Robert D. Iverson - Racine WI, US Francis J. Randall - Racine WI, US Richard W. Avery - High Wycombe, GB John R. Wietfeldt - Franksville WI, US Ashish Taneja - Racine WI, US Tantiboro S. Ouattara - Racine WI, US
A cleaning composition for a hard surface is disclosed which provides for initial cleaning of the hard surface and provision of a hydrophilic coating or barrier layer on the surface which provides residual cleaning to the hard surface for an extended number of rinsings. The composition includes a hydrophilic polymer, at least one nonionic surfactant, at least one solvent, an acid and water, wherein the acid provides the composition with a pH of about 2 to 3. 5 and the composition is provided in the absence of any anionic, cationic or amphoteric surfactant.
Metal-Oxide Films From Small Molecules For Lithographic Applications
Daniel M. Sullivan - Vichy MO, US Charles J. Neef - Bastrop TX, US Yubao Wang - Rolla MO, US Tantiboro Ouattara - Eureka MO, US
Assignee:
Brewer Science Inc. - Rolla MO
International Classification:
G03F 7/00 G03F 7/004
US Classification:
4302701, 4302711, 4302731
Abstract:
Metal-oxide films for lithographic applications are provided. The films are formed from compositions comprising metal-oxide precursor compounds including metals and metalloids other than silicon. These films are easily produced and can be modified with a variety of ligands, including alkoxides, phenoxides, carboxylates, beta-diketones, and beta-ketoesters.
Hard Surface Cleaner With Extended Residual Cleaning Benefit
Robert D. Iverson - Racine WI, US Francis J. Randall - Racine WI, US Richard W. Avery - Radnage, GB John R. Wietfeldt - Franksville WI, US Ashish Taneja - Racine WI, US Tantiboro S. Ouattara - Racine WI, US
Assignee:
S. C. Johnson & Son, Inc. - Racine WI
International Classification:
C11D 3/37
US Classification:
510476, 510475
Abstract:
A cleaning composition for a hard surface is disclosed which provides for initial cleaning of the hard surface and provision of a hydrophilic coating or barrier layer on the surface which provides residual cleaning to the hard surface for an extended number of rinsings. The composition includes a hydrophilic polymer, at least one nonionic surfactant, at least one solvent, an acid and water, wherein the acid provides the composition with a pH of about 2 to 3.5 and the composition is provided in the absence of any anionic, cationic or amphoteric surfactant.
Fluorinated Polyimides With Fluorene Cardo Structure As Optical Materials That Have Low Absolute Thermo-Optic Coefficients
The present invention provides new polyimide materials suitable for use in optically transparent fiber composites, ribbon composites, and optical communications applications. The polyimide compounds include monomeric repeat units comprising a fluorinated moiety and a fluorene cardo structure. The polyimides exhibit good optical transparency and have a low absolute thermo-optic coefficient (|dn/dT|).
Chemically Homogeneous Silicon Hardmasks For Lithography
- Rolla MO, US Tantiboro Ouattara - Eureka MO, US Andrea M. Chacko - Rolla MO, US Yichen Liang - Rolla MO, US Kelsey Brakensiek - Rolla MO, US
International Classification:
C09D 183/04 G03F 7/20 C08G 77/20
Abstract:
Silicon hardmasks with a single-component polymer are disclosed. These hardmasks provide high optical homogeneity and high chemical homogeneity, thus minimizing or avoiding negative stochastic effects on feature critical dimension. The hardmasks further provide low porosity, higher density, and high silicon content and improve performance factors such as LER/LWR, defectivity, uniformity, and DoF.