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4950 Empire Ave APT A4, Oakley, CA 94561 • 9169884989
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Us Patents
Positive Photoresist Compositions Containing Base Polymer Which Is Substantially Insoluble At Ph Between 7 And 10, Quinonediazide Acid Generator And Silanol Solubility Enhancer
E. I. Du Pont de Nemours and Company - Wilmington DE
International Classification:
G03F 7023 G03C 161
US Classification:
430191
Abstract:
A positive working photoresist composition based on a polyimide or polyimide precursor, a photoactivatable acid generator, and an additive compound, preferably an aromatic silanol, capable of promoting dissolution of the photoactivated portion of the resist, while it has no effect on the rest portion of the resist. Also, a method of patterning the photoresist composition.
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