Nxp Semiconductors May 2013 - Aug 2018
Adas Systems and Applications Manager
On Semiconductor May 2013 - Aug 2018
Director, Radar Systems and Applications
Freescale Semiconductor Nov 2010 - May 2013
Senior Member of Technical Staff, Automotive Radar
Freescale Semiconductor Jan 2008 - Nov 2010
Automotive Radar Program Manager
Freescale Semiconductor Jul 2005 - Dec 2007
Principal Research Engineer
Education:
University of Michigan 1996 - 2001
Doctorates, Doctor of Philosophy, Electrical Engineering
Auburn University 1993 - 1996
Masters, Master of Science In Electrical Engineering, Electrical Engineering
Auburn University 1989 - 1993
Bachelors, Bachelor of Science In Electrical Engineering, Electrical Engineering
Skills:
Semiconductors Ic Simulations Sensors Electronics Mems Analog Circuit Design Analog Rf Mixed Signal Matlab Cmos Antennas Silicon R&D Circuit Design Asic Physics Failure Analysis Electrical Engineering Signal Processing Digital Signal Processors Systems Engineering Soc Verilog Pcb Design Radio Frequency
Sergio B Pacheco MD PA 1900 N Oregon St STE 410, El Paso, TX 79902 9155321922 (phone), 9152071180 (fax)
Education:
Medical School Univ Auto De Nuevo Leon, Fac De Med, Monterrey, Nuevo Leon, Mexico Graduated: 1963
Conditions:
Intervertebral Disc Degeneration
Languages:
English Spanish
Description:
Dr. Pacheco graduated from the Univ Auto De Nuevo Leon, Fac De Med, Monterrey, Nuevo Leon, Mexico in 1963. He works in El Paso, TX and specializes in Surgery , Neurological.
Lianjun Liu - Gilbert AZ, US Qiang Li - Gilbert AZ, US Melvy F. Miller - Tempe AZ, US Sergio P. Pacheco - Phoenix AZ, US
Assignee:
Freescale Semiconductor, Inc. - Austin TX
International Classification:
H01L 21/338 H01L 21/337 H01L 21/8222 H01L 21/20
US Classification:
438329, 438171, 438190, 438210, 438393
Abstract:
An impedance matching network is integrated on a first die and coupled to a second die, with the first and second dies mounted on a conductive back plate. The impedance matching network comprises a first inductor bridging between the first and second dies, a second inductor coupled to the first inductor and disposed on the first die, and a metal-insulator-metal (MIM) capacitor disposed on the first die. The MIM capacitor has a first metal layer coupled to the second inductor, and a second metal layer grounded to the conductive back plate. A method for manufacturing the integrated impedance matching network comprises the steps of forming an inductor on a die, forming a capacitor on the die, coupling the capacitor to the inductor, coupling the die bottom surface and the capacitor to a conductive plate, and coupling the inductor to another inductor that bridges between the die and another die.
Method For Manufacturing A Passive Integrated Matching Network For Power Amplifiers
Lianjun Liu - Gilbert AZ, US Qiang Li - Gilbert AZ, US Melvy F. Miller - Tempe AZ, US Sergio P. Pacheco - Phoenix AZ, US
Assignee:
Freescale Semiconductor, Inc. - Austin TX
International Classification:
H01L 29/00
US Classification:
257528, 257531, 257532
Abstract:
An impedance matching network is integrated on a first die and coupled to a second die, with the first and second dies mounted on a conductive back plate. The impedance matching network comprises a first inductor bridging between the first and second dies, a second inductor coupled to the first inductor and disposed on the first die, and a metal-insulator-metal (MIM) capacitor disposed on the first die. The MIM capacitor has a first metal layer coupled to the second inductor, and a second metal layer grounded to the conductive back plate. A method for manufacturing the integrated impedance matching network comprises the steps of forming an inductor on a die, forming a capacitor on the die, coupling the capacitor to the inductor, coupling the die bottom surface and the capacitor to a conductive plate, and coupling the inductor to another inductor that bridges between the die and another die.
Electromechanical Transducer Device And Method Of Forming A Electromechanical Transducer Device
Francois Perruchot - Grenoble, FR Emmanuel Defay - Voreppe, FR Patrice Rey - Saint Jean Moirans, FR Lianjun Liu - Chandler AZ, US Sergio Pacheco - Scottsdale AZ, US
Assignee:
Freescale Semiconductor, Inc. - Austin TX Commissariat à l'Energie Atomique et aux Energies Alternatives (CEA) - Paris
A micro or nano electromechanical transducer device formed on a semiconductor substrate comprises a movable structure which is arranged to be movable in response to actuation of an actuating structure. The movable structure comprises a mechanical structure comprising at least one mechanical layer having a first thermal response characteristic and a first mechanical stress response characteristic, at least one layer of the actuating structure, the at least one layer having a second thermal response characteristic different to the first thermal response characteristic and a second mechanical stress response characteristic different to the first mechanical stress response characteristic, a first compensation layer having a third thermal response characteristic and a third mechanical stress characteristic, and a second compensation layer having a fourth thermal response characteristic and a fourth mechanical stress response characteristic. The first and second compensation layers are arranged to compensate a thermal effect produced by the different first and second thermal response characteristics of the mechanical structure and the at least one layer of the actuating structure such that movement of the movable structure is substantially independent of variations in temperature and to adjust a stress effect produced by the different first and second stress response characteristics of the mechanical structure and the at least one layer of the actuating structure such that the movable structure is deflected a predetermined amount relative to the substrate when the electromechanical transducer device is in an inactive state.
Method Of Forming An Electromechanical Transducer Device
Francois Perruchot - Grenoble, FR Lianjun Liu - Chandler AZ, US Sergio Pacheco - Scottsdale AZ, US Emmanuel Defay - Voreppe, FR Patrice Rey - Saint Jean de Moirans, FR
Assignee:
Freescale Semiconductor, Inc. - Austin TX Commissariat à l'Energie Atomique et aux Energies Alternatives (CEA) - Paris
A method of forming an electromechanical transducer device comprises forming on a fixed structure a movable structure and an actuating structure of the electromechanical transducer device, wherein the movable structure is arranged in operation of the electromechanical transducer device to be movable in relation to the fixed structure in response to actuation of the actuating structure. The method further comprises providing a stress trimming layer on at least part of the movable structure, after providing the stress trimming layer, releasing the movable structure from the fixed structure to provide a released electromechanical transducer device, and after releasing the movable structure changing stress in the stress trimming layer of the released electromechanical transducer device such that the movable structure is deflected a predetermined amount relative to the fixed structure when the electromechanical transducer device is in an off state.
Electromechanical Resonator And Method Of Operating Same
Peter Zurcher - Phoenix AZ, US Rashaunda Henderson - Chandler AZ, US Sergio Pacheco - Chandler AZ, US
International Classification:
H03H009/15
US Classification:
333186000, 438050000
Abstract:
An electromechanical resonator includes a substrate (), an anchor () coupled to the substrate, a beam () coupled to the anchor and suspended over the substrate, and a drive electrode () coupled to the substrate and separated from the beam by a gap (). The beam has a first surface (), a second surface (), and a third surface (). The first surface defines a width and a height, the second surface defines the height and a length, and the third surface defines the length and the width. The width, height, and length are substantially mutually perpendicular, and the beam resonates substantially only in compression mode and substantially only along an axis defined by the length.
Electromechanical Transducer Device And Method Of Forming A Electromechanical Transducer Device
Lianjun Liu - Chandler AZ, US Sergio Pacheco - Scottsdale AZ, US Francois Perruchot - Grenoble, FR Emmanuel Defay - Voreppe, FR Patrice Rey - Saint Jean De Moirans, FR
Assignee:
Freescale Semiconductors, Inc. - Austin TX COMMISSARIAT A LENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES - Paris
International Classification:
H01L 41/04
US Classification:
310325
Abstract:
A micro or nano electromechanical transducer device formed on a semiconductor substrate comprises a movable structure which is arranged to be movable in response to actuation of an actuating structure. The movable structure comprises a mechanical structure having at least one mechanical layer having a first thermal response characteristic, at least one layer of the actuating structure having a second thermal response characteristic different to the first thermal response characteristic, and a thermal compensation structure having at least one thermal compensation layer. The thermal compensation layer is different to the at least one layer and is arranged to compensate a thermal effect produced by the mechanical layer and the at least one layer of the actuating structure such that the movement of the movable structure is substantially independent of variations in temperature.
Shielded Device Packages Having Antennas And Related Fabrication Methods
EDUARD J. PABST - MESA AZ, US SERGIO P. PACHECO - SCOTTSDALE AZ, US WENG F. YAP - CHANDLER AZ, US
International Classification:
H01L 23/552 H01L 21/768 H01L 23/66 H01L 23/522
Abstract:
Shielded device packages and related fabrication methods are provided. An exemplary device package includes one or more electrical components, a molding compound overlying the one or more electrical components, a conductive interconnect structure within the molding compound, a conductive frame structure laterally surrounding the one or more electrical components and the interconnect structure, and a shielding structure overlying the one or more electrical components. The shielding structure is electrically connected to the frame structure and at least a portion of the molding compound resides between the shielding structure and the one or more electrical components.
Name / Title
Company / Classification
Phones & Addresses
Sergio Pacheco Director
CENTER FOR HARMONY AND GRACE
8327 E Desert Cv Ave, Scottsdale, AZ 85260 Director 8638 E Buena Tierra Way, Scottsdale, AZ 85250
Alhambra, CAAgent at Century 21 Powerhouse Past: Branch Manger at Bristol Home Loans, Account Manager at Independent Mortgage, Account... www.pachecofinancial.com
Goethe Elementary School Chicago IL 1974-1979, Ida M. Fisher Junior High School Miami Beach FL 1979-1979, Ida M. Fisher Middle School Miami Beach FL 1979-1979
That starts with the brutal workouts with Sergio Pacheco at Physique World Gym in Hialeah. Pacheco has Gonzalez doing upside-down abdominal workouts while wearing ankle weights, and he's running with car tires on his back. Gonzalez said that Pacheco would like him to report at 220 pounds, 10 pounds