Karl Kissa - West Simsbury CT, US Gregory J. McBrien - Glastonbury CT, US Glen Drake - Windsor CT, US William J. Minford - Windsor CT, US
Assignee:
JDS Uniphase Corporation - Milpitas CA
International Classification:
G02F 1/035 G02F 1/03
US Classification:
359245, 385 2
Abstract:
The invention relates to an electro-optic modulator structure containing an additional set of bias electrodes buried within the device for applying bias to set the operating point. Thus the RF electrodes used to modulate incoming optical signals can be operated with zero DC bias, reducing electrode corrosion by electro-migration, galvanic, and other effects that can be present in non-hermetic packages. The RF electrodes are supported by a first surface of the electro-optic substrate, while the bias electrodes are supported by a second opposite surface.
Wafer Scale Method Of Manufacturing Optical Waveguide Devices And The Waveguide Devices Made Thereby
Benjamin F. Catching - Santa Rosa CA, US Donald M. Friedrich - Windsor CA, US Charles A. Hulse - Sebastopol CA, US Marc K. Von Gunten - Los Altos CA, US Jason Reed - West Hartford CT, US Karl Kissa - West Simsbury CT, US Glen Drake - Windsor CT, US Julia Duncan - North Granby CT, US William J. Minford - Windsor CT, US Hiren V. Shah - Santa Rosa CA, US Jerry Zieba - Santa Rosa CA, US Jason Jiazhan Xu - Weatogue CT, US
Assignee:
JDS Uniphase Corporation - Milpitas CA
International Classification:
G02B 6/10
US Classification:
385131
Abstract:
The invention relates to a wafer scale process for the manufacture of optical waveguide devices, and particularly for the manufacture of ridge waveguide devices, and the improved waveguides made thereby. The present invention has found a process for achieving sub-micron control of an optical waveguiding layer thickness by providing a dimensionally stable wafer assembly into which adhesive can be introduced without altering the planar relationship between a carrier wafer and an optically transmissive wafer in wafer scale manufacture. This process permits wafer scale manufacture of optical waveguide devices including thin optically transmissive layers. A pattern of spacer pedestals is created by a deposition and etch back, or by a surface etch process to precisely reference surface information from a master surface to a carrier wafer to a thin optically transmissive wafer. The tolerance achievable in accordance with this process provides consistent yield across the wafer.
Karl Kissa - West Simsbury CT, US William J. Minford - Windsor CT, US Jason Jiazhan Xu - Weatogue CT, US Glen Drake - Windsor CT, US
Assignee:
JDS Uniphase Corporation - Milpitas CA
International Classification:
G02F 1/295 G02B 6/12
US Classification:
385 8, 385 14
Abstract:
The invention relates to an electro-optic modulator structure containing an additional set of bias electrodes buried within the device for applying bias to set the operating point. Thus the RF electrodes used to modulate incoming optical signals can be operated with zero DC bias, reducing electrode corrosion by electro-migration and other effects that can be present in non-hermetic packages. The bias electrodes include an upper split portion and an optically transparent lower portion. The optically transparent lower layer improves modulation frequency and reduces optical loss.
Karl Kissa - West Simsbury CT, US William J. Minford - Windsor CT, US Glen Drake - Windsor CT, US
Assignee:
JDS Uniphase Corporation - Milpitas CA
International Classification:
G02B 6/42
US Classification:
385 40, 385 1, 385 2, 385 3, 385 4, 385 15
Abstract:
The invention relates to an electro-optic modulator structure containing an additional set of bias electrodes buried within the device for applying bias to set the operating point. Thus the RF electrodes used to modulate incoming optical signals can be operated with zero DC bias, reducing electrode corrosion by galvanic and other effects that can be present in non-hermetic packages. The bias electrodes are at least partially separated from the substrate with a buffer layer, which in one embodiment has a small amount of conductivity. This conductive buffer layer reduces optical loss from the bias electrodes and also reduces DC drift.
Semiconductor Device Having An Indium Doped Dielectric Layer Located Therein And A Method Of Manufacture Therefor
Julia Duncan - Mertztown PA, US William Minford - Northampton PA, US John Osenbach - Kutztown PA, US
Assignee:
Agere Systems Inc. - Allentown PA
International Classification:
H01L021/31 H01L021/469
US Classification:
438/783000, 438/778000
Abstract:
The present invention provides a semiconductor device, a method of manufacture therefor, and an integrated circuit including the semiconductor device. The semiconductor device includes a semiconductor substrate and an indium doped dielectric layer located over the semiconductor substrate.
Optical Devices Having Improved Temperature Stability
John William Osenbach - Kutztown PA William James Minford - Northampton PA Douglas A. Herr - Lancaster PA Henry Miles O'Bryan - Plainfield NJ Allan James Bruce - Scotch Plains NJ
Assignee:
Lucent Technologies, Inc. - Murray Hill NJ
International Classification:
G02B 2602
US Classification:
359238
Abstract:
Optical devices using non-centric crystals, such as lithium niobate, and methods for making and using the devices, are provided. The devices provide improved temperature stability as compared to conventional devices using non-centric crystals. The improved temperature stability is provided by etching the surface of a non-centric crystal to a depth of less than about 300 angstroms. The devices and methods of the invention reduce the magnitude of change in bias voltage required to maintain an optical crystal at a pre-selected operating point.
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