Thomas J Russell

US Patent:

6391217, May 21, 2002

Filed:

Dec 22, 2000

Appl. No.:

09/746667

Inventors:

Erik Schäffer - Noordwolde, NL
Jurgen Mlynek - Radolfzell, DE
Ullrich Steiner - Groningen, NL
Thomas Thurn-Albrecht - Freiburg, DE
Thomas P. Russell - Amherst MA

Assignee:

University of Massachusetts - Boston MA
Universitat Konstanz - Konstanz

International Classification:

B44C 122

US Classification:

216 41, 264485, 427457, 427458, 428161

Abstract:

A method for forming a patterned film on a substrate, the method including: providing a first flowable medium on the substrate and a second flowable medium on the first flowable medium, the first and second flowable media having different dielectric properties and defining an interface there between; applying an electric field to the interface for a time sufficient to produce a structure in the first flowable medium along the interface; and hardening the structure in the first flowable medium to form the patterned film.

US Patent:

7014786, Mar 21, 2006

Filed:

May 14, 2002

Appl. No.:

10/144961

Inventors:

Erik Schaffer - Noordwolde, NL
Jurgen Mlynek - Radolfzell, DE
Ullrich Steiner - Groningen, NL
Thomas Thurn-Albrecht - Freiburg, DE
Thomas P. Russell - Amherst MA, US

Assignee:

Universitat Konstanz
University of Massachusetts - Boston MA

International Classification:

B44C 1/22

US Classification:

216 41, 216 2, 216 11, 428161, 427457, 427458

Abstract:

A method for forming a patterned film on a substrate, the method including: providing a first flowable medium on the substrate and a second flowable medium on the first flowable medium, the first and second flowable media having different dielectric properties and defining an interface there between; applying an electric field to the interface for a time sufficient to produce a structure in the first flowable medium along the interface: and hardening the structure in the first flowable medium to form the patterned film.

US Patent:

7189435, Mar 13, 2007

Filed:

Mar 14, 2002

Appl. No.:

10/098222

Inventors:

Mark Tuominen - Shutesbury MA, US
Mustafa Bal - Amherst MA, US
Thomas P. Russell - Amherst MA, US
Andrei Ursache - Amherst MA, US

Assignee:

University of Massachusetts - Boston MA

International Classification:

H01F 41/30
C23C 18/00
H05K 3/00
H01B 13/00
B82B 3/00

US Classification:

427472, 427 984, 427259, 4273855, 4274071, 216 13, 216 18, 216 22, 216 49, 216 56

Abstract:

Pathways to rapid and reliable fabrication of three-dimensional nanostructures are provided. Simple methods are described for the production of well-ordered, multilevel nanostructures. This is accomplished by patterning block copolymer templates with selective exposure to a radiation source. The resulting multi-scale lithographic template can be treated with post-fabrication steps to produce multilevel, three-dimensional, integrated nanoscale media, devices, and systems.

US Patent:

7190049, Mar 13, 2007

Filed:

Mar 22, 2001

Appl. No.:

09/814891

Inventors:

Mark Tuominen - Shutosbury MA, US
Joerg Schotter - Bielefeld, DE
Thomas Thurn-Albrecht - Freiburg, DE
Thomas P. Russell - Amherst MA, US

Assignee:

University of Massachusetts - Boston MA

International Classification:

H01L 29/06

US Classification:

257618, 977720, 257E5104, 205112

Abstract:

Pathways to rapid and reliable fabrication of nanocylinder arrays are provided. Simple methods are described for the production of well-ordered arrays of nanopores, nanowires, and other materials. This is accomplished by orienting copolymer films and removing a component from the film to produce nanopores, that in turn, can be filled with materials to produce the arrays. The resulting arrays can be used to produce nanoscale media, devices, and systems.

US Patent:

7438193, Oct 21, 2008

Filed:

Apr 14, 2006

Appl. No.:

11/403870

Inventors:

Seung Yun Yang - Pohang, KR
Jin Kon Kim - Pohang, KR
Min Soo Park - Pohang, KR
Incheol Ryu - Pohang, KR
Sung Key Jang - Pohang, KR
Hwang Yong Kim - Pohang, KR
Thomas P. Russell - Amherst MA, US

Assignee:

Postech Foundation - Pohang
Postech Academy-Industry Foundation - Pohang

International Classification:

B01D 29/00
B01D 39/00
B01D 39/14
B31D 3/00
B05D 3/04

US Classification:

210490, 21050027, 21050034, 2105004, 21050028, 21050036, 216 56, 427307, 427309

Abstract:

Provided are a nanoporous membrane and a method of fabricating the same. The nanoporous membrane includes a support, and a separation layer including a plurality of nano-sized pores at a density of 10/cmor greater and a matrix. The nanoporous membrane has a high flux and a high selectivity.

US Patent:

7470840, Dec 30, 2008

Filed:

Jan 8, 2004

Appl. No.:

10/753868

Inventors:

Todd S. Emrick - South Deerfield MA, US
Thomas P. Russell - Amherst MA, US
Anthony Dinsmore - Amherst MA, US
Habib Skaff - Amherst MA, US
Yao Lin - Amherst MA, US

Assignee:

University of Massachusetts - Amherst MA

International Classification:

A61K 33/04

US Classification:

977787, 424703

Abstract:

Self-assembly of nanoparticles at the interface between two fluids, and methods to control such self-assembly process, e. g. , the surface density of particles assembling at the interface; to utilize the assembled nanoparticles and their ligands in fabrication of capsules, where the elastic properties of the capsules can be varied from soft to tough; to develop capsules with well-defined porosities for ultimate use as delivery systems; and to develop chemistries whereby multiple ligands or ligands with multiple functionalities can be attached to the nanoparticles to promote the interfacial segregation and assembly of the nanoparticles. Certain embodiments use cadmium selenide (CdSe) nanoparticles, since the photoluminescence of the particles provides a convenient means by which the spatial location and organization of the particles can be probed. However, the systems and methodologies presented here are general and can, with suitable modification of the chemistries, be adapted to any type of nanoparticle.

US Patent:

7572669, Aug 11, 2009

Filed:

Feb 21, 2007

Appl. No.:

11/708735

Inventors:

Mark Tuominen - Shutesbury MA, US
Joerg Schotter - Bielefeld, DE
Thomas Thurn-Albrecht - Freiburg, DE
Thomas P. Russell - Amherst MA, US

Assignee:

University of Massachusetts - Boston MA

International Classification:

H01L 21/00

US Classification:

438 99, 977893, 977897

Abstract:

Pathways to rapid and reliable fabrication of nanocylinder arrays are provided. Simple methods are described for the production of well-ordered arrays of nanopores, nanowires, and other materials. This is accomplished by orienting copolymer films and removing a component from the film to produce nanopores, that in turn, can be filled with materials to produce the arrays. The resulting arrays can be used to produce nanoscale media, devices, and systems.

US Patent:

8179026, May 15, 2012

Filed:

Aug 31, 2009

Appl. No.:

12/551039

Inventors:

Thomas P. Russell - Amherst MA, US
Jodie Lutkenhaus - Wethersfield CT, US

Assignee:

University of Massachusetts - Boston MA

International Classification:

H01L 41/08

US Classification:

310358, 310319, 310311

Abstract:

Disclosed herein is a device comprising a pair of electrodes; and a nanotube, a nanorod and/or a nanowire; the nanotube, nanorod and/or nanowire comprising a piezoelectric and/or pyroelectric polymeric composition; the pair of electrodes being in electrical communication with opposing surfaces of the nanotube, nanorod and/or a nanowire; the pair of electrodes being perpendicular to a longitudinal axis of the nanotube, nanorod and/or a nanowire.