Xing Chen

US Patent:

6734967, May 11, 2004

Filed:

Feb 11, 1999

Appl. No.:

09/248876

Inventors:

Timothy R. Piwonka-Corle - Portland OR
Karen F. Scoffone - Redwood City CA
Xing Chen - San Jose CA
Jean-Louis Stehle - Colombes, FR
Dorian Zahorski - Vanves, FR
John-Pierre Rey - Fontenay Aux Roses, FR

Assignee:

KLA-Tencor Technologies Corporation - Milpitas CA

International Classification:

G01N 2121

US Classification:

356369

Abstract:

A method and system for spectroscopic ellipsometry employing reflective optics to measure a small region of a sample by reflecting radiation (preferably broadband UV, visible, and near infrared radiation) from the region. The system preferably has an autofocus assembly and a processor programmed to determine from the measurements the thickness and/or complex refractive index of a thin film on the sample. Preferably, only reflective optics are employed along the optical path between the polarizer and analyzer, a sample beam reflects with low incidence angle from each component of the reflective optics, the beam is reflectively focused to a small, compact spot on the sample at a range of high incidence angles, and an incidence angle selection element is provided for selecting for measurement only radiation reflected from the sample at a single, selected angle (or narrow range of angles). The focusing mirror preferably has an elliptical shape to reduce off-axis aberrations in the focused beam. Some embodiments include both a spectrophotometer and an ellipsometer integrated together as a single instrument.

US Patent:

6907167, Jun 14, 2005

Filed:

Jan 19, 2001

Appl. No.:

09/765544

Inventors:

Hwan J. Jeong - Los Altos CA, US
Xing Chen - San Jose CA, US

Assignee:

Gazillion Bits, Inc. - San Jose CA

International Classification:

G20B006/42

US Classification:

385 39, 385 24, 359497, 398 82

Abstract:

An optical interleaver is described, comprising a splitting element for splitting an incident beam into a first optical signal directed along a first path and a second optical signal directed along a second path, a first resonant element positioned along the first path, a second resonant element positioned along the second path, and a combining element positioned to receive and to interferometrically combine the outputs of the first and second resonant to produce the output signal. The optical interleaver may be implemented using a free-space configuration using a beamsplitter and a plurality of resonant cavities such as asymmetric Fabry-Perot resonators or Michelson-Gires-Tournois resonators. In an alternative preferred embodiment, the optical interleaver may be implemented in a Mach-Zender-style configuration using couplers and fiber ring resonators.

US Patent:

8003935, Aug 23, 2011

Filed:

Oct 10, 2007

Appl. No.:

11/869978

Inventors:

Timothy Roger Robinson - Burland, GB
Mark Attwood - Cupertino CA, US
Xing Chen - Lexington MA, US
William M. Holber - Winchester MA, US
Mark Philip Longson - Waterhouses, GB
Jonathan Henry Palk - Sandbach, GB
Ali Shajii - Canton MA, US
John A. Smith - North Andover MA, US

Assignee:

MKS Instruments, Inc. - Andover MA

International Classification:

H01J 49/26

US Classification:

250288, 250281, 250282, 250283, 250423 R, 250424

Abstract:

A system and methods are described for generating reagent ions and product ions for use in a quadruple mass spectrometry system. A microwave or high-frequency RF energy source ionizes particles of a reagent vapor to form reagent ions. The reagent ions enter a chamber, such as a drift chamber, to interact with a fluid sample. An electric field directs the reagent ions and facilitates an interaction with the fluid sample to form product ions. The reagent ions and product ions then exit the chamber under the influence of an electric field for detection by a quadruple mass spectrometer module. The system includes various control modules for setting values of system parameters and analysis modules for detection of mass values for ion species during spectrometry and faults within the system.

US Patent:

8003936, Aug 23, 2011

Filed:

Oct 10, 2007

Appl. No.:

11/869980

Inventors:

Timothy Roger Robinson - Burland, GB
Mark Attwood - Cupertino CA, US
Xing Chen - Lexington MA, US
William M. Holber - Winchester MA, US
Mark Philip Longson - Waterhouses, GB
Jonathan Henry Palk - Sandbach, GB
Ali Shajii - Canton MA, US
John A. Smith - North Andover MA, US

Assignee:

MKS Instruments, Inc. - Andover MA

International Classification:

H01J 49/26

US Classification:

250288, 250281, 250282, 250283, 250423 R, 250424

Abstract:

A system, components thereof, and methods are described for time-of-flight mass spectrometry. A microwave or high-frequency RF energy source is used to ionize a reagent vapor to form reagent ions. The reagent ions enter a chamber and interact with a fluid sample to form product ions. The reagent ions and product ions are directed to a time-of-flight mass spectrometer module for detection and determination of a mass value for the ions. The time-of-flight mass spectrometer module can include an optical system and an ion beam adjuster for focusing, interrupting, or altering a flow of reagent and product ions according to a specified pattern. The time-of-flight mass spectrometer module can include signal processing techniques to collect and analyze an acquired signal, for example, using statistical signal processing, such as maximum likelihood signal processing.

US Patent:

8334505, Dec 18, 2012

Filed:

Feb 6, 2008

Appl. No.:

12/026799

Inventors:

Timothy Roger Robinson - Burland, GB
Mark Attwood - Cupertino CA, US
Xing Chen - Lexington MA, US
William M. Holber - Winchester MA, US
Mark Philip Longson - Waterhouses, GB
Jonathan Henry Palk - Sandbach, GB
Ali Shajii - Canton MA, US
John A. Smith - North Andover MA, US

Assignee:

MKS Instruments, Inc. - Andover MA

International Classification:

H01J 49/26

US Classification:

250288, 250281, 250282, 250283, 250423 R, 250424

Abstract:

A system and methods are described for generating reagent ions and product ions for use in a mass spectrometry system. Applications for the system and method are also disclosed for detecting volatile organic compounds in trace concentrations. A microwave or high-frequency RF energy source ionizes particles of a reagent vapor to form reagent ions. The reagent ions enter a chamber, such as a drift chamber, to interact with a fluid sample. An electric field directs the reagent ions and facilitates an interaction with the fluid sample to form product ions. The reagent ions and product ions then exit the chamber under the influence of an electric field for detection by a mass spectrometer module. The system includes various control modules for setting values of system parameters and analysis modules for detection of mass and peak intensity values for ion species during spectrometry and faults within the system.

US Patent:

20040100632, May 27, 2004

Filed:

Nov 18, 2003

Appl. No.:

10/716805

Inventors:

Timothy Piwonka-Corle - Portland OR, US
Karen Scoffone - Redwood City CA, US
Xing Chen - San Jose CA, US
Lloyd Lacomb - Santa Clara CA, US
Jean-Louis Stehle - Colombes, FR
Dorian Zahorski - Vanves, FR
Jean-Pierre Rey - Fontenay Aux Roses, FR

International Classification:

G01J004/00

US Classification:

356/364000

Abstract:

A method and system for spectroscopic ellipsometry employing reflective optics to measure a small region of a sample by reflecting radiation (preferably broadband UV, visible, and near infrared radiation) from the region. The system preferably has an autofocus assembly and a processor programmed to determine from the measurements the thickness and/or complex refractive index of a thin film on the sample. Preferably, only reflective optics are employed along the optical path between the polarizer and analyzer, a sample beam reflects with low incidence angle from each component of the reflective optics, the beam is reflectively focused to a small, compact spot on the sample at a range of high incidence angles, and an incidence angle selection element is provided for selecting for measurement only radiation reflected from the sample at a single, selected angle (or narrow range of angles). The focusing mirror preferably has an elliptical shape to reduce off-axis aberrations in the focused beam. Some embodiments include both a spectrophotometer and an ellipsometer integrated together as a single instrument. In such instrument, the spectrophotometer and ellipsometer share a radiation source, and radiation from the source can be focused by either the spectrophotometer or the ellipsometer to the same focal point on a sample. Preferred embodiments of the ellipsometer employ a rotating, minimal-length Rochon prism as a polarizer, and include a spectrometer with an intensified photodiode array to measure reflected radiation from the sample, and a reference channel (in addition to a sample channel which detects radiation reflected from the sample).

US Patent:

20050105090, May 19, 2005

Filed:

Dec 7, 2004

Appl. No.:

11/007420

Inventors:

Timothy Piwonka-Corle - Portland OR, US
Karen Scoffone - Redwood City CA, US
Xing Chen - San Jose CA, US
Lloyd Lacomb - Santa Clara CA, US
Jean-Louis Stehle - Colombes, FR
Dorian Zahorski - Vanves, FR
John-Pierre Rey - Fontenay Aux Roses, FR

International Classification:

G01J004/00

US Classification:

356369000

Abstract:

A method and system for spectroscopic ellipsometry employing reflective optics to measure a small region of a sample by reflecting radiation (preferably broadband UV, visible, and near infrared radiation) from the region. The system preferably has an autofocus assembly and a processor programmed to determine from the measurements the thickness and/or complex refractive index of a thin film on the sample. Preferably, only reflective optics are employed along the optical path between the polarizer and analyzer, a sample beam reflects with low incidence angle from each component of the reflective optics, the beam is reflectively focused to a small, compact spot on the sample at a range of high incidence angles, and an incidence angle selection element is provided for selecting for measurement only radiation reflected from the sample at a single, selected angle (or narrow range of angles). The focusing mirror preferably has an elliptical shape to reduce off-axis aberrations in the focused beam. Some embodiments include both a spectrophotometer and an ellipsometer integrated together as a single instrument. In such instrument, the spectrophotometer and ellipsometer share a radiation source, and radiation from the source can be focused by either the spectrophotometer or the ellipsometer to the same focal point on a sample. Preferred embodiments of the ellipsometer employ a rotating, minimal-length Rochon prism as a polarizer, and include a spectrometer with an intensified photodiode array to measure reflected radiation from the sample, and a reference channel (in addition to a sample channel which detects radiation reflected from the sample).

US Patent:

57710945, Jun 23, 1998

Filed:

Jan 29, 1997

Appl. No.:

8/790090

Inventors:

Joseph Carter - San Jose CA
Jennming Chen - Campbell CA
Xing Chen - San Jose CA

Assignee:

Kla-Tencor Corporation - San Jose CA

International Classification:

G01J 336
G01N 2121

US Classification:

356326

Abstract:

The pixel position-to-wavelength calibration function of film measurement devices such as spectroscopic ellipsometers and spectroreflectometers may shift due to temperature and humidity changes and mechanical factors. One or more wavelength markers provided by the light source or reference sample may be used to correct the calibration function. The pixel positions of one or more persistent wavelength markers are noted during the calibration process and the current positions of such markers are again noted to account for shifts due to various factors to correct the calibration function.