Xiao Yu Bai

US Patent:

20150371857, Dec 24, 2015

Filed:

Jun 23, 2014

Appl. No.:

14/312617

Inventors:

- Hsin-Chu, TW
Rekha PADMANABHAN - San Jose CA, US
Xiao BAI - Fremont CA, US
Gary N. CAI - Fremont CA, US
Ching-I LI - Tainan, TW
Ger-Pin LIN - Tainan, TW
Shao-Yu HU - Tainan, TW
David HOGLUND - Danvers MA, US
Robert E. KAIM - Danvers MA, US
Kourosh SAADATMAND - Danvers MA, US

International Classification:

H01L 21/265

Abstract:

In an exemplary process for lower dose rate ion implantation of a work piece, an ion beam may be generated using an ion source and an extraction manipulator. The extraction manipulator may be positioned at a gap distance from an exit aperture of the ion source. A current of the ion beam exiting the extraction manipulator may be maximized when the extraction manipulator is positioned at an optimal gap distance from the exit aperture. The gap distance at which the extraction manipulator is positioned from the exit aperture may differ from the optimal gap distance by at least 10 percent. A first potential may be applied to a first set of electrodes. An x-dimension of the ion beam may increase as the ion beam passes through the first set of electrodes. The work piece may be positioned in the ion beam to implant ions into the work piece.

US Patent:

20150056380, Feb 26, 2015

Filed:

Aug 23, 2013

Appl. No.:

13/975206

Inventors:

- Fremont CA, US
Xiao Bai - Fremont CA, US
Zhimin Wan - Sunnyvale CA, US
Peter M. Kopalidis - Fremont CA, US

Assignee:

ADVANCED ION BEAM TECHNOLOGY , INC. - Fremont CA

International Classification:

H01J 37/317

US Classification:

427523, 31511181

Abstract:

An ion source uses at least one induction coil to generate ac magnetic field to couple rf/VHF power into a plasma within a vessel, where the excitation coil may be a single set of turns each turn having lobes or multiple separate sets of windings. The excitation coil is positioned outside and proximate that side of the vessel that is opposite to the extraction slit, and elongated parallel to the length dimension of the extraction slit. The conducting shield(s) positioned outside or integrated with the well of the vessel are used to block the capacitive coupling to the plasma and/or to collect any rf/VHF current may be coupled into the plasma. The conducting shield positioned between the vessel and the coil set can either shield the plasma from capacitive coupling from the excitation coils, or be tuned to have a higher rf/VHF voltage to ignite or clean the source.