Stephen R Garner

US Patent:

20210269919, Sep 2, 2021

Filed:

Dec 22, 2020

Appl. No.:

17/131315

Inventors:

- Santa Clara CA, US
Sathya Swaroop GANTA - Sunnyvale CA, US
Timothy Joseph FRANKLIN - Campbell CA, US
Akshay DHANAKSHIRUR - Hubli, IN
Stephen C. GARNER - Newark CA, US
Bhaskar KUMAR - San Jose CA, US

International Classification:

C23C 16/52
H01J 37/32
C23C 16/54

Abstract:

Embodiments described herein relate to magnetic and electromagnetic systems and a method for controlling the density profile of plasma generated in a process volume of a PECVD chamber to affect deposition profile of a film on a substrate and/or facilitate chamber cleaning after processing. In one embodiment, a system is disclosed that includes a rotational magnetic housing disposed about an exterior sidewall of a chamber. The rotational magnetic housing includes a plurality of magnets coupled to a sleeve that are configured to travel in a circular path when the rotational magnetic housing is rotated around the chamber, and a plurality of shunt doors movably disposed between the chamber and the sleeve, wherein each of the shunt doors are configured to move relative to the magnets.

US Patent:

20210050189, Feb 18, 2021

Filed:

Aug 14, 2020

Appl. No.:

16/993759

Inventors:

- Santa Clara CA, US
Abhijit B. Mallick - Fremont CA, US
Pramit Manna - Santa Clara CA, US
Eswaranand Venkatasubramanian - Santa Clara CA, US
Timothy Joseph Franklin - Campbell CA, US
Edward Haywood - Santa Clara CA, US
Stephen C. Garner - Newark CA, US

International Classification:

H01J 37/32
C23C 16/509

Abstract:

Embodiments described herein provide magnetic and electromagnetic housing systems and a method for controlling the properties of plasma generated in a process volume of a process chamber to affect deposition properties of a film. In one embodiment, the method includes rotation of the rotational magnetic housing about a center axis of the process volume to create dynamic magnetic fields. The magnetic fields modify the shape of the plasma, concentration of ions and radicals, and movement of concentration of ions and radicals to control the density profile of the plasma. Controlling the density profile of the plasma tunes the uniformity and properties of a deposited or etched film.

US Patent:

20200370177, Nov 26, 2020

Filed:

May 18, 2020

Appl. No.:

16/876845

Inventors:

- Santa Clara CA, US
Adam FISCHBACH - Campbell CA, US
Edward HAYWOOD - Santa Clara CA, US
Abhijit B. MALLICK - Fremont CA, US
Pramit MANNA - Santa Clara CA, US
Carlaton WONG - Sunnyvale CA, US
Stephen C. GARNER - Newark CA, US
Eswaranand VENKATASUBRAMANIAN - Santa Clara CA, US

International Classification:

C23C 16/458
H01J 37/32
C23C 16/46
C23C 16/455
C23C 16/50

Abstract:

Embodiments of the present disclosure generally relate to apparatus and methods utilized in the manufacture of semiconductor devices. More particularly, embodiments of the present disclosure relate to a substrate processing chamber, and components thereof, for forming semiconductor devices.

US Patent:

20200144029, May 7, 2020

Filed:

Nov 1, 2019

Appl. No.:

16/671330

Inventors:

- Santa Clara CA, US
Samuel E. GOTTHEIM - Santa Clara CA, US
Timothy Joseph FRANKLIN - Campbell CA, US
Pramit MANNA - Santa Clara CA, US
Eswaranand VENKATASUBRAMANIAN - Santa Clara CA, US
Edward HAYWOOD - Santa Clara CA, US
Stephen C. GARNER - Newark CA, US

International Classification:

H01J 37/32
C23C 16/505
C23C 16/455
H01L 21/02
H01L 21/3065

Abstract:

Embodiments described herein relate to magnetic and electromagnetic systems and a method for controlling the density profile of plasma generated in a process volume of a PECVD chamber to affect deposition profile of a film. In one embodiment, a plurality of retaining brackets is disposed in a rotational magnetic housing of the magnetic housing systems. Each retaining bracket of the plurality of retaining brackets is disposed in the rotational magnetic housing with a distance d between each retaining bracket. The plurality of retaining brackets has a plurality of magnets removably disposed therein. The plurality of magnets is configured to travel in a circular path when the rotational magnetic housing is rotated around the round central opening.

US Patent:

20150176117, Jun 25, 2015

Filed:

Dec 20, 2013

Appl. No.:

14/137807

Inventors:

- San Jose CA, US
Timothy Franklin - Campbell CA, US
Stephen Charles Garner - Newark CA, US
James Tsung - Milpitas CA, US

Assignee:

Intermolecular, Inc. - San Jose CA

International Classification:

C23C 14/46
H01J 37/34

Abstract:

In some embodiments, apparatus are provided that provide for flexible processing in both high productivity combinatorial (HPC) and full wafer modes. The apparatus allow for interchangeable functionality that includes deposition with different sizes of targets, plasma treatment, ion beam treatment, and in-situ metrology. The functional modules are designed so that the modules may be interchanged with minimal effort and reduced system downtime.