Stephen Rodriguez

US Patent:

56270100, May 6, 1997

Filed:

Apr 15, 1994

Appl. No.:

8/228187

Inventors:

Daniel Y. Pai - Millbury MA
Stephen S. Rodriguez - Monument Beach MA
Kevin J. Cheetham - Millbury MA
Gary S. Calabrese - North Andover MA
Roger F. Sinta - Woburn MA

Assignee:

Shipley Company, L.L.C. - Marlborough MA

International Classification:

G03C 173
G03F 7031
G03F 7032

US Classification:

4302701

Abstract:

A radiation sensitive composition, process for using said composition, and substrates coated with said composition. The photoimageable composition comprises a photobase generator compound, a resin binder and a material capable of crosslinking in the presence of base. In preferred aspects, the invention provides a negative-acting, aqueous developable photoimageable composition comprising a photobase generator compound, a resin binder which preferably is a phenolic polymer, a crosslinking agent that comprises one or more active groups that will undergo base-initiated crosslinking, and a curing agent.

US Patent:

53842294, Jan 24, 1995

Filed:

May 7, 1992

Appl. No.:

7/879598

Inventors:

Daniel Y. Pai - Millbury MA
Stephen S. Rodriguez - Monument Beach MA
Roger F. Sinta - Woburn MA

Assignee:

Shipley Company Inc. - Marlborough MA

International Classification:

G03C 1492

US Classification:

430270

Abstract:

The present invention provides photoimageable compositions, processes and articles of manufacture. In particular, the invention provides a process comprising electrophoretically applying a coating layer of a photoimageable composition onto a conductive surface, the composition comprising a material that contains one or more photoacid labile groups. The photoimageable compositions of the invention preferably comprise a photoacid generator, a material that contains one or more acid-clearable functional groups, and a carrier resin that contains one or more functional groups that are, or can be treated to be, at least partially ionized.