Walter P Skoczylas

US Patent:

6797953, Sep 28, 2004

Filed:

Feb 22, 2002

Appl. No.:

10/081247

Inventors:

Robert L. Gerlach - Portland OR
Paul P. Tesch - Portland OR
Walter Skoczylas - Aloha OR

Assignee:

FEI Company - Hillsboro OR

International Classification:

G01N 2300

US Classification:

250310, 250411, 315 131

Abstract:

A charged particle beam system uses multiple electron columns to increase throughput. One or more multiple electron emitters are in one or more vacuum sealable gun chambers to allow the gun chamber to be replaced with electrons guns having emitters that have been previously conditioned so that the system does not need to be out of service to condition the newly installed emitters.

US Patent:

20020084426, Jul 4, 2002

Filed:

Oct 17, 2001

Appl. No.:

09/982110

Inventors:

Robert Gerlach - Portland OR, US
Paul Tesch - Portland OR, US
Noel Martin - Hillsboro OR, US
Walter Skoczylas - Aloha OR, US
Drew Procyk - Post Mills VT, US

International Classification:

G21G005/00

US Classification:

250/492100

Abstract:

A portion of an ion optical column is formed using a dielectric bushing to support metallic optical elements, electrically isolate them, and form a vacuum chamber around those elements. In particular, the dielectric bushing is suitable for forming an ion gun vacuum chamber in which are contained an emitter assembly and other optical elements, the gun vacuum chamber preferably being vacuum sealable separately from the system vacuum chamber. A compact ion column includes, within the system vacuum chamber, an automated variable aperture drive mechanism and a gun chamber vacuum isolation valve activation mechanism. Including these mechanisms within the vacuum chamber facilitates the design of multi-beam systems by eliminating mechanical feedthroughs that would interfere with the placement of other components in the vacuum chamber.

US Patent:

20120280136, Nov 8, 2012

Filed:

Jan 18, 2012

Appl. No.:

13/353032

Inventors:

Shouyin Zhang - Portland OR, US
Noel Smith - Lake Oswego OR, US
Walter Skoczylas - Aloha OR, US

Assignee:

FEI COMPANY - Hillsboro OR

International Classification:

H01J 3/14

US Classification:

250396 R

Abstract:

An inductively coupled plasma source for a focused charged particle beam system includes a dielectric liquid that insulates and cools the plasma chamber. A flow restrictor at an electrical potential that is a large fraction of the plasma potential reducing arcing because the voltage drop in the gas occurs primarily at relative high pressure.

US Patent:

20130134855, May 30, 2013

Filed:

Nov 30, 2011

Appl. No.:

13/307830

Inventors:

Sean Kellogg - Portland OR, US
Anthony Graupera - Hillsboro OR, US
N. William Parker - Hillsboro OR, US
Andrew B. Wells - Portland OR, US
Mark W. Utlaut - Scappoose OR, US
Walter Skoczylas - Aloha OR, US
Gregory A. Schwind - Portland OR, US
Shouyin Zhang - Portland OR, US
Noel Smith - Portland OR, US

Assignee:

FEI Company - Hillsboro OR

International Classification:

H01J 1/02
H05H 1/00

US Classification:

313 39, 313237

Abstract:

An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.

US Patent:

20150357166, Dec 10, 2015

Filed:

Jun 9, 2015

Appl. No.:

14/734905

Inventors:

- Hillsboro OR, US
Anthony Graupera - Hillsboro OR, US
William N. Parker - Hillsboro OR, US
Andrew B. Wells - Portland OR, US
Mark W. Utlaut - Scappoose OR, US
Walter Skoczylas - Aloha OR, US
Gregory A. Schwind - Portland OR, US
Noel Smith - Lake Oswego OR, US
Shouyin Zhang - Portland OR, US

Assignee:

FEI Company - Hillsboro OR

International Classification:

H01J 37/32
H01J 9/02

Abstract:

An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.