Wei Zhang

US Patent:

7050233, May 23, 2006

Filed:

Aug 1, 2003

Appl. No.:

10/633372

Inventors:

Anguel Nikolov - Bridewater NJ, US
Wang Wang - Orefield PA, US
Xuegong Deng - Piscataway NJ, US
Wei Zhang - Plainsboro NJ, US
Greg Blonder - Summit NJ, US

Assignee:

NanoOpto Corporation - Somerset NJ

International Classification:

G02B 27/28
G02B 5/30

US Classification:

359494, 359483, 359352, 349201

Abstract:

A birefringent device of substantially uniform thickness less than about 10 microns, and being suitable for operating in a wavelength range about a central wavelength is disclosed. The device includes a base substrate, a layer of periodic index regions of alternating refractive indices applied to a first surface of the base substrate, and a cap substrate located substantially adjacent to the layer distal to the base substrate. The layer of periodic index regions has a periodicity of less than the central wavelength. The device being suitable to produce an arbitrary phase retardation between 0 and 2Π phase.

US Patent:

7635262, Dec 22, 2009

Filed:

Aug 8, 2003

Appl. No.:

10/637838

Inventors:

Stephen Y. Chou - Princeton NJ, US
Hua Tan - Princeton NJ, US
Wei Zhang - Princeton NJ, US

Assignee:

Princeton University - Princeton NJ

International Classification:

B29C 59/02

US Classification:

425385, 4253871, 425389, 425149, 425150

Abstract:

Improved apparatus for imprint lithography involves using direct fluid pressure to press a mold into a substrate-supported film. Advantageously the mold and/or substrate are sufficiently flexible to provide wide area contact under the fluid pressure. Fluid pressing can be accomplished by sealing the mold against the film and disposing the resulting assembly in a pressurized chamber. The result of this fluid pressing is enhanced resolution and high uniformity over an enlarged area.

US Patent:

7881928, Feb 1, 2011

Filed:

Mar 1, 2007

Appl. No.:

11/680863

Inventors:

Yuqing Gao - Mount Kisco NY, US
Liang Gu - Yorktown Heights NY, US
Wei Zhang - Ossining NY, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G10L 15/00

US Classification:

704231, 704 9, 704251, 704 2, 704 8, 704 3, 704 4, 704246, 704255, 704270, 704275

Abstract:

Techniques for enhanced linguistic transformation are disclosed. For example, a method of linguistic transformation includes the steps of providing at least one input to a plurality of modules, wherein at least one module has a different configuration than at least another module, obtaining at least one output from each of at least a subset of the plurality of modules, and generating a set of distinct outputs. The input and the output include linguistic representations and at least a portion of the output is a result of applying one or more linguistic transformations to at least a portion of the input. Techniques for displaying a plurality of results so as to emphasize component-level differences are also disclosed. By way of example, a method of displaying a plurality of results includes the steps of determining at least one primary result within the plurality of results; displaying the at least one primary result with at least a first set of color attributes; and displaying at least one alternative result with at least a second set of color attributes. Each result represents an application of at least one linguistic transformation to a common input and each result comprises a plurality of components.

US Patent:

7887739, Feb 15, 2011

Filed:

Oct 30, 2007

Appl. No.:

11/928844

Inventors:

Stephen Y. Chou - Princeton NJ, US
Wei Zhang - Newtown PA, US

International Classification:

B29C 43/36
B29C 43/56

US Classification:

264402, 264479, 264480, 264320, 425 3, 425174, 425406

Abstract:

An improved method of imprint lithography involves using fluid-induced pressure from electric or magnetic fields to press a mold onto a substrate having a moldable surface. In essence, the method comprises the steps of providing a substrate having a moldable surface, providing a mold having a molding surface and pressing the molding surface and the moldable surface together by electric or magnetic fields to imprint the molding surface onto the moldable surface. The molding surface advantageously comprises a plurality of projecting features of nanoscale extent or separation, but the molding surface can also be a smooth planar surface, as for planarization. The improved method can be practiced without mechanical presses and without sealing the region between the mold and the substrate.

US Patent:

7940971, May 10, 2011

Filed:

Jul 18, 2007

Appl. No.:

11/779405

Inventors:

Wei Zhang - Plainsboro NJ, US
Adrian Barbu - Tallahassee FL, US
Simone Prummer - Neunkirchen am Brand, DE
Martin Ostermeier - Buckenhof, DE
Chandan K. Reddy - Troy MI, US
Dorin Comaniciu - Princeton Junction NJ, US

Assignee:

Siemens Medical Solutions USA, Inc. - Malvern PA

International Classification:

G06K 9/00

US Classification:

382128, 128922, 378 4

Abstract:

A method and system for extracting motion-based layers from fluoroscopic image sequences are disclosed. Portions of multiple objects, such as anatomical structures, are detected in the fluoroscopic images. Motion of the objects is estimated between the images is the sequence of fluoroscopic images. The images in the fluoroscopic image sequence are then divided into layers based on the estimated motion. In a particular implementation, the coronary vessel tree and the diaphragm can be extracted in separate motion layers from coronary angiograph fluoroscopic image sequence.

US Patent:

7953590, May 31, 2011

Filed:

Oct 2, 2007

Appl. No.:

11/865877

Inventors:

Yuqing Gao - Mount Kisco NY, US
Liang Gu - Yorktown Heights NY, US
Wei Zhang - Ossining NY, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G06F 17/28
G10L 15/00
G10L 13/00

US Classification:

704 2, 704231, 704258

Abstract:

A system and method for speech-to-speech translation using a translation system includes designating separate input channels for each of a plurality of speakers. In response to speech from a first channel in a first language, the speech from the first channel is translated to a second language, and in response to speech from the second channel in a second language, the speech from the second channel is translated to the first language. Translating the speech from the first channel and translating the speech from the second channel are performed concurrently.

US Patent:

8019591, Sep 13, 2011

Filed:

Oct 2, 2007

Appl. No.:

11/865871

Inventors:

Yuqing Gao - Mount Kisco NY, US
Liang Gu - Yorktown Heights NY, US
Wei Zhang - Ossining NY, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G10L 15/00

US Classification:

704 8, 704251, 454157, 454185

Abstract:

A system and method for automatic user training in speech-to-speech translation includes integrating an automatic user response system configured to be responsive to a plurality of training items and selecting a training item from the plurality of training items. For the selected training item, in response to an utterance in a first language, the utterance is translated into a second language, and a response to the utterance in the second language is generated. A simulated action corresponding with the response in accordance with a user speaking the second language is also generated. The response and simulated action are output as a learning exercise for learning operations of the automatic user response system.

US Patent:

8025829, Sep 27, 2011

Filed:

Nov 27, 2007

Appl. No.:

11/945407

Inventors:

Wei Zhang - Plainsboro NJ, US
Hua Tan - Princeton Junction NJ, US
Lin Hu - Livingston NJ, US
Stephen Y. Chou - Princeton NJ, US

Assignee:

Nanonex Corporation - Monmouth Junction NJ

International Classification:

B29C 59/02

US Classification:

264293, 264294, 264319, 977887

Abstract:

In accordance with the invention, step-and-repeat imprint lithography is effected by applying balanced pressing forces from both sides of a substrate. The pressing forces are substantially equal in amplitude and opposite in direction. With the pressing forces thus balanced, the fixture that steps and holds the substrate does not bear the load of imprinting. The balance allows use of a high resolution aligning stage to carry the substrate and to maintain high accuracy of positioning without being shifted by change of load. With this method, sufficient imprint pressure can be used to obtain high quality patterning, a thin and uniform residual layer, and a high fidelity pattern.