- Dallas TX, US James Norman HALL - Parker TX, US Kelly Jay TAYLOR - Allen TX, US Song ZHENG - Fairview TX, US
International Classification:
G02B 26/08 H02N 1/00
Abstract:
A system includes a hinge structure. The hinge structure includes four support posts and four hinges, each hinge coupled to an edge of a support post and to a plate of the hinge structure, where each hinge includes two 90° turns. The system also includes a mirror coupled to the hinge structure and an electrode structure coupled to the hinge structure.
Multi-Level Microelectromechanical System Structure With Non-Photodefinable Organic Polymer Spacer Layers
- Dallas TX, US Song ZHENG - Fairview TX, US Kelly Jay TAYLOR - Allen TX, US Jose Antonio MARTINEZ SOTO - Murphy TX, US
International Classification:
B81C 1/00
Abstract:
In an example, a method includes depositing an organic polymer layer on one or more material layers. The method also includes thermally curing the organic polymer layer. The method includes depositing a hard mask on the organic polymer layer and depositing a photoresist layer on the hard mask. The method also includes patterning the photoresist layer to expose at least a portion of the hard mask. The method includes etching the exposed portion of the hard mask to expose at least a portion of the organic polymer layer. The method also includes etching the exposed portion of the organic polymer layer to expose at least a portion of the one or more material layers.
Methods And Apparatus To Control Grayscale Photolithography
A die includes a resist layer located over a semiconductor substrate, and a pattern developed in the resist layer. The pattern includes a plurality of locations of developed photoresist, each location of developed photoresist separated from a neighboring location of developed photoresist by a portion of undeveloped photoresist, and the developed photoresist at each location having a corresponding different thickness.
Methods And Apparatus To Control Grayscale Photolithography
- Dallas TX, US Song Zheng - Allen TX, US Chris Murray Beard - Allen TX, US Noppawan Boorananut - Plano TX, US
International Classification:
G03F 1/44 H01L 21/027 B81C 1/00 G03F 7/20
Abstract:
Methods and apparatus to control grayscale lithography are disclosed. A disclosed example apparatus for adjusting a grayscale lithography process includes an optical measurement device to optically measure portions of a patterned wafer, and a processor to calculate a profile based on the measured portions, and to determine an adjustment of the grayscale lithography process based on the calculated profile. The disclosed apparatus also includes an adjuster to control the grayscale lithography process based on the adjustment.
Song Zheng - Representative - Usana- the Best! - Los Angeles - UCLA - Hi! I will update this bio soon! Currently, I don't have much to talk about myself... Except ...