Roger G. Hamel - Methuen MA Susan B. Poulin - Woburn MA
Assignee:
Thiokol Corporation - Chicago IL
International Classification:
B29H 720
US Classification:
264141
Abstract:
A one-part activator and blowing agent system for foaming plastics comprising an alkali metal borohydride and a salt hydrate blended in a single pellet or as separate pellets with a dry inert resinous polymer carrier. The one-part system is blended with a resinous polymer and then the blend extruded at a temperature at which the blend becomes molten such that the salt hydrate releases its water of hydration to hydrolyze the borohydride and produce a cellular article.
Development Of Positive Photoresists Using Cyclic Quaternary Ammonium Hydroxides
Susan B. Poulin - Woburn MA Ann B. Salamone - Marble Head MA
Assignee:
Thiokol Corporation - Chicago IL
International Classification:
G03F 726
US Classification:
430326
Abstract:
A method of developing a positive photoresist layer which has been image-wise-exposed comprising contacting the layer with an alkaline developing composition to remove exposed areas of the layer, the developing composition comprising a solution containing a cyclic quaternary ammonium hydroxide developing agent in a sufficient concentration to remove exposed areas of the layer. The present invention also includes a developing composition for use in the method.
One-Part Activator And Blowing Agent For Foaming Plastics
Roger G. Hamel - Methuen MA Susan B. Poulin - Woburn MA
Assignee:
Morton Thiokol Inc. - Chicago IL
International Classification:
C08J 906 B29N 720
US Classification:
521 79
Abstract:
A one-part activator and blowing agent system for foaming plastics comprising an alkali metal borohydride and a salt hydrate blended in a single pellet or as separate pellets with a dry inert resinous polymer carrier. The one-part system is blended with a resinous polymer and then the blend extruded at a temperature at which the blend becomes molten such that the salt hydrate releases its water of hydration to hydrolyze the borohydride and produce a cellular article.
Developer Composition For Positive Photoresists Using Solution With Cyclic Quaternary Ammonium Hydroxides
Susan B. Poulin - Woburn MA Ann B. Salamone - Marble Head MA
Assignee:
Morton Thiokol, Inc. - Chicago IL
International Classification:
G03C 534 C11D 328 C11D 330 C11D 732
US Classification:
430331
Abstract:
A method of developing a positive photoresist layer which has been image-wise-exposed comprising contacting the layer with an alkaline developing composition to remove exposed areas of the layer, the developing composition comprising a solution containing a cyclic quaternary ammonium hydroxide developing agent in a sufficient concentration to remove exposed areas of the layer. The present invention also includes a developing composition for use in the method.
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Susan Poulin Gps-adjunct Faculty
Saint Joseph's College College/University · Non-Profit Organizations