Thomas S Wolf

US Patent:

52158675, Jun 1, 1993

Filed:

May 15, 1987

Appl. No.:

7/054147

Inventors:

Larry E. Stillwagon - Summit NJ
Gary N. Taylor - Bridgewater NJ
Thirumalai N. C. Venkatesan - Bridgewater NJ
Thomas M. Wolf - Succasunna NJ

Assignee:

AT&T Bell Laboratories - Murray Hill NJ

International Classification:

G03F 736
G03F 7008

US Classification:

430323

Abstract:

A resist is formed by sorption of an inorganic-containing gas into an organic material. The development of the resist occurs by exposure to a plasma (e. g. , oxygen reactive ion etching) that forms a protective compound (e. g. , a metal oxide) selectively in the resist. The selected regions can be defined by patterning radiation of various types, including visible, ultraviolet, electron beam, and ion beam. In an alternate embodiment, the selected regions are defined by an overlying resist, with the gas sorption protecting the underlying layer in a bilevel resist. The protective compound can protect the organic resist layer during etching of an underlying inorganic layer, such as metal, silicide, oxide, nitride, etc.

Address:

1221 Ave Of The Americas, New York, NY 10020

Phone:

9413780685

VIN:

3VWDP7AJ2CM313742

Make:

VOLKSWAGEN

Model:

JETTA

Year:

2012

Address:

117 Chestnut Rd, Independence, OH 44131

VIN:

1FMFK20587LA75321

Make:

FORD

Model:

EXPEDITION EL

Year:

2007