Xing Lin (Chinese: ; pinyin: Xng Ln; born May 25, 1979 in Liaoning) is a female Chinese triathlete. Xing competed at the second Olympic triathlon at ...
Us Patents
Methods For Calibrating Rf Power Applied To A Plurality Of Rf Coils In A Plasma Processing System
Samer Banna - San Jose CA, US Valentin N. Todorow - Palo Alto CA, US Xing Lin - San Jose CA, US
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
H05B 31/26
US Classification:
31511121, 31511171, 700266
Abstract:
Methods for calibrating RF power applied to a plurality of RF coils are provided. In some embodiments, a method of calibrating RF power applied to a first and second RF coil of a process chamber having a power divider to control a first ratio equal to a first magnitude of RF power provided to the first RF coil divided by a second magnitude of RF power provided to the second RF coil, may include measuring a plurality of first ratios over a range of setpoint values of the power divider, comparing the plurality of measured first ratios to a plurality of reference first ratios, and adjusting an actual value of the power divider at a given setpoint value such that the first ratio of the power divider at the given setpoint matches the corresponding reference first ratio to within a first tolerance level.
Methods And Apparatus For Controlling Substrate Temperature In A Process Chamber
Xing Lin - San Jose CA, US Xiaoping Zhou - San Jose CA, US Valentin Todorow - Palo Alto CA, US Andrew Nguyen - San Jose CA, US Anchel Sheyner - San Francisco CA, US
Methods and apparatus for controlling the temperature of a substrate during processing are provided herein. In some embodiments, an apparatus for retaining and controlling substrate temperature may include a puck of dielectric material; an electrode disposed in the puck proximate a surface of the puck upon which a substrate is to be retained; and a plurality of heater elements disposed in the puck and arranged in concentric rings to provide independent temperature control zones.
XING LIN - San Jose CA, US XIAOPING ZHOU - San Jose CA, US ANDREW NGUYEN - San Jose CA, US ANCHEL SHEYNER - San Francisco CA, US
Assignee:
APPLIED MATERIALS, INC. - Santa Clara CA
International Classification:
C23F 1/08
US Classification:
15634554, 15634551
Abstract:
Apparatus for processing a substrate is disclosed herein. In some embodiments, a substrate support may include a substrate support having a support surface for supporting a substrate the substrate support having a central axis; a first electrode disposed within the substrate support to provide RF power to a substrate when disposed on the support surface; an inner conductor coupled to the first electrode about a center of a surface of the first electrode opposing the support surface, wherein the inner conductor is tubular and extends from the first electrode parallel to and about the central axis in a direction away from the support surface of the substrate support; an outer conductor disposed about the inner conductor; and an outer dielectric layer disposed between the inner and outer conductors, the outer dielectric layer electrically isolating the outer conductor from the inner conductor. The outer conductor may be coupled to electrical ground.
High Temperature Electrostatic Chuck With Real-Time Heat Zone Regulating Capability
Dmitry LUBOMIRSKY - Cupertino CA, US Jennifer Y. SUN - Mountain View CA, US Senh THACH - Union City CA, US Xing LIN - West Babylon NY, US Michael D. WILLWERTH - Campbell CA, US Konstantin MAKHRATCHEV - Fremont CA, US
International Classification:
H02N 13/00
US Classification:
15634551, 361234
Abstract:
Embodiments of the present invention provide electrostatic chucks for operating at elevated temperatures. One embodiment of the present invention provides a dielectric chuck body for an electrostatic chuck. The dielectric chuck body includes a substrate supporting plate having a top surface for receiving a substrate and a back surface opposing the top surface, an electrode embedded in the substrate supporting plate, and a shaft having a first end attached to the back surface of the substrate supporting plate and a second end opposing the first end. The second end is configured to contact a cooling base and provide temperature control to the substrate supporting plate. The shaft is hollow having a sidewall enclosing a central opening, and two or more channels formed through the sidewall and extending from the first end to the second end.
Methods For Dictionary-Based Compression And Devices Thereof
Methods, non-transitory machine readable media, and computing devices that provide improved dictionary-based compression are disclosed. With this technology, a first portion of an input data stream is compressed using a first dictionary. A second dictionary is trained when the first dictionary is determined to be stale. The dictionary can be determined to be stale based on a size of the input data stream compressed using the first dictionary or a compression ratio decreasing by a threshold, for example. The first dictionary can be stored with metadata associated with the compressed first portion of the input data stream. Accordingly, this technology improves compression ratios, eliminates the need for reference counting, and facilitates improved reclamation of orphan dictionaries, among other advantages.
Method And Apparatus Of Achieving High Input Impedance Without Using Ferrite Materials For Rf Filter Applications In Plasma
- Santa Clara CA, US Abdul Aziz Khaja - San Jose CA, US Amit Kumar Bansal - Milpitas CA, US Kwangduk Douglas Lee - Redwood City CA, US Xing Lin - San Jose CA, US Jianhua Zhou - Campbell CA, US Addepalli Sai Susmita - Bangalore, IN Juan Carlos Rocha-Alvarez - San Carlos CA, US
Implementations of the present disclosure generally relate to methods and apparatus for generating and controlling plasma, for example RF filters, used with plasma chambers. In one implementation, a plasma processing apparatus is provided. The plasma processing apparatus comprises a chamber body, a powered gas distribution manifold enclosing a processing volume and a radio frequency (RF) filter. A pedestal having a substrate-supporting surface is disposed in the processing volume. A heating assembly comprising one or more heating elements is disposed within the pedestal for controlling a temperature profile of the substrate-supporting surface. A tuning assembly comprising a tuning electrode is disposed within the pedestal between the one or more heating elements and the substrate-supporting surface. The RF filter comprises an air core inductor, wherein at least one of the heating elements, the tuning electrode, and the gas distribution manifold is electrically coupled to the RF filter.
Methods For Dictionary-Based Compression And Devices Thereof
Methods, non-transitory machine readable media, and computing devices that provide improved dictionary-based compression are disclosed. With this technology, a first portion of an input data stream is compressed using a first dictionary. A second dictionary is trained when the first dictionary is determined to be stale. The dictionary can be determined to be stale based on a size of the input data stream compressed using the first dictionary or a compression ratio decreasing by a threshold, for example. The first dictionary can be stored with metadata associated with the compressed first portion of the input data stream. Accordingly, this technology improves compression ratios, eliminates the need for reference counting, and facilitates improved reclamation of orphan dictionaries, among other advantages.
Electrostatic Chuck Having Properties For Optimal Thin Film Deposition Or Etch Processes
- Santa Clara CA, US Xing LIN - San Jose CA, US Juan Carlos ROCHA-ALVAREZ - San Carlos CA, US Chidambara A. RAMALINGAM - Fremont CA, US Ganesh BALASUBRAMANIAN - Sunnyvale CA, US Jianhua ZHOU - Campbell CA, US Jonathan J. STRAHLE - San Francisco CA, US
International Classification:
H01L 21/683 H01L 21/67
Abstract:
A heated support assembly is disclosed which includes a body comprising aluminum nitride doped with magnesium oxide having a volume resistivity of about 1×10Ω-cm at about 600 degrees Celsius, an electrode embedded in the body, and a heater mesh embedded in the body.