Humana - Louisville, Kentucky Area since Jun 2012
Benefits Analyst
PharMerica Jun 2010 - Jun 2012
Financial Analyst
PharMerica Jun 2010 - Feb 2011
Business and Pricing Analyst
Education:
Bellarmine University 2010 - 2012
MBA
University of Kentucky 2003 - 2008
B.A., Finance
Male High School
Principal Process Engineer / VP at X-Body Biosciences
Location:
United States
Industry:
Nanotechnology
Work:
X-Body Biosciences since 2012
Principal Process Engineer / VP
SRU Biosystems - Woburn MA 2002 - Dec 2011
Principal Process Development Engineer / Director Manufacturing
3M Touch Systems ( formerly MicroTouch Systems) 1997 - 2002
Sr. Process Engineer
SAGE Electrochromics, Inc. 1994 - 1997
Manager Pilot Development and Operations
BOC Coating Technology 1990 - 1994
Sr. Process Engineer
Education:
Tufts University 1985 - 1988
University of Michigan 1980 - 1984
Skills:
Thin Films Design of Experiments Process Development Experimental Design Analysis Structures Materials Science Engineering Manufacturing Coatings Commercialization MEMS R&D Characterization Nanotechnology Chemistry Biotechnology Technology Transfer Spectroscopy Scanning Electron Microscopy Polymers
A method and apparatus for improving uniformity of the rate of removal of material from the surface of a workpiece, such as semiconductor substrate, by polishing. In accordance with the invention, the workpiece is subjected to a vibratory polishing method, and optionally at least one additional polishing motion selected from rotational, oscillating, sweeping, orbital and linear polishing motions. As a result, polished workpieces, such as semiconductor wafers, have reduced surface defects, improved planarity, and are polished more uniformly over a wider area.
Abrasive Free Polishing In Copper Damascene Applications
Saket Chadda - Phoenix AZ, US Stephen Schulz - Gilbert AZ, US Timothy Dyer - Tempe AZ, US
International Classification:
B24B007/22
US Classification:
451/059000
Abstract:
An abrasive free wafer polishing device utilizing an abrasive free chemical solution includes a workpiece fixture (), a brush assembly () and a high flow rate fluid dispenser (). The fluid dispenser () dispenses an abrasive free chemical solution to an interface at which the workpiece and the brush assembly come into contact with a flow rate of at least 50 ml/min. The abrasive free chemical solution and brush assembly () operate to chemically react with a metal (e.g. copper) on the workpiece and abrade away the reacted copper during a polishing process.
For the open state 80th House District seat, Cindy Gamrat won the GOP Primary with 3,836 votes (41%), followed by Mary Whiteford (2,738), Stephen Schulz (2,432) and Randy Brink (419). She will face Democrat Geoff Parker in the November 4th General Election.
Stephen Schulz (1956-1960), Marc Sawyer (1992-1996), John Walsh (1961-1965), Frank Cinelli (1974-1978), Douglas Dailey (1979-1983), Christopher Hanna (1984-1988)
Steve Schulz (1985-1989), John Holmes (1978-1982), Rachel Lee (1993-1997), Nicholas Klotz (2003-2007), Brian Berg (1976-1980), Marian Vonderheide (1970-1974)