Dr. Greene graduated from the Hahnemann University School of Medicine in 1973. He works in Dover, NJ and 1 other location and specializes in Neurology. Dr. Greene is affiliated with Hackettstown Regional Medical Center, Saint Clares Health System Dover General and Saint Clares Hospital Denville.
Charles M. C. Tan - Santa Clara CA Wayne M. Greene - Los Gatos CA Francis Joseph - Sunnyvale CA
Assignee:
Agilent Technologies, Inc. - Palo Alto CA
International Classification:
H04N 314
US Classification:
348302
Abstract:
An imaging device includes a Gray Code generator and an array of pixels. Each pixel includes a complimentary metal oxide semiconductor (âCMOSâ) sensor, a comparator and random access memory (e. g. , ferroelectric random access memory). The Gray Code generator is started at the beginning of capture mode and begins providing a sequence of code words. Within each pixel, an output of a CMOS sensor is compared to a threshold, and a code word in the sequence is stored in random access memory when the sensor output crosses the threshold. Thus, the random access memory of each pixel stores a code word that represents the intensity of light detected by its associated CMOS sensor.
Local Oxidation Of A Sidewall Sealed Shallow Trench For Providing Isolation Between Devices Of A Substrate
Min Cao - Mountain View CA Paul J. Vande Voorde - San Mateo CA Wayne M. Greene - Los Gatos CA Malahat Tavassoli - Los Altos CA
Assignee:
Agilent Technologies, Inc. - Palo Alto CA
International Classification:
H01L 2900
US Classification:
257510, 257513
Abstract:
A semiconductor isolation structure. The semiconductor isolation structure includes a substrate. A first device and a second device are formed within the substrate. An isolation region is formed within the substrate between the first device and the second device. The isolation region includes a deep region which extends into the substrate. The deep region includes a deep region cross-sectional area. A shallow region extends to the surface of the substrate. The shallow region includes a shallow region cross-sectional area. The deep region cross-sectional area is greater than the shallow region cross-sectional area. For an alternate embodiment, the deep region includes an oxide and the shallow region includes a protective wall. The protective wall can be formed from an oxide and a nitride.
System And Method For Determining A Subset Of Transactions Of A Computing System For Use In Determing Resource Costs
Ludmila Cherkasova - Fort Collins CO, US Qi Zhang - Fort Collins CO, US Guy Mathews - Fort Collins CO, US Wayne Greene - Fort Collins CO, US
Assignee:
Hewlett-Packard Development Company, L.P. - Houston TX
International Classification:
G06F 15/16 G06F 15/173 G06F 9/46
US Classification:
709226, 709205, 718104
Abstract:
A method comprises receiving a representative workload of a computing system, where the representative workload comprises a plurality of composite transactions. In certain embodiments, the representative workload is a historical workload of a computing system. In general, a composite transaction refers to a transaction that comprises a plurality of embedded transactions. The method further comprises determining a subset of the plurality of composite transactions for which a corresponding resource cost is to be determined; and determining, based at least in part on a statistical regression-based analysis, a resource cost for the composite transaction(s) in the determined subset, where the resource cost reflects an amount of utilization of at least one resource of the computing system in serving the composite transaction(s).
Regression-Based System And Method For Determining Resource Costs For Composite Transactions
Ludmila Cherkasova - Fort Collins CO, US Qi Zhang - Fort Collins CO, US Guy Mathews - Fort Collins CO, US Wayne Greene - Fort Collins CO, US
Assignee:
Hewlett-Packard Development Company, L.P. - Houston TX
International Classification:
G06F 15/16
US Classification:
709203
Abstract:
A method comprises receiving a representative workload of a computing system, where the representative workload comprises at least one composite transaction. In certain embodiments, the representative workload is a historical workload of a computing system. In general, a composite transaction refers to a transaction that comprises a plurality of transactions. For instance, a given transaction for serving a client's request for information (e. g. , a web page) may include embedded therein a plurality of requests/responses for objects (e. g. , images, etc. ) that form the information (e. g. , that form the requested web page). The method further comprises determining, based at least in part on a statistical regression-based analysis, a resource cost for the at least one composite transaction, where the resource cost reflects an amount of utilization of at least one resource of the computing system, such as CPU utilization, in serving the at least one composite transaction.
System And Method For Capacity Planning For Computing Systems
Ludmila Cherkasova - Fort Collins CO, US Qi Zhang - Fort Collins CO, US Guy Mathews - Fort Collins CO, US Wayne Greene - Fort Collins CO, US
International Classification:
G06F 9/46
US Classification:
705 7, 718105
Abstract:
A method comprises receiving, by a workload profiler, a representative workload of a computing system under analysis. The workload profiler determines a workload profile of the computing system that reflects a transaction mix that varies over times. A capacity analyzer receives the workload profile, and determines a maximum capacity of the computing system under analysis for serving the workload profile while satisfying a defined quality of service (QoS) target.
Arrangement For Growing A Thin Dielectric Layer On A Semiconductor Wafer At Low Temperatures
Wayne M. Greene - Los Gatos CA Michael B. Cox - Los Gatos CA Frank Perlaki - Palo Alto CA Elizabeth C. Carr - Sunnyvale CA
Assignee:
Hewlett-Packard Co. - Palo Alto CA
International Classification:
C23C 1602 C23C 1646 C23C 1622
US Classification:
4272481
Abstract:
A process of growing a dielectric layer includes a step of heating a gas mixture of at least one gas having a first chemical element of oxygen and a second chemical element other than oxygen to a first predetermined temperature to produce reactive precursors of the gas mixture. The reactive precursors are then introduced into a reaction chamber that houses at least one wafer to grow the dielectric layer on the wafer within the reaction chamber at a second predetermined temperature below the first predetermined temperature. A semiconductor manufacturing apparatus of growing the dielectric layer is also described.
Conductive Guard Rings For Elevated Active Pixel Sensors
Min Cao - Mountain View CA Wayne M. Greene - Los Gatos CA Dietrich W. Vook - Menlo Park CA
Assignee:
Agilent Technologies, Inc. - Palo Alto CA
International Classification:
H01L 310376 H01L 310226 H01L 31075 H01L 310232
US Classification:
257444
Abstract:
An array of active pixel sensors. The array of active pixel sensors includes a substrate that includes electronic circuitry. An interconnect structure is formed adjacent to the substrate. The interconnect structure includes a plurality of conductive vias. A plurality of conductive guard rings are formed adjacent to the interconnect structure. Each conductive guard ring is electrically connected to the substrate through at least one of the conductive vias. A plurality of photo diode sensors are formed adjacent to the interconnect structure. Each photo diode sensor is surrounded by at least one of the conductive guard rings. Each photo diode sensor includes a pixel electrode. The pixel electrode is electrically connected to the substrate through a corresponding conductive via. An I-layer is formed adjacent to the pixel electrode. The array of active pixel sensors further includes a transparent conductive layer formed adjacent to the photo diode sensors.
Elevated Pin Diode Active Pixel Sensor Which Includes A Patterned Doped Semiconductor Electrode
Jeremy A. Theil - Mountain View CA Min Cao - Mountain View CA Dietrich W. Vook - Menlo Park CA Frederick A. Perner - Palo Alto CA Xin Sun - San Jose CA Shawming Ma - Sunnyvale CA Gary W. Ray - Mountain View CA Wayne M. Greene - Los Gatos CA Kit M. Cham - Cupertino CA Steven A. Lupi - Gilroy CA
Assignee:
Agilent Technologies - Palo Alto CA
International Classification:
H01L 2714 H01L 3100
US Classification:
257458
Abstract:
An active pixel sensor. The active pixel sensor includes a substrate, an interconnect structure adjacent to the substrate, and at least one photo sensor adjacent to the interconnect structure. At least one photo sensor is formed adjacent to the interconnect structure. Each photo sensor includes a pixel electrode which includes a patterned doped semiconductor layer. An I-layer is formed adjacent to the patterned doped semiconductor layer. A transparent electrode is formed adjacent to the I-layer. A method of forming the active pixel sensor includes forming an interconnect structure over a substrate. Next, a doped semiconductor layer is deposited over the interconnect structure. The doped semiconductor layer is etched forming pixel electrode. An I-layer is deposited over the pixel electrodes. Finally, a transparent conductive layer is deposited over the I-layer.
Spanish Public School Spanish Morocco 1974-1977, Central Spryfield Elementary School Halifax Swaziland 1975-1985, Eaket High School Blind River Morocco 1978-1981
Youtube
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Open Stage 8/22/11 - Wayne Greene
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