Thomas S Cameron

US Patent:

20090162550, Jun 25, 2009

Filed:

Dec 29, 2006

Appl. No.:

12/303250

Inventors:

Tianniu Chen - Rocky Hill CT, US
Chongying Xu - New Milford CT, US
Thomas H. Baum - New Fairfield CT, US
Bryan C. Hendrix - Danbury CT, US
Thomas M. Cameron - Newtown CT, US
Jeffrey F. Roeder - Brookfield CT, US
Matthias Stender - New Milford CT, US

Assignee:

ADVANCED TECHNOLOGY MATERIALS, INC. - Danbury CT

International Classification:

C23C 16/00
C07F 1/08
C09D 5/00

US Classification:

427252, 556 35, 106 126

Abstract:

Copper (I) amidinate and copper (I) guanidinate precursors for forming copper thin films in the manufacture of microelectronic device articles, e.g., using chemical vapor deposition, atomic layer deposition, and rapid vapor deposition processes, as well as mixed ligand copper complexes suitable for such processes. Also described are solvent/additive compositions for copper precursors for CVD/ALD of copper metal films, which are highly advantageous for liquid delivery of such copper amidinates and copper guanidinates, as well as for other organocopper precursor compounds and complexes, e.g., copper isoureate complexes.

US Patent:

20100279011, Nov 4, 2010

Filed:

Oct 31, 2008

Appl. No.:

12/740992

Inventors:

Tianniu Chen - Rocky Hill CT, US
Chongying Xu - New Milford CT, US
Bryan C. Hendrix - Danbury CT, US
William Hunks - Waterbury CT, US
Thomas M. Cameron - Newtown CT, US
Matthias Stender - Fox Point WI, US
Gregory T. Stauf - New Milford CT, US
Jeffrey F. Roeder - Brookfield CT, US

Assignee:

Advanced Technology Materials, Inc. - Danbury CT

International Classification:

C23C 16/18
C07F 9/94
C07F 7/08
C09D 4/00

US Classification:

4272556, 556 64, 556 12, 10628718

Abstract:

Bismuth precursors having utility for forming highly conformal bismuth-containing films by low temperature (

US Patent:

54318750, Jul 11, 1995

Filed:

May 2, 1994

Appl. No.:

8/236465

Inventors:

Thomas B. Cameron - Windsor CT
Edward F. Smith - Madison CT

Assignee:

The J. M. Ney Company - Bloomfield CT

International Classification:

C22C 500

US Classification:

420463

Abstract:

A precious metal alloy for dental restorations which develops a light oxide upon firing, on a percentage weight basis at makeup, consists of 60-95 precious metal(s) selected from the group consisting of 60-855 palladium, 0-10 gold, 0-10 platinum, 0-12 silver, and mixtures thereof; 1-15 tin; 2-7 zinc; 0. 005-0. 2 boron; 0-2 gallium; 0-2 cobalt; 0-15 indium; 0-0. 2 of a deoxidant selected from the group consisting of silicon, germanium, magnesium, aluminum, lithium, tantalum and mixtures thereof; and 0-1. 0 of a grain refiner selected from the group consisting of ruthenium, iridium, rhenium, and mixtures thereof. The alloy has a liquidus temperature of not more than 1400. degree. C. , and the alloy has a tensile yield strength of at least 250 Mpa and an elongation of at least 2 percent. Restorations having a porcelain coating fired on castings of the alloy evidence a light oxide color.

US Patent:

52903710, Mar 1, 1994

Filed:

Oct 28, 1992

Appl. No.:

7/967655

Inventors:

Thomas B. Cameron - Windsor CT
Edward F. Smith - Madison CT

Assignee:

The J. M. Ney Company - Bloomfield CT

International Classification:

C22C 500

US Classification:

148442

Abstract:

A noble metal dental casting alloy for use in making dental restorations comprises 35-70 percent by weight palladium, 25-50 percent by weight silver, 0. 5-10 percent by weight manganese, and 1-30 percent of at least one modifier element selected from (i) the group of gold, platinum, copper, tin, gallium, zinc, indium and cobalt in amounts of up to 15 percent by weight each, and (ii) the group of ruthenium, rhenium, aluminum, germanium, lithium, silicon, iridium, boron, tantalum and niobium in amounts of up to 5 percent by weight each. The alloy has a solidus temperature of at least 1100. degree. C. , a liquidus temperature of not more than 1400. degree. C. , tensile elongation of at least 2 percent, thermal expansion coefficient of at least 14. times. 10. sup. -6 per. degree. C. , Vickers hardness of at least 150, and offset yield strength at 0. 2 percent of at least 250 MPa.