Steven Douglas Nelson

US Patent:

6383724, May 7, 2002

Filed:

Apr 18, 2000

Appl. No.:

09/551072

Inventors:

Lawrence E. Carter - Eden Prairie MN
Steven L. Nelson - Minnetonka MN

Assignee:

FSI International, Inc. - Chaska MN

International Classification:

G03F 730

US Classification:

430329, 134 13

Abstract:

An improved method of photoresist removal is disclosed in which a treating solution of ozone and bicarbonate or other suitable radical scavengers is used to treat a substrate for use in an electronic device. The method is particularly well suited to photoresist removal where certain metals such as aluminum, copper and oxides thereof are present on the surface of the substrate. The method is also well suited to the removal of other organic materials as well.

US Patent:

6406551, Jun 18, 2002

Filed:

May 14, 1999

Appl. No.:

09/312775

Inventors:

Steven L. Nelson - Minnetonka MN
Kurt K. Christenson - Minnetonka MN

Assignee:

FSI International, Inc. - Chaska MN

International Classification:

C23G 102

US Classification:

134 3, 134 13, 134 19, 134 26, 134 30, 134 32, 134902

Abstract:

The present invention provides a method for treating a substrate, or a plurality of substrates, so that the treatment thereof is enhanced. In particular, the method includes the steps of causing a heated liquid to contact the substrate(s) and causing a processing liquid to contact the substrate(s). Although the processing liquid comprises a heat sensitive agent, the effectiveness of the processing liquid is not substantially diminished by the application of heat due to the fact that the heat is applied by the application of a separate heated liquid rather than by heating the processing liquid itself. Thus, the application of heat can be utilized to enhance the treatment rate of a substrate surface without a corresponding reduction in effectiveness of the processing liquid.

US Patent:

6488271, Dec 3, 2002

Filed:

Feb 11, 1999

Appl. No.:

09/248874

Inventors:

Steven L. Nelson - Minnetonka MN
Kurt K. Christenson - Minnetonka MN

Assignee:

FSI International, Inc. - Chaska MN

International Classification:

B01F 304

US Classification:

2611211, 134 37, 134198, 134902, 2611221, 261DIG 42, 261DIG 65, 210760, 210900

Abstract:

A method for increasing the quantity of a gas, e. g. , ozone, dissolved in a liquid, e. g. , ultrapure deionized water, are provided. The gas to be dissolved is introduced to the liquid under pressure and the resulting admixture delivered to the end-use station under pressure. Once at the end-use station, the admixture including the liquid and dissolved gas is subjected to controlled dispensing to maintain a high concentration of gas in the dispensed admixture.

US Patent:

6648307, Nov 18, 2003

Filed:

Oct 11, 2002

Appl. No.:

10/269240

Inventors:

Steven L. Nelson - Minnetonka MN
Kurt K. Christenson - Minnetonka MN

Assignee:

FSI International, Inc. - Chaska MN

International Classification:

B01F 304

US Classification:

2611211, 134 37, 134198, 134902, 2611221, 261DIG 42, 261DIG 65, 210760, 210900

Abstract:

A method for increasing the quantity of a gas, e. g. , ozone, dissolved in a liquid, e. g. , ultrapure deionized water, is provided. The gas to be dissolved is introduced to the liquid under pressure and the resulting admixture delivered to the end-use station under pressure. Thus, the method and system of the present invention are able to provide, e. g. , ozonated water, continuously, efficiently and without cooling, thus providing a simple, cost efficient method of producing high concentration ozonated water for application to an in-process semiconductor wafer.

US Patent:

7066910, Jun 27, 2006

Filed:

Oct 18, 2001

Appl. No.:

09/982763

Inventors:

Ruth Elinor Bauhahn - Fridley MN, US
John W. Forsberg - St. Paul MN, US
Steven James Nelson - Wyoming MN, US
Kenneth Timothy Heruth - Edina MN, US

Assignee:

Medtronic, Inc. - Minneapolis MN

International Classification:

A61M 1/00

US Classification:

604151, 6048911

Abstract:

An method and system that allows a patient to access stored preset patient therapy programs, that are resident in a medical device such an implantable pump or a combination medical device having an implantable pump and a implantable neural stimulator, and to create personalized therapy programs or automatic timing therapy programs from preset therapy programs to accommodate the patient's particular activity. Alternatively, the patient can select and access stored preset patient therapy programs and combine at least two modified or unmodified preset therapy programs to create personalized therapy programs.

US Patent:

7082333, Jul 25, 2006

Filed:

Apr 27, 2000

Appl. No.:

09/560064

Inventors:

Ruth Elinor Bauhahn - Fridley MN, US
John W. Forsberg - St. Paul MN, US
Steven James Nelson - Wyoming MN, US

Assignee:

Medtronic, Inc. - Minneapolis MN

International Classification:

A61N 1/34

US Classification:

607 60, 607 32, 607 57, 604891, 600300

Abstract:

An apparatus and method that allows a patient to access stored preset patient therapy programs, that are resident in a medical device, and to create personalized therapy programs or automatic timing therapy programs from preset therapy programs to accommodate the patient's particular activity. Alternatively, the patient can select and access stored preset patient therapy programs and combine at least two modified or unmodified preset therapy programs to create personalized therapy programs.

US Patent:

7312161, Dec 25, 2007

Filed:

May 5, 2006

Appl. No.:

11/429572

Inventors:

Kevin L. Siefering - Excelsior MN, US
Steven L. Nelson - Minnetonka MN, US

Assignee:

FSI International, Inc. - Chaska MN

International Classification:

H01I 21/302

US Classification:

438756, 438 8, 436 55

Abstract:

The variability of immersion processes for treatment of semiconductor devices can be significantly lowered by initiating the termination of a treatment process according to a predetermined treatment termination protocol in a manner that takes into account the contribution of, in particular, the treatment that is carried out during the period of time in the treatment process in which the treatment process is being terminated. In a preferred embodiment, conditions that indicate the progress of the treatment on a real time basis are monitored, and the timing of the initiation of the termination process is additionally based on the calculated amount of treatment and treatment rate of the process in progress.

US Patent:

7364625, Apr 29, 2008

Filed:

May 20, 2002

Appl. No.:

10/152077

Inventors:

Kurt K. Christenson - Minnetonka MN, US
Steven L. Nelson - Minnetonka MN, US
James R. Oikari - New Brighton MN, US
Jeff F. Olson - Burnsville MN, US
Biao Wu - Milpitas CA, US

Assignee:

FSI International, Inc. - Chaska MN

International Classification:

B08B 3/02

US Classification:

134 2, 134 3, 134 19, 134 21, 134 26, 134 28, 134 30, 134 31, 134 32, 134 33, 134 34, 134 35, 134 36, 134 37, 134 41, 134 42, 134902

Abstract:

Described are methods of rinsing and processing devices such as semiconductor wafers wherein the device is rinsed with using a surface tension reducing agent; the method may include a subsequent drying step which preferably incorporates the use of a surface tension reducing agent during at least partial drying; and the method may be performed using automated rinsing equipment; also described are automated rinsing apparatuses useful with the method.

Address:

666 Apache Ln, Mendota Heights, MN 55120

Phone:

6514520517

VIN:

5NMSH13E07H113651

Make:

HYUNDAI

Model:

SANTA FE

Year:

2007