Thuc M Dinh

US Patent:

8297223, Oct 30, 2012

Filed:

Sep 22, 2008

Appl. No.:

12/235114

Inventors:

Benjamin Liu - North Oaks MN, US
Yamin Ma - Roseville MN, US
Thuc Dinh - Savage MN, US

Assignee:

MSP Corporation - Shoreview MN

International Classification:

C23C 16/448
C23F 1/00
C23C 16/06
C23C 16/22

US Classification:

118723VE, 118726, 15634533

Abstract:

This disclosure pertains to a method and apparatus to permit changing a filter on the input line to a vacuum deposition chamber without breaking or reducing the vacuum for the deposition chamber and other components in the deposition system. Isolation valves are provided at the inlet and outlet of the filter so the filter can be isolated from the source of vacuum and the deposition chamber for removal and replacement of the filter.

US Patent:

8465791, Jun 18, 2013

Filed:

Aug 31, 2010

Appl. No.:

12/872697

Inventors:

Benjamin Y. H. Liu - North Oaks MN, US
Thuc M. Dinh - Shakopee MN, US
William D. Dick - Minneapolis MN, US
Aaron M. Collins - Minneapolis MN, US
Francisco J. Romay - Vadnais Heights MN, US

Assignee:

MSP Corporation - Shoreview MN

International Classification:

C23C 16/52

US Classification:

427 8, 4272481, 42725525

Abstract:

A method for detecting particles in a gas by saturating the gas with vapor and causing the gas to flow through a chamber with walls that are at a temperature different than the temperature of the entering gas creating a gas turbulence within the chamber resulting in the gas becoming super-saturated with vapor and causing said super-saturated vapor to condense on said particles and form droplets, which are then detected and counted by an optical light-scattering detector.

US Patent:

8511583, Aug 20, 2013

Filed:

Feb 1, 2011

Appl. No.:

13/018689

Inventors:

Benjamin Y. H. Liu - North Oaks MN, US
Thuc M. Dinh - Shakopee MN, US
Yamin Ma - Roseville MN, US

Assignee:

MSP Corporation - Shoreview MN

International Classification:

B05B 17/06
B05B 7/06
B05B 1/08

US Classification:

239424, 2391022, 239423

Abstract:

The present disclosure relates to an apparatus and a method for forming a droplet aerosol for vaporization and subsequent thin film deposition on a substrate. The apparatus includes a mechanism to control the rate of liquid flow through the apparatus, the mechanism including a piezoelectric actuator to adjust the rate of liquid flow and an atomizing mechanism drawing gas from a compressed gas source such that when the gas source conjoins with the liquid, the liquid is atomized to form droplets suspended in the gas thereby forming a droplet aerosol suitable for subsequent thin film deposition on a substrate. The method includes drawing a gas from a compressed gas source and drawing a liquid from a liquid source. The liquid and gas are conjoined in either a coaxial flow relationship or a radial flow relationship or an angular relationship between radial and coaxial flow wherein the gas engages the liquid to form droplets suitable for vaporization and subsequent thin film deposition on a substrate.

US Patent:

8554064, Oct 8, 2013

Filed:

Dec 21, 2011

Appl. No.:

13/333373

Inventors:

Thuc Dinh - Shakopee MN, US
Yamin Ma - Roseville MN, US
Benjamin Y. H. Liu - North Oaks MN, US

Assignee:

MSP Corporation - Shoreview MN

International Classification:

F22B 29/06
F22B 1/28
A01G 13/06
A61M 16/00
A61H 33/06
B01D 3/06
A47J 27/00
A47J 31/00
F24H 1/18
F24H 1/10
B05B 1/24

US Classification:

392397, 392386, 392391, 392392, 392394, 392396, 392399, 392480, 392484

Abstract:

The present disclosure relates to an apparatus and a method for vaporizing a liquid to form vapor preferably in a gas stream. The apparatus includes a composite metal structure, the structure comprising a plurality of passageways for providing heat to vaporize the liquid in the gas stream to form a gas/vapor mixture. A non-corrosive interface lies between the metal structure and the gas/vapor mixture, the interface being chemically inert to the gas/vapor mixture and the structure permitting heat to be conducted rapidly therethrough to vaporize the liquid. The apparatus further includes an inlet for the gas and an inlet for the liquid to be vaporized to flow into the plurality of passageways and an exit through which the gas/vapor mixture exits the apparatus.

US Patent:

8603247, Dec 10, 2013

Filed:

May 6, 2013

Appl. No.:

13/887554

Inventors:

Thuc M. Dinh - Shakopee MN, US
William D. Dick - Minneapolis MN, US
Aaron M. Collins - Minneapolis MN, US
Francisco J. Romay - Vadnais Heights MN, US

Assignee:

MSP Corporation - Shoreview MN

International Classification:

C23C 16/448
C23C 16/455
C23C 16/52

US Classification:

118726, 118715, 356 37

Abstract:

The present disclosure describes an apparatus for detecting particles in a gas by saturating the gas with vapor and causing the gas to flow through a chamber with walls that are at a temperature different than the temperature of the entering gas creating a gas turbulence within the chamber resulting in the gas becoming super-saturated with vapor and causing said super-saturated vapor to condense on said particles and form droplets, which are then detected and counted by an optical light-scattering detector.

US Patent:

20090293807, Dec 3, 2009

Filed:

May 26, 2009

Appl. No.:

12/471831

Inventors:

Benjamin Y.H. Liu - North Oaks MN, US
Yamin Ma - Roseville MN, US
Thuc Dinh - Shakopee MN, US

Assignee:

MSP Corporation - Shoreview MN

International Classification:

C23C 16/00

US Classification:

118667, 118724

Abstract:

An apparatus removes particles from a gas/vapor mixture while at the same time improves the uniformity of gas/vapor mixture to create a more uniformly-mixed mixture stream for thin film deposition and semiconductor device fabrication.

US Patent:

20110232588, Sep 29, 2011

Filed:

Mar 24, 2011

Appl. No.:

13/070967

Inventors:

Benjamin Y.H. Liu - North Oaks MN, US
Yamin Ma - Roseville MN, US
Thuc Dinh - Shakopee MN, US

Assignee:

MSP Corporation - Shoreview MN

International Classification:

F22D 5/26
F16K 31/02
F15D 1/00

US Classification:

122451 R, 25112901, 137561 R, 1374875, 137 1

Abstract:

An apparatus and method for generating vapor from a liquid precursor for a thin film deposition on a substrate includes an inlet section in fluid communication with a downstream vaporization chamber section. The inlet section comprises a gas inlet for receiving gas from a gas source through a gas flow sensor and a gas flow control valve and a liquid inlet for receiving liquid from a liquid source through a liquid flow sensor and a liquid flow control valve. An electronic controller controls the gas and liquid flow control valves thereby controlling the rates of gas and liquid flow into the inlet section to generate vapor in the downstream vaporization chamber section for thin film deposition on the substrate.

US Patent:

20130036973, Feb 14, 2013

Filed:

Sep 5, 2012

Appl. No.:

13/603693

Inventors:

Benjamin Y.H. Liu - North Oaks MN, US
Thuc M. Dinh - Shakopee MN, US
William D. Dick - Minneapolis MN, US
Aaron M. Collins - Minneapolis MN, US
Francisco J. Romay - Vadnais Heights MN, US

Assignee:

MSP Corporation - Shoreview MN

International Classification:

C23C 16/52
C23C 16/455

US Classification:

118712, 118716

Abstract:

The present disclosure describes a method and apparatus for detecting particles in a gas by saturating the gas with vapor and causing the gas to flow through a chamber with walls that are at a temperature different than the temperature of the entering gas creating a gas turbulence within the chamber resulting in the gas becoming super-saturated with vapor and causing said super-saturated vapor to condense on said particles and form droplets, which are then detected and counted by an optical light-scattering detector.