Sandy T Chao

US Patent:

8272346, Sep 25, 2012

Filed:

Apr 10, 2009

Appl. No.:

12/421845

Inventors:

Gregory R. Bettencourt - Fremont CA, US
Gautam Bhattacharyya - Fremont CA, US
Simon Gosselin Eng - Fremont CA, US
Sandy Chao - Sunol CA, US

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

C23C 16/50
C23C 16/503
C23C 16/509
C23F 1/00
H01L 21/306
C23C 16/06
C23C 16/22

US Classification:

118723E, 15634533, 15634534, 15634543, 15634544, 15634545, 15634546, 15634547

Abstract:

An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A thermally and electrically conductive gasket with projections thereon is compressed between the showerhead electrode and the backing plate at a location three to four inches from the center of the showerhead electrode. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the electrode.

US Patent:

8419959, Apr 16, 2013

Filed:

Sep 17, 2010

Appl. No.:

12/884269

Inventors:

Gregory R. Bettencourt - Fremont CA, US
Gautam Bhattacharyya - San Ramon CA, US
Sandy Chao - Sunol CA, US
Anthony de la Llera - Fremont CA, US
Pratik Mankidy - Fremont CA, US

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

C03C 15/00
C03C 25/68
H01L 21/302
H01L 21/461
C23F 1/00
H01L 21/306

US Classification:

216 67, 438710, 15634534

Abstract:

An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the showerhead electrode.

US Patent:

8536071, Sep 17, 2013

Filed:

Aug 21, 2012

Appl. No.:

13/591039

Inventors:

Gregory R. Bettencourt - Fremont CA, US
Gautam Bhattacharyya - Fremont CA, US
Simon Gosselin - Fremont CA, US
Sandy Chao - Sunol CA, US

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

H01L 21/00
H05H 1/24
C23C 16/50
C23C 16/509
C23C 16/455
C23C 16/22

US Classification:

438798, 427569, 118723 E, 118723 R, 15634533, 15634534, 15634543, 15634544, 15634545

Abstract:

An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A thermally and electrically conductive gasket with projections thereon is compressed between the showerhead electrode and the backing plate at a location three to four inches from the center of the showerhead electrode. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the electrode.