Susan M Macdonald

US Patent:

20080248408, Oct 9, 2008

Filed:

Sep 6, 2006

Appl. No.:

12/064453

Inventors:

Susan S. MacDonald - Georgetown TX, US
David Mellenthin - Austin TX, US

International Classification:

G03F 1/00

US Classification:

430 5

Abstract:

A photomask and method for forming a non-orthogonal feature on the photomask are provided. A method for forming a non-orthogonal feature on a photomask blank includes providing a mask layout file including a primitive shape and fracturing the primitive shape to create a plurality of writeable shapes in a mask pattern file. A non-orthogonal feature formed by the writeable shapes is formed on a photomask blank by using a lithography system to image the writeable shapes from the mask pattern file onto a resist layer of the photomask blank.

US Patent:

20100215909, Aug 26, 2010

Filed:

Sep 6, 2006

Appl. No.:

12/064454

Inventors:

Susan S. MacDonald - Georgetown TX, US

International Classification:

B32B 3/00
B44C 1/22

US Classification:

428172, 216 41

Abstract:

A photomask for the fabrication of dual damascene structures and a method for forming the same are provided. A method for fabricating a multilayer step-and-print lithography (SFIL) template includes providing a blank having a substrate, an absorber layer and a first resist layer. A metal layer pattern of a dual damascene structure is formed in the substrate at a first depth using a lithography system. The first resist layer is removed from the blank and a second resist later is applied. The lithography system is used to form a via layer pattern of the dual damascene structure at the first depth while the metal layer pattern is simultaneously etched to a second depth.

US Patent:

6894766, May 17, 2005

Filed:

Mar 26, 2002

Appl. No.:

10/106605

Inventors:

Craig A. West - Austin TX, US
Glenn Edward Storm - Ridgefield CT, US
Susan S. MacDonald - Georgetown TX, US
Joseph S. Gordon - Gardiner NY, US

Assignee:

DuPont Photomasks, Inc. - Round Rock TX

International Classification:

G03B027/62

US Classification:

355 75

Abstract:

A method for constructing a photomask assembly using an encoded mark is disclosed. The method includes comparing a first encoded mark located on a photomask with a second encoded mark located on a pellicle. The first encoded mark includes one or more first symbols and the second encoded mark includes one or more second symbols. The method further includes mounting the pellicle on the photomask if at least one of the symbols of the first encoded mark matches at least one of the symbols of the second encoded mark.