William J Guthrie

Address:

5727 Holly Hl Cir, Dallas, TX 75231

VIN:

1J8GA69197L148952

Make:

JEEP

Model:

WRANGLER UNLIMITED

Year:

2007

US Patent:

6823294, Nov 23, 2004

Filed:

Jul 20, 1999

Appl. No.:

09/357084

Inventors:

William E. Guthrie - Santa Clara CA

Assignee:

Collett International, Inc. - Santa Clara CA

International Classification:

G06F 1750

US Classification:

703 2, 703 6, 703 20, 700 95, 700182, 702182

Abstract:

A method is provided for quantifying circuit design complexity. Conclusions regarding the time and effort to implement a circuit design are thereby derived and historical and predictive analyses prepared. Common circuit design parameters are determined using a computer-implemented Normalization Method. In the Normalization Method, the effort required to implement circuitry is quantified by evaluating each one of a set of complexity factors. The total transistor count of a circuit is then adjusted according to these complexity factors to produce a ânormalized transistorâ count. Design characteristics or factors that influence complexity are identified from among raw data in a database of integrated circuit design project data. These factors are then incorporated into a Normalization Equation such that normalized transistor count is a statistically significant predictor of required design project effort. An identified design characteristic is expressed mathematically as either a composition term or a figure of merit term.

US Patent:

6910944, Jun 28, 2005

Filed:

May 22, 2001

Appl. No.:

09/863118

Inventors:

Manoocher Birang - Los Gatos CA, US
Allan Gleason - San Jose CA, US
William L. Guthrie - Saratoga CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

B24B049/00

US Classification:

451 6, 451285, 451286, 451287, 451288, 451289, 451490, 451539

Abstract:

The polishing pad for a chemical mechanical polishing apparatus, and a method of making the same. The polishing pad has a covering layer with a polishing surface and a backing layer which is adjacent to the platen. A first opening in the covering layer with a first cross-sectional area and a second opening in the backing layer with a second, different cross-sectional area form an aperture through the polishing pad. A substantially transparent polyurethane plug is positioned in the aperture, and an adhesive material fixes the plug in the aperture.

US Patent:

7011565, Mar 14, 2006

Filed:

Apr 1, 2003

Appl. No.:

10/405421

Inventors:

Manoocher Birang - Los Gatos CA, US
Allan Gleason - San Jose CA, US
William L. Guthrie - Saratoga CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

B24B 49/00

US Classification:

451 6, 451526, 451285

Abstract:

The polishing pad for a chemical mechanical polishing apparatus, and a method of making the same. The polishing pad has a covering layer with a polishing surface and a backing layer which is adjacent to the platen. A first opening in the covering layer with a first cross-sectional area and a second opening in the backing layer with a second, different cross-sectional area form an aperture through the polishing pad. A substantially transparent polyurethane plug is positioned in the aperture, and an adhesive material fixes the plug in the aperture.

US Patent:

7118450, Oct 10, 2006

Filed:

Sep 12, 2005

Appl. No.:

11/225838

Inventors:

Manoocher Birang - Los Gatos CA, US
Allan Gleason - San Jose CA, US
William L. Guthrie - Saratoga CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

B24B 49/00
B24B 51/00

US Classification:

451 6, 451 5

Abstract:

The polishing pad for a chemical mechanical polishing apparatus, and a method of making the same. The polishing pad has a covering layer with a polishing surface and a backing layer which is adjacent to the platen. A first opening in the covering layer with a first cross-sectional area and a second opening in the backing layer with a second, different cross-sectional area form an aperture through the polishing pad. A substantially transparent polyurethane plug is positioned in the aperture, and an adhesive material fixes the plug in the aperture.

US Patent:

7255629, Aug 14, 2007

Filed:

Sep 15, 2006

Appl. No.:

11/532498

Inventors:

Manoocher Birang - Los Gatos CA, US
Allan Gleason - San Jose CA, US
William L. Guthrie - Saratoga CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

B24B 49/00

US Classification:

451 6, 451 41, 451287

Abstract:

The polishing pad for a chemical mechanical polishing apparatus, and a method of making the same. The polishing pad has a covering layer with a polishing surface and a backing layer which is adjacent to the platen. A first opening in the covering layer with a first cross-sectional area and a second opening in the backing layer with a second, different cross-sectional area form an aperture through the polishing pad. A substantially transparent polyurethane plug is positioned in the aperture, and an adhesive material fixes the plug in the aperture.

US Patent:

8364992, Jan 29, 2013

Filed:

Nov 25, 2008

Appl. No.:

12/323072

Inventors:

William Guthrie - San Jose CA, US
Nyles Heise - San Jose CA, US
Hung M. Vu - Fremont CA, US

Assignee:

HGST, Netherlands B.V. - Amsterdam

International Classification:

G06F 1/26
G06F 12/00

US Classification:

713320, 713300, 713310, 711111, 711112, 711151, 711152

Abstract:

A system and method for providing a command queue selection scheme by selecting commands by giving preference to commands based on the power consumption characteristics the command. In one embodiment the selection scheme involves calculating the value of the cost of energy saving associated with the access of a command by an evaluation function Costi=EAT+C×F1 (seek distance, latency). C is a dynamically adjustable power control function that determines how much power decreases with the selection of a particular command and F1 is a functional calculation of the power consumption value associated with the particular command. In one embodiment commands with low power consumption will be accessed in preference to commands with shorter seek distance.

US Patent:

20020162250, Nov 7, 2002

Filed:

Apr 30, 2002

Appl. No.:

10/136770

Inventors:

Todd Campbell - Petaluma CA, US
Russell Davis - Greenbrae CA, US
William Guthrie - Fairfax CA, US

International Classification:

A43B007/14

US Classification:

036/166000, 036/173000, 036/180000, 012/14600M

Abstract:

The invention provides a unitary orthotic insert for a shoe that comprises a cupped heel portion having a concave upper bearing surface and a midfoot portion having a medial longitudinal arch support with a curvilinear upper bearing surface. The cupped heel portion extends above a most posterior cephalad portion of a calcaneus and is continuously coupled to the midfoot portion.

US Patent:

20040103561, Jun 3, 2004

Filed:

Nov 24, 2003

Appl. No.:

10/722088

Inventors:

Todd Campbell - Petaluma CA, US
Russell Davis - Greenbrae CA, US
William Guthrie - Fairfax CA, US

International Classification:

A43B007/14
A61F005/14

US Classification:

036/088000, 036/092000, 036/155000

Abstract:

The invention provides an innersole system for an article of footwear, including an orthopedic intermediary support member and a user-selectable exchangeable innersole. The orthopedic intermediary support member includes a cupped heel portion having a concave upper bearing surface and a midfoot portion having a medial longitudinal arch support with a curvilinear upper bearing surface. The exchangeable innersole mates with the orthopedic intermediary support member to provide a user-selected orthopedic correction factor.