Thomas R Stevenson

US Patent:

20060272941, Dec 7, 2006

Filed:

Jun 6, 2005

Appl. No.:

11/147105

Inventors:

Wayne Simpson - San Jose CA, US
Ryan Scatena - Gilroy CA, US
Thomas Stevenson - Gilroy CA, US

International Classification:

C23C 14/00

US Classification:

204298120, 204192120

Abstract:

The present invention includes an assembly comprised of a large sputtering target attached to a backing plate by an elastomer, such as a silicone elastomer, and a method for attaching the large sputtering target to the backing plate using the elastomer as an attachment layer. The method of the present invention comprises the steps of applying a quantity of the elastomer to the backing plate and/or to the sputtering target, where the sputtering target has a sputtering surface having a surface area greater than 6600 square centimeters. The backing plate and the sputtering target are then brought together either with or without a thermal transfer member positioned between the backing plate and the sputtering target.

US Patent:

20070074969, Apr 5, 2007

Filed:

Oct 2, 2006

Appl. No.:

11/541984

Inventors:

Wayne Simpson - San Jose CA, US
Ryan Scatena - Gilroy CA, US
Thomas Stevenson - Gilroy CA, US
Jaime Guerrero - San Jose CA, US

International Classification:

C23C 14/32
C23C 14/00

US Classification:

204192100, 204298120

Abstract:

The present invention includes a long cylindrical sputtering target assembly and a method for manufacturing the assembly. The long cylindrical sputtering target assembly comprises a cylindrical sputtering target having a length greater than approximately thirty-six inches and being comprised of one or more cylindrical sputtering target sections; a cylindrical backing tube; and an attachment layer, such as indium, positioned between the cylindrical sputtering target and the cylindrical backing tube for attaching the cylindrical sputtering target to the cylindrical backing tube. The method comprises the steps of preparing an outside surface of a cylindrical backing tube and/or an inside surface of one or more cylindrical sputtering target sections for bonding; bringing the cylindrical backing tube and the one or more cylindrical sputtering target sections together so that the outside surface of the cylindrical backing tube and the inside surface of the one or more cylindrical sputtering target sections are adjacent to each other but separated by a space, with the one or more cylindrical sputtering target sections having a total length greater than thirty-six inches; and filling the space with an attachment material comprised of indium while the backing tube is oriented in a vertical direction.

US Patent:

20160379806, Dec 29, 2016

Filed:

Jun 25, 2015

Appl. No.:

14/750714

Inventors:

- Fremont CA, US
Nash W. ANDERSON - Cupertino CA, US
John DAUGHERTY - Fremont CA, US
Thomas R. STEVENSON - Morgan Hill CA, US
John Michael KERNS - Livermore CA, US

International Classification:

H01J 37/32
H02N 13/00
C23C 16/06
H01L 21/683
B32B 37/12
C23C 16/455

Abstract:

In accordance with this disclosure, there are provided several inventions, including an apparatus and method for depositing plasma resistant coatings on polymer materials used in a plasma processing chamber. In a particular example, such a coating may be made on a portion of an electrostatic chuck, where the polymer material is a bead surrounding an adhesive between a chuck base and a ceramic top plate.