Cancer & Blood Disorders Clinic 2530 Chicago Ave STE CSC175, Minneapolis, MN 55404 6128135940 (phone)
Education:
Medical School Mayo Medical School Graduated: 2000
Conditions:
Anemia Hemolytic Anemia Hemophilia A or B Hodgkin's Lymphoma Iron Deficiency Anemia
Languages:
English
Description:
Dr. Kearney graduated from the Mayo Medical School in 2000. She works in Minneapolis, MN and specializes in Pediatric Hematology-Oncology. Dr. Kearney is affiliated with Childrens Hospitals & Clinics Of Minnesota.
Pediatric Service Of SpringfieldPediatric Services Of Springfield 294 N Main St STE 101, East Longmeadow, MA 01028 4135251870 (phone), 4135253883 (fax)
Pediatric Service Of SpringfieldPediatric Services Of Springfield 35 Post Office Park STE 3501, Wilbraham, MA 01095 4135251870 (phone), 4135253883 (fax)
Languages:
English Spanish
Description:
Ms. Kearney works in Wilbraham, MA and 1 other location and specializes in Pediatrics. Ms. Kearney is affiliated with Baystate Medical Center.
Louis N. Hutter - Richardson TX Mark E. Gibson - Mesquite TX Jeffrey P. Smith - Plano TX Shiu-Hang Yan - Richardson TX Arnold C. Conway - Garland TX John P. Erdeljac - Plano TX James D. Goon - Dallas TX AnhKim Duong - Garland TX Mary A. Murphy - Richardson TX Susan S. Kearney - Tully NY
Assignee:
Texas Instruments Incorporated - Dallas TX
International Classification:
H01L 2702 H01L 2704
US Classification:
357 43
Abstract:
An integrated circuit having PMOS, NMOS and NPN transistors is described for applications in which both digital and analog circuits are required. The integrated circuit is designed to allow standard CMOS cells to be used in the integrated circuit without redesign. A P+ substrate (48) is provided upon which a first P- epitaxy layer (46) is formed. N+ DUF regions (50,52) are provided for the PMOS and NPN transistors, respectively. The base region (68) is formed in an Nwell (58) by implantation and diffusion. Before diffusion, a nitride layer (70) is formed over the base (68) to provided an inert annealing thereof. The base diffusion and collector diffusion occurs before the CMOS channel stop and source/drain diffusions in order to prevent altering diffusion times for the MOS transistors.