Sang Bok Kim

US Patent:

6399462, Jun 4, 2002

Filed:

Jun 30, 1997

Appl. No.:

08/885046

Inventors:

Krishnaswamy Ramkumar - San Jose CA
Sang S. Kim - Laguna Hills CA
Sharmin Sadoughi - Cupertino CA
Pamela Trammel - San Jose CA
Avner Shelem - San Jose CA

Assignee:

Cypress Semiconductor Corporation - San Jose CA

International Classification:

H01L 2176

US Classification:

438439, 438297, 438424, 438425

Abstract:

A method of forming a field oxide or isolation region in a semiconductor die. A nitride layer (over an oxide layer disposed over a substrate) is patterned and subsequently etched so that the nitride layer has a nearly vertical sidewall. The oxide layer and the substrate in the isolation region are etched to form a recess in the substrate having a sloped surface with respect to the nearly vertical sidewall of the nitride layer. A field oxide is then grown in the recess using a high pressure, dry oxidizing atmosphere. The sloped sidewall of the substrate effectively moves the face of the exposed substrate away from the edge of the nitride layer sidewall. Compared to non-sloped techniques, the oxidation appears to start with a built-in offset from the patterned etch. This leads to a reduction of oxide encroachment and a nearly non-existent birds beak. The desirable range of slopes for the substrate sidewall is approximately 50Â-80Â with respect to a nearly planar surface of the substrate in the recess.

US Patent:

6546412, Apr 8, 2003

Filed:

Nov 7, 1997

Appl. No.:

08/966381

Inventors:

Sang W. Kim - Lawndale CA
David P. Nesbitt - Redondo Beach CA
Steve A. Okamoto - Torrance CA
Jennifer D. Thomas - Hermosa Beach CA

Assignee:

Xerox Corporation - Stamford CT

International Classification:

G06F 900

US Classification:

709104, 709107

Abstract:

Temporary states are used transitionally in run-time situations and are unknown to the object database. A temporary state is created if, when an object is performing a requested event, interim work needs to be performed before the object reaches a permanent destination state. Use of a temporary state is transparent to the caller of the requested event. Within a single flow of control, an unlimited number of nested locks may be acquired. A request to unlock an object will only truly unlock the object if the unlock requester is at the highest level of locking. For recursive or embedded functions, no knowledge of the previous locking condition is necessary. Attribute-based locking provides a mechanism for allowing only certain members of the system to lock an object for writing while the object is in a predetermined state. However, any thread may obtain a read lock on an object in order to examine its attributes. This may be expanded to state that the system may restrict locking of an object or entity based upon any attribute in the database or upon any combination or logical expression of these attributes.

US Patent:

6971100, Nov 29, 2005

Filed:

Apr 5, 2002

Appl. No.:

10/115914

Inventors:

Sang W. Kim - Lawndale CA, US
David P. Nesbitt - Redondo Beach CA, US
Steve A. Okamoto - Torrance CA, US
Jennifer D. Thomas - Hermosa Beach CA, US

Assignee:

Xerox Corporation - Stamford CT

International Classification:

G06F009/46

US Classification:

718102

Abstract:

Temporary states are used transitionally in run-time situations and are unknown to the object database. A temporary state is created if, when an object is performing a requested event, interim work needs to be performed before the object reaches a permanent destination state. Use of a temporary state is transparent to the caller of the requested event.

US Patent:

8203805, Jun 19, 2012

Filed:

Mar 5, 2009

Appl. No.:

12/398909

Inventors:

Weidong Huang - San Jose CA, US
Sang Hoon Kim - Berkeley CA, US
Charles M. Mate - San Jose CA, US

Assignee:

Hitachi Global Storage Technologies Netherlands B.V. - Amsterdam

International Classification:

G11B 5/60

US Classification:

3602354, 360 75, G9B 5229, G9B 21003

Abstract:

A method and apparatus for controlling lubrication in hard disk drives. Hard disk drives often include lubrication on the disks to protect the disks from incidental contact with the head slider. Embodiments of the invention include lubrication control recesses on the air bearing surface (ABS) of the head slider. The recesses reduce air stagnation on the ABS and/or store excess lubrication that migrates from the disk to the head slider. By reducing build-up of lubrication and storing excess lubrication, the lubrication control recesses avoid failure that may occur as a result of the lubrication interfering with the ABS or the read/write elements of the head.

US Patent:

8529776, Sep 10, 2013

Filed:

Jul 25, 2011

Appl. No.:

13/190378

Inventors:

Kyeong Tae Lee - Los Gatos CA, US
Sang Wook Kim - Palo Alto CA, US
Daehee Weon - Cupertino CA, US
Sang-jun Choi - Santa Clara CA, US
Jahyong Kuh - San Jose CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

C03C 15/00

US Classification:

216 41, 438570, 438583, 438706, 438710, 438737

Abstract:

A layer stack over a substrate is etched using a photoresist pattern deposited on the layer stack as a first mask. The photoresist pattern is in-situ cured using plasma. At least a portion of the photoresist pattern can be modified by curing. In one embodiment, silicon by-products are formed on the photoresist pattern from the plasma. In another embodiment, a carbon from the plasma is embedded into the photoresist pattern. In yet another embodiment, the plasma produces an ultraviolet light to cure the photoresist pattern. The cured photoresist pattern is slimmed. The layer stack is etched using the slimmed photoresist pattern as a second mask.

US Patent:

20090098513, Apr 16, 2009

Filed:

Oct 15, 2007

Appl. No.:

11/974482

Inventors:

Sang Ki Kim - Anaheim CA, US

International Classification:

A61C 5/09
A61C 5/10

US Classification:

4332221, 433223

Abstract:

A coping material for a prosthetic crown is provided. The coping material according to current application is comprised of two portions which are mechanically bonded each other. The first portion is the main coping portion that is located beneath of the enamel layer of a crown. The first portion is made from, including but not limited to, common metal and/or portion fused gold (PFG). The second is the portion which makes contact with gum tissue. That portion surrounds the brim of the bottom of the coping for 360 degrees. The gum contacting portion is comprised of bio-gold that is mechanically bonded to the main coping portion. Centrifuging of molten bio-gold technology is applied for mechanical bonding of the two portions. Electronic forming technology is also applied for mechanical bonding.

US Patent:

20090159763, Jun 25, 2009

Filed:

Dec 20, 2007

Appl. No.:

11/961979

Inventors:

Sang Kwon Kim - Culver City CA, US

International Classification:

F16M 11/00

US Classification:

248174, 2481761

Abstract:

A portable laptop stand comprising a generally rectangular flat board having a longitudinal axis perpendicular to a width of the board; said board having a distal end; said board having a proximal end; said board having a first portion, a second portion pivotably coupled to the first portion, and a main body pivotably coupled to the second portion; wherein the first portion has a longitudinal axis that is perpendicular to the longitudinal axis of the board; wherein the second portion has a longitudinal axis that is perpendicular to the longitudinal axis of the board; wherein said first portion is capable of folding back towards the main body and contact the main body. The board having a first attachment means disposed on the first portion; and a second attachment means disposed on the main body to detachably attach to said first attachment means.

US Patent:

20130319614, Dec 5, 2013

Filed:

Aug 6, 2013

Appl. No.:

13/960760

Inventors:

Sang Wook Kim - Palo Alto CA, US
Daehee Weon - Cupertino CA, US
Sang-jun Choi - Santa Clara CA, US
Jahyong Kuh - San Jose CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

H01L 21/02

US Classification:

15634524

Abstract:

A layer stack over a substrate is etched using a photoresist pattern deposited on the layer stack as a first mask. The photoresist pattern is in-situ cured using plasma. At least a portion of the photoresist pattern can be modified by curing. In one embodiment, silicon by-products are formed on the photoresist pattern from the plasma. In another embodiment, a carbon from the plasma is embedded into the photoresist pattern. In yet another embodiment, the plasma produces an ultraviolet light to cure the photoresist pattern. The cured photoresist pattern is slimmed. The layer stack is etched using the slimmed photoresist pattern as a second mask.