC, US
  • Assignee:
    International Rectifier Corporation - El Segundo CA
  • International Classification:
    H01L 23/373
    H01L 21/58
  • US Classification:
    257712, 257720, 257E23109, 438122
  • Abstract:
    Gallium nitride material devices and methods associated with the devices are described. The devices may be designed to provide enhanced thermal conduction and reduced thermal resistance. The increased thermal conduction through and out of the gallium nitride devices enhances operability of the devices, including providing excellent RF operation, reliability, and lifetime.
  • Nanoscale Surface Plasmonics Sensor With Nanofluidic Control

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  • US Patent:
    8158409, Apr 17, 2012
  • Filed:
    Jan 11, 2010
  • Appl. No.:
    12/685487
  • Inventors:
    Jianjun Wei - Madison AL, US
    Sameer Singhal - Huntsville AL, US
    David Hennessey Waldeck - Pittsburgh PA, US
    Matthew Joseph Kofke - Pittsburgh PA, US
  • Assignee:
    CFD Research Corporation - Huntsville AL
    University of Pittsburgh - Pittsburgh PA
  • International Classification:
    C12M 1/34
  • US Classification:
    4352871, 385 12, 385129, 385130, 422 8211, 4352872, 4352884, 4352887, 435808, 436164, 436524, 436525, 436805
  • Abstract:
    A microfluidically-controlled transmission mode nanoscal surface plasmonics sensor device comprises one or more arrays of aligned nanochannels in fluid communication with inflowing and outflowing fluid handling manifolds that control the flow of fluid through the array(s). Fluid comprising a sample for analysis is moved from an inlet manifold, through the nanochannel array, and out through an exit manifold. The fluid may also contain a reagent used to modify the interior surfaces of the nanochannels, and/or a reagent required for the detection of an analyte.
  • Gallium Nitride Material Transistors And Methods Associated With The Same

    view source
  • US Patent:
    7994540, Aug 9, 2011
  • Filed:
    Jul 24, 2009
  • Appl. No.:
    12/508871
  • Inventors:
    Walter H. Nagy - Raleigh NC, US
    Ricardo M. Borges - Morrisville NC, US
    Jeffrey D. Brown - Charlotte NC, US
    Apurva D. Chaudhari - Raleigh NC, US
    Allen W. Hanson - Cary NC, US
    Jerry W. Johnson - Raleigh NC, US
    Kevin J. Linthicum - Cary NC, US
    Edwin L. Piner - Cary NC, US
    Pradeep Rajagopal - Raleigh NC, US
    John C. Roberts - Hillsborough NC, US
    Sameer Singhal - Apex NC, US
    Robert J. Therrien - Apex NC, US
    Andrei Vescan - Herzogenrath, DE
  • Assignee:
    International Rectifier Corporation - El Segundo CA
  • International Classification:
    H01L 31/0328
  • US Classification:
    257192, 330277
  • Abstract:
    Gallium nitride material transistors and methods associated with the same are provided. The transistors may be used in power applications by amplifying an input signal to produce an output signal having increased power. The transistors may be designed to transmit the majority of the output signal within a specific transmission channel (defined in terms of frequency), while minimizing transmission in adjacent channels. This ability gives the transistors excellent linearity which results in high signal quality and limits errors in transmitted data. The transistors may be designed to achieve low ACPR values (a measure of excellent linearity), while still operating at high drain efficiencies and/or high output powers. Such properties enable the transistors to be used in RF power applications including third generation (3G) power applications based on W-CDMA modulation.
  • Gallium Nitride Material Structures Including Isolation Regions And Methods

    view source
  • US Patent:
    20050145851, Jul 7, 2005
  • Filed:
    Jun 28, 2004
  • Appl. No.:
    10/879695
  • Inventors:
    Jerry Johnson - Raleigh NC, US
    Ricardo Borges - Morrisville NC, US
    Jeffrey Brown - Garner NC, US
    James Cook - Raleigh NC, US
    Allen Hanson - Cary NC, US
    Edwin Piner - Cary NC, US
    Pradeep Rajagopal - Raleigh NC, US
    John Roberts - Hillsborough NC, US
    Sameer Singhal - Apex NC, US
    Robert Therrien - Apex NC, US
    Andrei Vescan - Herzogenrath, DE
  • Assignee:
    Nitronex Corporation - Raleigh NC
  • International Classification:
    H01L029/15
  • US Classification:
    257076000
  • Abstract:
    Gallium nitride material structures, including devices, and methods associated with the same are provided. In some embodiments, the structures include one or more isolation regions which electrically isolate adjacent devices. One aspect of the invention is the discovery that the isolation regions also can significantly reduce the leakage current of devices (e.g., transistors) made from the structures, particularly devices that also include a passivating layer formed on a surface of the gallium nitride material. Lower leakage currents can result in increased power densities and operating voltages, amongst other advantages.
  • Gallium Nitride Material Transistors And Methods Associated With The Same

    view source
  • US Patent:
    20050167775, Aug 4, 2005
  • Filed:
    Aug 5, 2004
  • Appl. No.:
    10/913297
  • Inventors:
    Walter Nagy - Raleigh NC, US
    Ricardo Borges - Morrisville NC, US
    Jeffrey Brown - Charlotte NC, US
    Apurva Chaudhari - Raleigh NC, US
    James Cook - Raleigh NC, US
    Allen Hanson - Cary NC, US
    Jerry Johnson - Raleigh NC, US
    Kevin Linthicum - Cary NC, US
    Edwin Piner - Cary NC, US
    Pradeep Rajagopal - Raleigh NC, US
    John Roberts - Hillsborough NC, US
    Sameer Singhal - Apex NC, US
    Robert Therrien - Apex NC, US
    Andrei Vescan - Herzogenrath, DE
  • Assignee:
    Nitronex Corporation - Raleigh NC
  • International Classification:
    H01L029/15
  • US Classification:
    257500000
  • Abstract:
    Gallium nitride material transistors and methods associated with the same are provided. The transistors may be used in power applications by amplifying an input signal to produce an output signal having increased power. The transistors may be designed to transmit the majority of the output signal within a specific transmission channel (defined in terms of frequency), while minimizing transmission in adjacent channels. This ability gives the transistors excellent linearity which results in high signal quality and limits errors in transmitted data. The transistors may be designed to achieve low ACPR values (a measure of excellent linearity), while still operating at high drain efficiencies and/or high output powers. Such properties enable the transistors to be used in RF power applications including third generation (3G) power applications based on W-CDMA modulation.
  • Gallium Nitride Material Devices And Associated Methods

    view source
  • US Patent:
    20070272957, Nov 29, 2007
  • Filed:
    Nov 30, 2006
  • Appl. No.:
    11/607129
  • Inventors:
    Jerry Johnson - Raleigh NC, US
    Sameer Singhal - Apex NC, US
    Allen Hanson - Cary NC, US
    Robert Therrien - Apex NC, US
  • Assignee:
    Nitronex Corporation - Raleigh NC
  • International Classification:
    H01L 29/78
    H01L 21/336
  • US Classification:
    257289000, 438285000, 257E29255, 257E21401
  • Abstract:
    Gallium nitride material devices and methods associated with the same. In some embodiments, the devices may be transistors which include a conductive structure connected to a source electrode. The conductive structure may form a source field plate which can be formed over a dielectric material and can extend in the direction of the gate electrode of the transistor. The source field plate may reduce the electrical field (e.g., peak electrical field and/or integrated electrical field) in the region of the device between the gate electrode and the drain electrode which can lead to a number of advantages including reduced gate-drain feedback capacitance, reduced surface electron concentration, increased breakdown voltage, and improved device reliability. These advantages enable the gallium nitride material transistors to operate at high drain efficiencies and/or high output powers. The devices can be used in RF power applications, amongst others.

Resumes

Sameer Singhal Photo 1

President And Chief Executive Officer

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Location:
9 Braewick Pl southeast, Gurley, AL 35748
Industry:
Research
Work:
Cfd Research Corporation
President and Chief Executive Officer

Cfd Research Corporation
Vice President and Chief Operating Officer

Cfd Research Corporation May 2014 - Dec 2015
Vice President, Biomedical and Energy Technologies

Cfd Research Corporation Jun 2008 - Apr 2014
Director, Micro Power and Sensing Technologies

Nitronex Corporation Feb 2007 - May 2008
Manager, Reliability Engineering
Education:
Stanford University 1999 - 2001
Master of Science, Masters, Materials Science, Engineering
Georgia Institute of Technology 1995 - 1999
Bachelors, Bachelor of Science, Materials Science, Engineering
Skills:
Nanotechnology
Design of Experiments
Simulations
R&D
Characterization
Semiconductors
Jmp
Thin Films
Engineering Management
Silicon
Failure Analysis
Semiconductor Industry
Biomedical Engineering
Leadership
Research and Development
Rf
Sputtering
Labview
Sensors
Commercialization
Sameer Singhal Photo 2

Sameer Singhal

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Sameer Singhal Photo 3

Sameer Singhal

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Sameer Singhal Photo 4

Sameer Singhal

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Name / Title
Company / Classification
Phones & Addresses
Sameer Singhal
Sang, LLC
Real Property Investment
Huntsville, AL

Youtube

Bio-Battery: Sameer Singhal at TEDxHuntsville

Sameer Singhal is a Director in CFDRC's Biomedical and Energy Technolo...

  • Duration:
    14m 57s

CRPeople: AJ Singhal, CFD Research

The last five years he has worked alongside his twin brother, CEO Same...

  • Duration:
    2m 25s

General Studies |CDS Crash Course | Class By...

Welcome to Plutus Academy one-stop solution for Banking and CDS prepar...

  • Duration:
    28m 16s

President of India | CDS Crash Course | Gener...

Plutus Academy is a premier coaching institute in India, that aims to ...

  • Duration:
    50m 9s

Legislative, Judicial, Diplomatic, Military P...

plutusacademy #live_classes #ssc #FundamentalDuti... #Indianpolity #G...

  • Duration:
    1h 6s

L16: Parliament Part 1 | Indian Polity | |Lok...

plutusacademy #live_classes #ssc L16: Parliament Part 1 | Indian Polit...

  • Duration:
    1h 1m 31s

Myspace

Sameer Singhal Photo 5

Sameer Singhal

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Locality:
New Delhi, Delhi
Gender:
Male
Birthday:
1924

Googleplus

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Sameer Singhal

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Sameer Singhal

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Sameer Singhal

Facebook

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Sameer Singhal

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Sameer Singhal Photo 13

Sameer Singhal

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Sameer Singhal Photo 14

Sameer Singhal

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Sameer Singhal Photo 15

Sameer Singhal

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Sameer Singhal Photo 16

Sameer Singhal

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Sameer Singhal Photo 17

Sameer Kumar Singhal

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Sameer Singhal Photo 18

Sameer Singhal

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Sameer Singhal Photo 19

Sameer Singhal

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