Thomas W Sutton

US Patent:

6487792, Dec 3, 2002

Filed:

May 7, 2001

Appl. No.:

09/850888

Inventors:

Thomas R. Sutton - San Jose CA
Robert Koch - Palo Alto CA

Assignee:

Tokyo Electron Limited - Tokyo

International Classification:

F26B 508

US Classification:

34328, 34 58, 34665, 134 34, 438116

Abstract:

An apparatus for agitating a workpiece in a high pressure environment comprises a workpiece holder, a bearing, a pressure chamber housing, and a nozzle. The workpiece holder couples to the pressure chamber housing via the bearing. The nozzle couples to the pressure chamber housing. The workpiece holder comprises protrusions and a region for holding the workpiece. In operation a fluid exits the nozzle and impinges the protrusions of the workpiece holder causing the workpiece holder to rotate, which agitates the workpiece.

US Patent:

6736149, May 18, 2004

Filed:

Dec 19, 2002

Appl. No.:

10/327306

Inventors:

Maximilian Albert Biberger - Palo Alto CA
Frederick Paul Layman - Fremont CA
Thomas Robert Sutton - San Jose CA

Assignee:

Supercritical Systems, Inc. - Fremont CA

International Classification:

B08B 304

US Classification:

134 66, 1341022, 134902, 414939

Abstract:

An apparatus for supercritical processing of multiple workpieces comprises a transfer module, first and second supercritical processing modules, and a robot. The transfer module includes an entrance. The first and second supercritical processing modules are coupled to the transfer module. The robot is preferably located with the transfer module. In operation, the robot transfers a first workpiece from the entrance of the transfer module to the first supercritical processing module. The robot then transfers a second workpiece from the entrance to the second supercritical processing module. After the workpieces have been processed, the robot returns the first and second workpieces to the entrance of the transfer module. Alternatively, the apparatus includes additional supercritical processing modules coupled to the transfer module.

US Patent:

6748960, Jun 15, 2004

Filed:

Nov 1, 2000

Appl. No.:

09/704642

Inventors:

Maximilian Albert Biberger - Palo Alto CA
Frederick Paul Layman - Fremont CA
Thomas Robert Sutton - San Jose CA

Assignee:

Tokyo Electron Limited - Tokyo

International Classification:

B08B 300

US Classification:

134 61, 1341022

Abstract:

An apparatus for supercritical processing of multiple workpieces comprises a transfer module, first and second supercritical processing modules, and a robot. The transfer module includes an entrance. The first and second supercritical processing modules are coupled to the transfer module. The robot is preferably located with the transfer module. In operation, the robot transfers a first workpiece from the entrance of the transfer module to the first supercritical processing module. The robot then transfers a second workpiece from the entrance to the second supercritical processing module. After the workpieces have been processed, the robot returns the first and second workpieces to the entrance of the transfer module. Alternatively, the apparatus includes additional supercritical processing modules coupled to the transfer module.

US Patent:

6921456, Jul 26, 2005

Filed:

Jul 24, 2001

Appl. No.:

09/912844

Inventors:

Maximilian A. Biberger - Palo Alto CA, US
Frederick Paul Layman - Fremont CA, US
Thomas Robert Sutton - San Jose CA, US

Assignee:

Tokyo Electron Limited - Tokyo

International Classification:

H01L021/00
C23C016/00

US Classification:

15634526, 118719, 118715, 118733, 134 11, 134 12, 134 13, 15634533

Abstract:

A high pressure chamber comprises a chamber housing, a platen, and a mechanical drive mechanism. The chamber housing comprises a first sealing surface. The platen comprises a region for holding the semiconductor substrate and a second sealing surface. The mechanical drive mechanism couples the platen to the chamber housing. In operation, the mechanical drive mechanism separates the platen from the chamber housing for loading of the semiconductor substrate. In further operation, the mechanical drive mechanism causes the second sealing surface of the platen and the first sealing surface of the chamber housing to form a high pressure processing chamber around the semiconductor substrate.

US Patent:

6926012, Aug 9, 2005

Filed:

Dec 19, 2002

Appl. No.:

10/327397

Inventors:

Maximilian Albert Biberger - Palo Alto CA, US
Frederick Paul Layman - Fremont CA, US
Thomas Robert Sutton - San Jose CA, US

Assignee:

Tokyo Electron Limited - Tokyo

International Classification:

B08B007/04
B65G049/07

US Classification:

134 13, 134 254, 134902, 414805

Abstract:

An apparatus for supercritical processing of multiple workpieces comprises a transfer module, first and second supercritical processing modules, and a robot. The transfer module includes an entrance. The first and second supercritical processing modules are coupled to the transfer module. The robot is preferably located with the transfer module. In operation, the robot transfers a first workpiece from the entrance of the transfer module to the first supercritical processing module. The robot then transfers a second workpiece from the entrance to the second supercritical processing module. After the workpieces have been processed, the robot returns the first and second workpieces to the entrance of the transfer module. Alternatively, the apparatus includes additional supercritical processing modules coupled to the transfer module.

US Patent:

6926798, Aug 9, 2005

Filed:

Mar 6, 2003

Appl. No.:

10/384096

Inventors:

Maximilian Albert Biberger - Palo Alto CA, US
Frederick Paul Layman - Fremont CA, US
Thomas Robert Sutton - San Jose CA, US

Assignee:

Tokyo Electron Limited - Tokyo

International Classification:

H01L021/00
C23C016/00

US Classification:

15634531, 15634532, 15634551, 118719, 118715, 414935, 430329, 134 61, 134 12, 134 13

Abstract:

An apparatus for supercritical processing and non-supercritical processing of a workpiece comprises a transfer module, a supercritical processing module, a non-supercritical processing module, and a robot. The transfer module includes an entrance. The supercritical processing module and the non-supercritical processing module are coupled to the transfer module. The robot is preferably located within the transfer module. In operation, the robot transfers a workpiece from the entrance of the transfer module to the supercritical processing module. After supercritical processing, the robot then transfers workpiece from the supercritical processing module to the non-supercritical processing module. After the non-supercritical processing, the robot returns the workpiece to the entrance of the transfer module. Alternatively, the non-supercritical processing is performed before the supercritical processing.

US Patent:

7060422, Jun 13, 2006

Filed:

Jan 15, 2003

Appl. No.:

10/346445

Inventors:

Maximilian Albert Biberger - Palo Alto CA, US
Frederick Paul Layman - Fremont CA, US
Thomas Robert Sutton - San Jose CA, US

Assignee:

Tokyo Electron Limited - Tokyo

International Classification:

H01L 21/00
C23C 16/00

US Classification:

430329, 15634532, 15634551, 414935, 134 61, 134 12, 134 13

Abstract:

An apparatus for supercritical processing and non-supercritical processing of a workpiece comprises a transfer module, a supercritical processing module, a non-supercritical processing module, and a robot. The transfer module includes an entrance. The supercritical processing module and the non-supercritical processing module are coupled to the transfer module. The robot is preferably located within the transfer module. In operation, the robot transfers a workpiece from the entrance of the transfer module to the supercritical processing module. After supercritical processing, the robot then transfers workpiece from the supercritical processing module to the non-supercritical processing module. After the non-supercritical processing, the robot returns the workpiece to the entrance of the transfer module. Alternatively, the non-supercritical processing is performed before the supercritical processing.

US Patent:

7255772, Aug 14, 2007

Filed:

Jul 21, 2004

Appl. No.:

10/897296

Inventors:

Maximilian A. Biberger - Palo Alto CA, US
Frederick Paul Layman - Fremont CA, US
Thomas Robert Sutton - San Jose CA, US

Assignee:

Tokyo Electron Limited - Tokyo

International Classification:

H01L 21/00
C23C 16/00
C23C 14/00

US Classification:

15634526, 1563451, 118715, 134 11, 134 12, 134 13, 438631, 438645, 430256

Abstract:

A high pressure chamber comprises a chamber housing, a platen, and a mechanical drive mechanism. The chamber housing comprises a first sealing surface. The platen comprises a region for holding the semiconductor substrate and a second sealing surface. The mechanical drive mechanism couples the platen to the chamber housing. In operation, the mechanical drive mechanism separates the platen from the chamber housing for loading of the semiconductor substrate. In further operation, the mechanical drive mechanism causes the second sealing surface of the platen and the first sealing surface of the chamber housing to form a high pressure processing chamber around the semiconductor substrate.