Steven Scott Hansen

US Patent:

6839125, Jan 4, 2005

Filed:

Feb 11, 2003

Appl. No.:

10/361831

Inventors:

Steven George Hansen - Phoenix AZ, US

Assignee:

ASML Netherlands B.V. - Veldhoven

International Classification:

G03B 2754
G03B 2742
G03B 2772
G03B 2732
G06F 1750

US Classification:

355 67, 355 53, 355 71, 355 77, 703 13, 430 30

Abstract:

A method for optimizing the illumination conditions of a lithographic apparatus by computer simulation using full resist calculation, the lithographic apparatus comprising an illuminator, a projection system, and a mask having a pattern to be printed in a layer of photoresist material formed on a substrate. This method includes defining a lithographic 0problem, which may include a lithographic pattern to be printed on a wafer; choosing a resist model of a resist process to be used to print a pattern in the layer of photoresist material; selecting a grid of source points in a pupil plane of the illuminator; calculating separate responses for individual source points, each of the responses representing a result of a single or series of simulations using the resist model; and adjusting an illumination arrangement based on analysis of accumulated results of the separate calculations.

US Patent:

7016017, Mar 21, 2006

Filed:

Nov 20, 2003

Appl. No.:

10/716439

Inventors:

Steven George Hansen - Phoenix AZ, US

Assignee:

ASML Netherlands B.V. - Veldhoven

International Classification:

G03B 27/54
G03B 27/42
G03B 27/32
G06F 17/50
G03C 5/00

US Classification:

355 67, 355 53, 355 55, 355 77, 703 13, 430 30

Abstract:

A method for optimizing the illumination conditions of a lithographic apparatus by computer simulation using isofocal compensation, the lithographic apparatus including an illuminator, a projection system and a mask having at least one pattern to be printed on a substrate. This method includes defining a lithographic pattern to be printed on the substrate, selecting a simulation model, selecting a grid of source points in a pupil plane of the illuminator, calculating separate responses for individual source points, each of the responses representing a result of a single or series of simulations using the simulation model, calculating a metric representing variation of the separate responses for individual source points with defocus and adjusting an illumination arrangement based on analysis of the metric.

US Patent:

7030966, Apr 18, 2006

Filed:

Feb 9, 2004

Appl. No.:

10/773397

Inventors:

Steven George Hansen - Phoenix AZ, US

Assignee:

ASML Netherlands B.V. - Veldhoven

International Classification:

G03B 27/54
G03B 27/42
G03B 27/72
G03B 27/32
G06F 17/30

US Classification:

355 67, 355 53, 355 71, 355 77, 703 13, 430 30

Abstract:

A method for optimizing the illumination conditions of a lithographic apparatus by computer simulation, the lithographic apparatus including an illuminator and a projection system, includes defining a lithographic pattern to be printed on the substrate, selecting a simulation model, selecting a grid of source points in a pupil plane of the illuminator, calculating separate responses for individual source points, each of the responses representing a result of a single or series of simulations using the simulation model, and adjusting an illumination arrangement based on analysis of accumulated results of the separate calculations.

US Patent:

7180576, Feb 20, 2007

Filed:

Jul 13, 2004

Appl. No.:

10/889216

Inventors:

Steven George Hansen - Phoenix AZ, US

Assignee:

ASML Netherlands B.V. - Veldhoven

International Classification:

G03B 27/54
G03B 27/42
G03B 27/72
G03B 27/32
G06F 17/50

US Classification:

355 67, 355 53, 355 71, 355 77, 703 13, 430 30

Abstract:

A method for optimizing the optical transfer of a mask pattern onto a substrate using a lithographic apparatus, the lithographic apparatus including an illuminator configured to illuminate the mask pattern, the method including determining a plurality of illumination arrangements for a pupil plane of the illuminator, each of the plurality of illumination arrangements being determined to improve a respective lithographic performance response parameter when illuminating the mask pattern; and adjusting an intensity of a first illumination arrangement of the plurality of illumination arrangements relative to a second illumination arrangement of the plurality of illumination arrangements, the mask pattern to be illuminated with the first and second illumination arrangements. The mask pattern may be illuminated at least once for each of the first and second illumination arrangements or all at once with at least the first illumination arrangement and the second illumination arrangement.

US Patent:

7245356, Jul 17, 2007

Filed:

Nov 17, 2005

Appl. No.:

11/280985

Inventors:

Steven George Hansen - Phoenix AZ, US

Assignee:

ASML Netherlands B.V. - Veldhoven

International Classification:

G03B 27/54
G03B 27/42
G03B 27/72
G03B 37/32
G06F 17/50
G03C 5/00

US Classification:

355 67, 355 55, 355 71, 355 77, 430 30, 703 13

Abstract:

A method of configuring a transfer of an image of a patterning device pattern onto a substrate with a lithographic apparatus. The method includes determining an intermediate illumination arrangement parameter and an intermediate patterning device parameter by varying an initial illumination arrangement parameter and an initial patterning device parameter using a calibrated model until the calculated image of the pattern printed on the substrate is within predetermined specification; calculating a metric that represents a lithographic response of the printed pattern over a process range, where the pattern would be imaged with the intermediate illumination arrangement and patterning device parameters over the process range, and depending on a result of the metric, adjusting the initial patterning device and illumination arrangement parameters.

US Patent:

7256873, Aug 14, 2007

Filed:

Jan 28, 2004

Appl. No.:

10/765218

Inventors:

Jozef Maria Finders - Veldhoven, NL
Donis George Flagello - Scottsdale AZ, US
Steven George Hansen - Phoenix AZ, US

Assignee:

ASML Netherlands B.V. - Veldhoven

International Classification:

G03B 27/32
G03B 27/42
G03B 27/54

US Classification:

355 77, 355 53, 355 67

Abstract:

A system and method for enhancing the image resolution in a lithographic system, is presented herein. The invention comprises decomposing a reticle pattern into at least two constituent sub-patterns that are capable of being optically resolved by the lithographic system, coating a substrate with a pre-specified photoresist layer, and exposing a first of the at least two constituent sub-patterns by directing a projection beam through the first sub-pattern such that the lithographic system produces a first sub-pattern image onto the pre-specified photoresist layer of the substrate. The invention further comprises processing the exposed substrate, exposing a second of the at least two constituent sub-patterns by directing the projection beam through the second sub-pattern such that the lithographic system produces a second sub-pattern image onto the pre-specified photoresist layer of the substrate, and then combining the first and second sub-pattern images to produce a desired pattern on the substrate.

US Patent:

7421677, Sep 2, 2008

Filed:

Nov 12, 2004

Appl. No.:

10/986118

Inventors:

Steven G. Hansen - Phoenix AZ, US
Doug Van Den Broeke - Sunnyvale CA, US

Assignee:

ASML Netherlands B.V. - Veldhoven

International Classification:

G06F 17/50

US Classification:

716 21, 716 19

Abstract:

A method of reversing the tone of an image to be printed in a layer of radiation sensitive material formed on a substrate includes defining a lithographic problem, designing a patterning device, determining a first illumination arrangement and a radiation sensitive material process capable of printing a positive tone of the lithographic feature; and determining a second illumination arrangement capable of printing a negative tone of the lithographic feature with the radiation sensitive material process.

US Patent:

7471375, Dec 30, 2008

Filed:

Feb 14, 2006

Appl. No.:

11/353234

Inventors:

Jozef Maria Finders - Veldhoven, NL
Luis Alberto Colina Santamaria Colina - Veldhoven, NL
Steven George Hansen - Phoenix AZ, US

Assignee:

ASML Netherlands B.V. - Veldhoven

International Classification:

G03B 27/54
G03B 27/42
G03B 27/72
G03C 5/00

US Classification:

355 67, 355 53, 355 71, 430 30

Abstract:

A method for configuring the optical transfer of a patterning device pattern onto a substrate with a lithographic apparatus is presented. The method includes adjusting an intensity of a first illumination shape relative to a second illumination shape, the first and the second illumination shapes defining respectively a first illumination area and a second illumination area within a pupil plane of an illumination system of the lithographic apparatus, while maintaining the first and second illumination areas substantially constant, and illuminating the patterning device pattern with the first and second illumination shapes.