Seonkyung K Lee

US Patent:

8432949, Apr 30, 2013

Filed:

Sep 14, 2010

Appl. No.:

12/881987

Inventors:

W. Terry Rawlins - Reading MA, US
David B. Oakes - Reading MA, US
Seonkyung Lee - Boston MA, US
Steven J. Davis - Londonderry NH, US

Assignee:

Physical Sciences Inc. - Andover MA

International Classification:

H01S 3/22

US Classification:

372 58, 372 55, 372 60, 372 76

Abstract:

A laser device includes an optical resonator, a microwave driven discharge device, and a source for a second gas. The microwave driven discharge device is disposed relative to the optical resonator. The microwave driven discharge device operates at a discharge power and gas flow rate to produce a selected amount of energetic singlet oxygen metastables flowing in the direction of the optical resonator. The second source for the second gas is disposed between the optical resonator and the microwave driven discharge device. The second gas reacts with the selected amount of energetic singlet oxygen metastables to form an excited species in an amount sufficient to support lasing of the excited species in the optical resonator.

US Patent:

20090323743, Dec 31, 2009

Filed:

Jan 22, 2008

Appl. No.:

12/018162

Inventors:

W. Terry Rawlins - Reading MA, US
David B. Oaks - Reading MA, US
Seonkyung Lee - Boston MA, US
Steven J. Davis - Londonderry NH, US

International Classification:

H01S 3/223
H01S 3/22
H01S 3/04

US Classification:

372 35, 372 58

Abstract:

A laser device includes an optical resonator, a microwave driven discharge device, and a source for a second gas. The microwave driven discharge device is disposed relative to the optical resonator. The microwave driven discharge device operates at a discharge power and gas flow rate to produce a selected amount of energetic singlet oxygen metastables flowing in the direction of the optical resonator. The second source for the second gas is disposed between the optical resonator and the microwave driven discharge device. The second gas reacts with the selected amount of energetic singlet oxygen metastables to form an excited species in an amount sufficient to support lasing of the excited species in the optical resonator.

US Patent:

20130259769, Oct 3, 2013

Filed:

Jun 26, 2009

Appl. No.:

12/492912

Inventors:

W. Terry Rawlins - Reading MA, US
Seonkyung Lee - Boston MA, US
Steven J. Davis - Londonderry NH, US

International Classification:

C01B 13/02
H01S 3/03

US Classification:

422211, 372 55, 422129, 423579

Abstract:

Singlet oxygen metastables can be formed. A catalytic coating is formed on an interior surface of a flow reactor, and an oxygen containing species is flowed into the flow reactor to produce singlet oxygen metastables by a chemical reaction in the presence of the catalytic coating.

US Patent:

20220334554, Oct 20, 2022

Filed:

Apr 15, 2022

Appl. No.:

17/659458

Inventors:

- Fremont CA, US
Seonkyung Lee - Santa Clara CA, US
Rajan Arora - Portland OR, US
Jorge Luque - Redwood City CA, US

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

G05B 19/4099

Abstract:

A large beam spot spectral reflectometer system for measuring a substrate is provided. Hardware components for collecting in situ large beam spot optical signals is disclosed. Machine learning models for denoising large beam spot optical signals are disclosed. Machine learning models for interpreting in situ optical data and facilitating process control are also disclosed.

US Patent:

20170338160, Nov 23, 2017

Filed:

Aug 3, 2017

Appl. No.:

15/667978

Inventors:

- Fremont CA, US
Luc Albarede - Fremont CA, US
Jorge Luque - Redwood City CA, US
Seonkyung Lee - Mountain View CA, US
Thorsten Lill - Santa Clara CA, US

International Classification:

H01L 21/66
H01L 21/308
H01L 21/3065
H01L 21/311
H01L 21/3105

Abstract:

A method for dry processing a substrate in a processing chamber is provided. The substrate is placed in the processing chamber. The substrate is dry processed, wherein the dry processing creates at least one gas byproduct. A concentration of the at least one gas byproduct is measured. The concentration of the at least one gas byproduct is used to determine processing rate of the substrate.

US Patent:

20170200592, Jul 13, 2017

Filed:

Mar 28, 2017

Appl. No.:

15/471661

Inventors:

- Fremont CA, US
Tony San - Sunnyvale CA, US
Seonkyung Lee - San Ramon CA, US

International Classification:

H01J 37/32
G01J 1/42

Abstract:

A system and method monitoring a plasma with an optical sensor to determine the operations of a pulsed RF signal for plasma processing including a plasma chamber with an optical sensor directed toward a plasma region. An RF generator coupled to the plasma chamber through a match circuit. An RF timing system coupled to the RF generator. A system controller is coupled to the plasma chamber, the RF generator, the optical sensor, the RF timing system and the match circuit. The system controller includes a central processing unit, a memory system, a set of RF generator settings and an optical pulsed plasma analyzer coupled to the optical sensor and being capable to determine a timing of a change in state of an optical emission received in the optical sensor and/or a set of amplitude statistics corresponding to an amplitude of the optical emission received in the optical sensor.

US Patent:

20170084503, Mar 23, 2017

Filed:

Sep 23, 2015

Appl. No.:

14/862983

Inventors:

- Fremont CA, US
Luc Albarede - Fremont CA, US
Jorge Luque - Redwood City CA, US
Seonkyung Lee - Mountain View CA, US
Thorsten Lill - Santa Clara CA, US

International Classification:

H01L 21/66
H01L 21/311
H01L 21/3065

Abstract:

A method for dry processing a substrate in a processing chamber is provided. The substrate is placed in the processing chamber. The substrate is dry processed, wherein the dry processing creates at least one gas byproduct. A concentration of the at least one gas byproduct is measured. The concentration of the at least one gas byproduct is used to determine processing rate of the substrate.

US Patent:

20160064199, Mar 3, 2016

Filed:

Nov 25, 2014

Appl. No.:

14/554006

Inventors:

- Fremont CA, US
Tony San - Sunnyvale CA, US
Seonkyung Lee - San Ramon CA, US

International Classification:

H01J 37/32
G01J 1/44

Abstract:

A system and method monitoring a plasma with an optical sensor to determine the operations of a pulsed RF signal for plasma processing including a plasma chamber with an optical sensor directed toward a plasma region. An RF generator coupled to the plasma chamber through a match circuit. An RF timing system coupled to the RF generator. A system controller is coupled to the plasma chamber, the RF generator, the optical sensor, the RF timing system and the match circuit. The system controller includes a central processing unit, a memory system, a set of RF generator settings and an optical pulsed plasma analyzer coupled to the optical sensor and being capable to determine a timing of a change in state of an optical emission received in the optical sensor and/or a set of amplitude statistics corresponding to an amplitude of the optical emission received in the optical sensor.