Toyota Connected
Software Engineer Ii
Armor Cloud Security Apr 2019 - Oct 2019
Software Developer Ii
Armor Cloud Security Jan 2017 - Apr 2019
.Net Developer
Firehost Jan 2017 - May 2018
Junior .Net Developer
Marketing Innovators International, Inc. Apr 2016 - Jan 2017
Application Support Developer
Education:
Wheaton College 2008 - 2013
Bachelors, Biochemistry, Chemistry
Morrison Christian Academy 2008
Skills:
C# Programming .Net Microsoft Office Networking Microsoft Sql Server Javascript Visual Studio Computer Hardware Object Oriented Design Agile Methodologies Windows Asp.net Mvc Css Angularjs Jquery Research Java Ado.net Html5 Git .Net Framework Switches Google Apps Wireless Networking T Sql Entity Framework Help Desk Support Higher Education C Android Ios Mac Os Cabling
The Ocean Agency since Apr 2010
Account Director
The Ocean Agency Nov 2009 - Apr 2010
Online Marketing Manager
Weaver Multimedia Group Sep 2007 - Oct 2009
Web Editor
Asian Avenue Magazine Jul 2006 - Jul 2007
Editorial Director/Consultant
DiningOut Magazine Feb 2005 - Feb 2006
Senior Editor
Education:
Keller Graduate School of Management of DeVry University 2009 - 2011
Master's, Project Management
University of Maryland Baltimore County 2000 - 2004
BA, English, Minor in WritingSumma Cum Laude (3.97)
Thomas S. Wootton
Skills:
Seo Online Marketing Social Media Marketing Social Media Sem Integrated Marketing Google Analytics Online Advertising Content Strategy Marketing Digital Marketing Project Management Public Relations Competitive Analysis Strategy Content Management Facebook Ppc Social Marketing Analytics Account Management Teaching Adults User Experience Mobile Devices Content Development Digital Strategy Web Analytics Management Leadership E Commerce Digital Media Advertising Mobile Marketing Marketing Strategy Marketing Communications Google Adwords Interactive Marketing Web Content Cms Copywriting Web Content Management Interactive Advertising Lead Generation Email Marketing Media Planning Conversion Optimization Editing Strategic Partnerships Cross Functional Team Leadership Business Development
Interests:
Transformational Leadership Cooking Home Recording Traveling Nonviolent Communication Education Environment Disaster and Humanitarian Relief Human Rights Guitar and Piano Movies Mindfulness Meditation
Certifications:
Tefl Certified Google Adwords Certified Marin Software Certified
Dr. Lin graduated from the SUNY Upstate Medical University in 2002. He works in Calhoun, GA and 1 other location and specializes in Pulmonary Critical Care Medicine and Pulmonary Disease. Dr. Lin is affiliated with Cartersville Medical Center and Gordon Hospital.
Taos Orthopaedic InstituteTaos Orthopaedics Institute 1219 Gusdorf Rd STE A, Taos, NM 87571 5757580009 (phone), 5757588736 (fax)
Education:
Medical School University of Massachusetts Medical School Graduated: 2010
Languages:
English Spanish
Description:
Dr. Lin graduated from the University of Massachusetts Medical School in 2010. He works in Taos, NM and specializes in Orthopaedic Surgery. Dr. Lin is affiliated with Holy Cross Hospital.
Name / Title
Company / Classification
Phones & Addresses
Timothy Lin Director, Treasurer
Cactus US Holdings Inc
Timothy Lin Director, President, Secretary, Treasurer
Bmfc Inc
Timothy Lin President
COOLSAND TECHNOLOGIES, INC
20410 Town Ctr Ln STE 275, Cupertino, CA 95014
Us Patents
Mask Patterns For Use In Multiple-Exposure Lithography
Robert P. Gleason - San Carlos CA, US Timothy Lin - San Jose CA, US Andrew J. Moore - Keizer OR, US Bennett W. Olson - Campbell CA, US Paul Rissman - Palo Alto CA, US
Assignee:
Luminescent Technologies, Inc. - Palo Alto CA
International Classification:
G06F 17/50
US Classification:
716 50, 716 53, 716 54, 716 55
Abstract:
A method for determining mask patterns to be used on photo-masks in a multiple-exposure photolithographic process is described. During the method, an initial mask pattern, which is intended for use in a single-exposure photolithographic process, and a target pattern that is to be printed are used to determine a first mask pattern and a second mask pattern, which are intended for use in the multiple-exposure photolithographic process. In particular, the first mask pattern includes a first feature and the second mask pattern includes a second feature, and the first feature and the second feature overlap an intersection between features in the initial mask pattern. Moreover, the first mask pattern and the second mask pattern have at least one decreased spatial frequency relative to the initial mask pattern along at least one direction in the initial mask pattern.
Write-Pattern Determination For Maskless Lithography
A method for generating a write pattern to be used in a maskless-lithography process is described. During the method, a computer system determines a one-to-one correspondence between pixels in the write pattern and at least a subset of elements in a spatial-light modulator used in the maskless-lithography process. Furthermore, the computer system generates the write pattern. Note that the write pattern includes features corresponding to at least the subset of elements in the spatial-light modulator, and the generating is in accordance with a characteristic dimension of an element in the spatial-light modulator and a target pattern that is to be printed on a semiconductor wafer during the maskless-lithography process.
Write-Pattern Determination For Maskless Lithography
Daniel S. Abrams - Palo Alto CA, US Timothy Lin - San Jose CA, US
International Classification:
G06F 17/50
US Classification:
716 55, 716 53, 716139
Abstract:
A method for generating a write pattern to be used in a maskless-lithography process is described. During the method, a computer system determines a one-to-one correspondence between pixels in the write pattern and at least a subset of elements in a spatial-light modulator used in the maskless-lithography process. Furthermore, the computer system generates the write pattern. Note that the write pattern includes features corresponding to at least the subset of elements in the spatial-light modulator, and the generating is in accordance with a characteristic dimension of an element in the spatial-light modulator and a target pattern that is to be printed on a semiconductor wafer during the maskless-lithography process.
Youtube
Dr. Timothy Lin Speaks On Demons In The Churc...
To read Dr. Hymers' sermon manuscripts and view more sermon videos vis...
Duration:
1h 59m 1s
Interview with Data Scientist, Timothy Lin | ...
Meet one of the geniuses behind our technology. At Lynx Analytics, the...
Duration:
1m 36s
Chien Kwan Lin EN
Chien Kwan Lin, saxophone teacher at the Eastman School of Music (New ...
Duration:
6m 15s
Learning From Dr. Timothy Lin (Baptist Preach...
To read Dr. Hymers' sermon manuscripts and view more sermon videos vis...
Duration:
1h 33m 35s
Timothy Lin 2020 Volleyball Highlights
Timothy Lin 2020 Volleyball Highlights from SVL Division 1, BHV Sydney...
Duration:
9m 38s
Timothy Lin 2021 Volleyball Highlights
Timothy Lin 2021 Volleyball Highlights from VNSW State Cup #2 Premiers...