Timothy Z Lin

age ~34

from San Jose, CA

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Timothy Lin Phones & Addresses

San Jose, CA
Campbell, CA
Sunnyvale, CA
Mountain View, CA
Durham, NC

Resumes

Project Manager

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Location:

17799 Riverbend Rd, Salinas, CA 93908

Industry:

Import And Export

Work:

Authentic Real Estate Feb 2017 - Feb 2018
Real Estate Agent
Myasianstore.com Asianchowtime.com Jul 2014 - Jan 2016
Social Media Manager
Khong Guan Corporation Feb 2011 - Apr 2014
Intern
Khong Guan Corporation Feb 2011 - Apr 2014
Project Specialist
Kumon 2008 - May 2009
Math Tutor

Education:

San Jose State University 2009 - 2015
Bachelors, Bachelor of Business Administration, Business Administration, Management, Business Administration and Management

Skills:

Microsoft Excel
Microsoft Office
Microsoft Word
Social Media
Powerpoint
Data Entry
Sales
Time Management
Warehousing
Management
Syspro
Computers
Windows
Troubleshooting
Teamwork
Research

Languages:

English

Certifications:

California Real Estate Salesperson License
Bureau of Real Estate, License 02004437

Data Science Lead

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Location:

San Francisco, CA

Industry:

Computer Software

Work:

Jemstep, Inc.
Principal Data Scientist
Hp
Data Science Lead
Opelin Apr 2013 - Oct 2016
Marketing Analytics
Mentor Graphics Jul 2008 - Apr 2013
Product Marketing Manager, Mask Data Preparation and Platform Solutions
Luminescent Technologies Feb 2005 - Jul 2008
Senior Applications Engineer and Manager, Validation

Education:

Santa Clara University 2008 - 2011
Master of Business Administration, Masters, Finance University of California, Berkeley 1988 - 1993
Master of Arts In Teaching, Masters, Bachelors, Bachelor of Science, Engineering

Skills:

Analytics
Python
Pricing Strategy
Statistical Modeling
Probabilistic Models
R
Sql
Matlab
Customer Segmentation Strategy

Timothy Lin

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Timothy Lin

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Skills:

Microsoft Excel
Microsoft Word
Research
Leadership
Powerpoint
R&D
Product Development
Matlab
Research and Development
Engineering
Simulations

Timothy Lin

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Location:

United States

Timothy Lin San Jose, CA

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Work:

Hewlett Packard

Apr 2013 to 2000
Data Scientist - Marketing Analytics Mentor Graphics, Inc
Fremont, CA
May 2012 to Mar 2013
Product Marketing Manager Mentor Graphics Corporation
Fremont, CA
Jul 2008 to May 2012
Technical Marketing Engineer / Product Lead Luminescent Technologies, Inc
Palo Alto, CA
Mar 2005 to Jul 2008
Senior Applications Engineer / Applications Manager Intel Corporation, Technology and Manufacturing Group
Santa Clara, CA
Jul 2002 to Feb 2005
Group Leader, Process Engineering Intel Corporation
Santa Clara, CA
Sep 1993 to Jul 2002
Senior Process Engineer

Education:

Santa Clara University
2011
MBA in Finance University of California
Berkeley, CA
May 1993
B.S. in Materials Science and Engineering

Skills:

Professional experience in marketing analytics and simulation methods; first line management experience; proficiency with data mining, statistical methods, and optimization; familiarity with MATLAB, Python, TCL, R scripting languages.

Lawyers & Attorneys

Timothy Chi-Hao Lin - Lawyer

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Address:

Clyde & Co

Licenses:

Washington - Active 2010

Timothy Lin - Lawyer

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Specialties:

Asset Acquisitions
Lending
Corporate and Business Transactions
Derivatives
Distressed Debt and Claims Trading
Lending Transactions
Operational Advice
Restructuring and Bankruptcy
Distressed Acquisitions
Rescue, DIP and Exit Financing

ISLN:

915613241

Admitted:

2000

University:

Harvard University, A.B., 1994

Law School:

Columbia University, J.D., 1999

Timothy Lin - Lawyer

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Specialties:

Aviation

ISLN:

924253378

Admitted:

2010

Medicine Doctors

Timothy J. Lin

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Specialties:

Pulmonary Critical Care Medicine, Pulmonary Disease

Work:

Respiratory Consultants Georgia
100 Hospital Ct STE 2, Calhoun, GA 30701
6787210705 (phone), 6787215116 (fax)

Respiratory Consultants Of Georgia
21 Pointe North Dr, Cartersville, GA 30120
6787210705 (phone), 6787215116 (fax)

Education:

Medical School
SUNY Upstate Medical University
Graduated: 2002

Procedures:

Pulmonary Function Tests
Vaccine Administration

Conditions:

Acute Bronchitis
Bacterial Pneumonia
Pneumonia
Acute Renal Failure
Acute Sinusitis

Languages:

English
Spanish

Description:

Dr. Lin graduated from the SUNY Upstate Medical University in 2002. He works in Calhoun, GA and 1 other location and specializes in Pulmonary Critical Care Medicine and Pulmonary Disease. Dr. Lin is affiliated with Cartersville Medical Center and Gordon Hospital.

Timothy Lin

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Specialties:

Orthopaedic Surgery

Work:

Taos Orthopaedic InstituteTaos Orthopaedics Institute
1219 Gusdorf Rd STE A, Taos, NM 87571
5757580009 (phone), 5757588736 (fax)

Education:

Medical School
University of Massachusetts Medical School
Graduated: 2010

Languages:

English
Spanish

Description:

Dr. Lin graduated from the University of Massachusetts Medical School in 2010. He works in Taos, NM and specializes in Orthopaedic Surgery. Dr. Lin is affiliated with Holy Cross Hospital.

Name / Title

Company / Classification

Phones & Addresses

Timothy Lin
Director, Treasurer

Cactus US Holdings Inc

Timothy Lin
Director, President, Secretary, Treasurer

Bmfc Inc

Timothy Lin
President

COOLSAND TECHNOLOGIES, INC

20410 Town Ctr Ln STE 275, Cupertino, CA 95014

Us Patents

Mask Patterns For Use In Multiple-Exposure Lithography
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US Patent:

8082524, Dec 20, 2011
Filed:

Apr 14, 2009
Appl. No.:

12/423686
Inventors:

Robert P. Gleason - San Carlos CA, US
Timothy Lin - San Jose CA, US
Andrew J. Moore - Keizer OR, US
Bennett W. Olson - Campbell CA, US
Paul Rissman - Palo Alto CA, US
Assignee:

Luminescent Technologies, Inc. - Palo Alto CA
International Classification:

G06F 17/50
US Classification:

716 50, 716 53, 716 54, 716 55
Abstract:

A method for determining mask patterns to be used on photo-masks in a multiple-exposure photolithographic process is described. During the method, an initial mask pattern, which is intended for use in a single-exposure photolithographic process, and a target pattern that is to be printed are used to determine a first mask pattern and a second mask pattern, which are intended for use in the multiple-exposure photolithographic process. In particular, the first mask pattern includes a first feature and the second mask pattern includes a second feature, and the first feature and the second feature overlap an intersection between features in the initial mask pattern. Moreover, the first mask pattern and the second mask pattern have at least one decreased spatial frequency relative to the initial mask pattern along at least one direction in the initial mask pattern.

Write-Pattern Determination For Maskless Lithography
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US Patent:

8111380, Feb 7, 2012
Filed:

Sep 8, 2008
Appl. No.:

12/206660
Inventors:

Daniel S. Abrams - Palo Alto CA, US
Timothy Lin - San Jose CA, US
Assignee:

Luminescent Technologies, Inc. - Palo Alto CA
International Classification:

G03B 27/54
G03B 27/44
G03B 27/32
G03B 27/68
G03B 27/42
US Classification:

355 67, 355 46, 355 52, 355 53, 355 77
Abstract:

A method for generating a write pattern to be used in a maskless-lithography process is described. During the method, a computer system determines a one-to-one correspondence between pixels in the write pattern and at least a subset of elements in a spatial-light modulator used in the maskless-lithography process. Furthermore, the computer system generates the write pattern. Note that the write pattern includes features corresponding to at least the subset of elements in the spatial-light modulator, and the generating is in accordance with a characteristic dimension of an element in the spatial-light modulator and a target pattern that is to be printed on a semiconductor wafer during the maskless-lithography process.

Write-Pattern Determination For Maskless Lithography
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US Patent:

8245162, Aug 14, 2012
Filed:

Sep 8, 2008
Appl. No.:

12/206651
Inventors:

Daniel S. Abrams - Palo Alto CA, US
Timothy Lin - San Jose CA, US
International Classification:

G06F 17/50
US Classification:

716 55, 716 53, 716139
Abstract:

A method for generating a write pattern to be used in a maskless-lithography process is described. During the method, a computer system determines a one-to-one correspondence between pixels in the write pattern and at least a subset of elements in a spatial-light modulator used in the maskless-lithography process. Furthermore, the computer system generates the write pattern. Note that the write pattern includes features corresponding to at least the subset of elements in the spatial-light modulator, and the generating is in accordance with a characteristic dimension of an element in the spatial-light modulator and a target pattern that is to be printed on a semiconductor wafer during the maskless-lithography process.