Yi Ju Chen

US Patent:

6726045, Apr 27, 2004

Filed:

Feb 21, 2003

Appl. No.:

10/372700

Inventors:

Kenneth Yimin Chen - Walnut CA 91789
Yi C. Chen - Walnut CA 91789

International Classification:

B65D 724

US Classification:

220 434, 220 433, 220485

Abstract:

The invention is an interlocking structure. It can be shipped in a low volume disassembled state. It is easily interlocked together, without tools or special skills, by the eventual user. The interlocked structure has uncommon rigidity and strength. Containers like dresser drawers, laundry baskets or waste paper baskets, shelters like dog houses and human shelters, or furniture like a portable fireplace can be interlocked together using a plurality of interconnecting rods and hooks. The abstract is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims. 37 CFR 1. 72(b).

US Patent:

7705018, Apr 27, 2010

Filed:

Mar 24, 2008

Appl. No.:

12/079322

Inventors:

Yi Chen - San Mateo CA, US
Timothy D. Cushing - Pacifica CA, US
Xiaolin Hao - Foster City CA, US
Xiao He - Foster City CA, US
Andreas Reichelt - Moorpark CA, US
Robert M. Rzasa - Ventura CA, US
Jennifer Seganish - Garwood NJ, US
Youngsook Shin - Emeryville CA, US
Dawei Zhang - Thousand Oaks CA, US

Assignee:

Amgen Inc. - Thousand Oaks CA

International Classification:

A61K 31/47

US Classification:

514314, 544333, 546167

Abstract:

Substituted bicyclic heteroaryls having the general formula.

US Patent:

7919498, Apr 5, 2011

Filed:

Mar 24, 2008

Appl. No.:

12/079281

Inventors:

Yi Chen - San Mateo CA, US
Timothy D. Cushing - Pacifica CA, US
Xiaolin Hao - Foster City CA, US
Xiao He - Foster City CA, US
Andreas Reichelt - Moorpark CA, US
Robert M. Rzasa - Ventura CA, US
Jennifer Seganish - Garwood NJ, US
Youngsook Shin - Emeryville CA, US
Dawei Zhang - Thousand Oaks CA, US

Assignee:

Amgen Inc. - Thousand Oaks CA

International Classification:

C07D 487/04
A61K 31/519
A61P 19/02
A61P 29/00

US Classification:

5142621, 544262, 544280, 5142651

Abstract:

Substituted bicyclic heteroaryls and compositions containing them, for the treatment of general inflammation, arthritis, rheumatic diseases, osteoarthritis, inflammatory bowel disorders, inflammatory eye disorders, inflammatory or unstable bladder disorders, psoriasis, skin complaints with inflammatory components, chronic inflammatory conditions, including but not restricted to autoimmune diseases such as systemic lupus erythematosis (SLE), myestenia gravis, rheumatoid arthritis, acute disseminated encephalomyelitis, idiopathic thrombocytopenic purpura, multiples sclerosis, Sjoegren's syndrome and autoimmune hemolytic anemia, allergic conditions including all forms of hypersensitivity, The present invention also enables methods for treating cancers that are mediated, dependent on or associated with p110δ activity, including but not restricted to leukemias, such as Acute Myeloid leukemia (AML) Myelodysplastic syndrome (MDS) myelo-proliferative diseases (MPD) Chronic Myeloid Leukemia (CML) T-cell Acute Lymphoblastic leukaemia (T-ALL) B-cell Acute Lymphoblastic leukaemia (B-ALL) Non Hodgkins Lymphoma (NHL) B-cell lymphoma and solid tumors, such as breast cancer.

US Patent:

8183258, May 22, 2012

Filed:

Jul 20, 2011

Appl. No.:

13/187135

Inventors:

Yi Chen - San Mateo CA, US
Timothy D. Cushing - Pacifica CA, US
Xiaolin Hao - Foster City CA, US
Xiao He - Foster City CA, US
Andreas Reichelt - Moorpark CA, US
Robert M. Rzasa - Ventura CA, US
Jennifer Seganish - Scotch Plains NJ, US
Youngsook Shin - Emeryville CA, US
Dawei Zhang - Thousand Oaks CA, US

Assignee:

Amgen Inc. - Thousand Oaks CA

International Classification:

A61K 31/47

US Classification:

514314

Abstract:

Substituted bicyclic heteroaryls and compositions containing them, for the treatment of general inflammation, arthritis, rheumatic diseases, osteoarthritis, inflammatory bowel disorders, inflammatory eye disorders, inflammatory or unstable bladder disorders, psoriasis, skin complaints with inflammatory components, chronic inflammatory conditions, including but not restricted to autoimmune diseases such as systemic lupus erythematosis (SLE), myestenia gravis, rheumatoid arthritis, acute disseminated encephalomyelitis, idiopathic thrombocytopenic purpura, multiples sclerosis, Sjoegren's syndrome and autoimmune hemolytic anemia, allergic conditions including all forms of hypersensitivity. The present invention also enables methods for treating cancers that are mediated, dependent on or associated with p110δ activity, including but not restricted to leukemias, such as Acute Myeloid leukaemia (AML) Myelo-dysplastic syndrome (MDS) myelo-proliferative diseases (MPD) Chronic Myeloid Leukemia (CML) T-cell Acute Lymphoblastic leukaemia (T-ALL) B-cell Acute Lymphoblastic leukaemia (B-ALL) Non Hodgkins Lymphoma (NHL) B-cell lymphoma and solid tumors, such as breast cancer.

US Patent:

8183259, May 22, 2012

Filed:

Jul 20, 2011

Appl. No.:

13/187154

Inventors:

Yi Chen - San Mateo CA, US
Timothy D. Cushing - Pacifica CA, US
Xiaolin Hao - Foster City CA, US
Xiao He - Foster City CA, US
Andreas Reichelt - Moorpark CA, US
Robert M. Rzasa - Ventura CA, US
Jennifer Seganish - Scotch Plains NJ, US
Youngsook Shin - Emeryville CA, US
Dawei Zhang - Thousand Oaks CA, US

Assignee:

Amgen Inc. - Thousand Oaks CA

International Classification:

A61K 31/47

US Classification:

514314

Abstract:

Substituted bicyclic heteroaryls and compositions containing them, for the treatment of general inflammation, arthritis, rheumatic diseases, osteoarthritis, inflammatory bowel disorders, inflammatory eye disorders, inflammatory or unstable bladder disorders, psoriasis, skin complaints with inflammatory components, chronic inflammatory conditions, including but not restricted to autoimmune diseases such as systemic lupus erythematosis (SLE), myestenia gravis, rheumatoid arthritis, acute disseminated encephalomyelitis, idiopathic thrombocytopenic purpura, multiples sclerosis, Sjoegren's syndrome and autoimmune hemolytic anemia, allergic conditions including all forms of hypersensitivity, The present invention also enables methods for treating cancers that are mediated, dependent on or associated with p110δ activity, including but not restricted to leukemias, such as Acute Myeloid leukaemia (AML) Myelo-dysplastic syndrome (MDS) myelo-proliferative diseases (MPD) Chronic Myeloid Leukemia (CML) T-cell Acute Lymphoblastic leukaemia (T-ALL) B-cell Acute Lymphoblastic leukaemia (B-ALL) Non Hodgkins Lymphoma (NHL) B-cell lymphoma and solid tumors, such as breast cancer.

US Patent:

8193199, Jun 5, 2012

Filed:

Mar 24, 2008

Appl. No.:

12/079406

Inventors:

Yi Chen - San Mateo CA, US
Timothy D. Cushing - Pacifica CA, US
Jason A. Duquette - Millbrae CA, US
Felix Gonzalez Lopez De Turiso - San Mateo CA, US
Xiaolin Hao - Foster City CA, US
Xiao He - Foster City CA, US
Brian Lucas - San Francisco CA, US
Lawrence R. McGee - Pacifica CA, US
Andreas Reichelt - Moorpark CA, US
Robert M. Rzasa - Ventura CA, US
Jennifer Seganish - Garwood NJ, US
Youngsook Shin - Emeryville CA, US
Dawei Zhang - Thousand Oaks CA, US

Assignee:

Amgen Inc. - Thousand Oaks CA

International Classification:

C07D 473/34
A61K 31/52
A61P 35/00
A61P 19/02
A61P 37/06
A61P 19/08
C07D 487/04
C07D 241/40
C07D 241/44
C07D 215/14
C07D 215/26
C07D 215/22
C07D 417/14
C07D 417/04

US Classification:

5142632, 51426322, 544265, 544277, 544278, 544280, 544353, 544354, 544356, 544119, 546119, 546167, 546168, 546173, 546175, 546180

Abstract:

Substituted bicyclic heteroaryls having the structures:.

US Patent:

8329910, Dec 11, 2012

Filed:

Jul 20, 2011

Appl. No.:

13/187188

Inventors:

Yi Chen - San Mateo CA, US
Timothy D. Cushing - Pacifica CA, US
Xiaolin Hao - Foster City CA, US
Xiao He - Foster City CA, US
Andreas Reichelt - Moorpark CA, US
Robert M. Rzasa - Ventura CA, US
Jennifer Seganish - Scotch Plains NJ, US
Youngsook Shin - Emeryville CA, US
Dawei Zhang - Thousand Oaks CA, US

Assignee:

Amgen Inc. - Thousand Oaks CA

International Classification:

C07D 215/12

US Classification:

546176

Abstract:

Substituted bicyclic heteroaryls and compositions containing them, for the treatment of general inflammation, arthritis, rheumatic diseases, osteoarthritis, inflammatory bowel disorders, inflammatory eye disorders, inflammatory or unstable bladder disorders, psoriasis, skin complaints with inflammatory components, chronic inflammatory conditions, including but not restricted to autoimmune diseases such as systemic lupus erythematosis (SLE), myestenia gravis, rheumatoid arthritis, acute disseminated encephalomyelitis, idiopathic thrombocytopenic purpura, multiples sclerosis, Sjoegren's syndrome and autoimmune hemolytic anemia, allergic conditions including all forms of hypersensitivity. The present invention also enables methods for treating cancers that are mediated, dependent on or associated with p110δ activity, including nut not restricted to leukemias, such as Acute Myeloid leukaemia (AML) Myelo-dysplastic syndrome (MDS) myelo-proliferative diseases (MPD) Chronic Myeloid Leukemia (CML) T-cell Acute Lymphoblastic leukaemia (T-ALL) B-cell Acute Lymphoblastic leukaemia (B-ALL) Non Hodgkins Lymphoma (NHL) B-cell lymphoma and solid tumors, such as breast cancer.

US Patent:

8337950, Dec 25, 2012

Filed:

May 24, 2010

Appl. No.:

12/786245

Inventors:

Victor Nguyen - Novato CA, US
Yi Chen - Sunnyvale CA, US
Mihaela Balseanu - Sunnyvale CA, US
Isabelita Roflox - Union City CA, US
Li-Qun Xia - Cupertino CA, US
Derek R Witty - Fremont CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

C23C 16/38
C23C 16/30

US Classification:

4272495, 42725538, 427255394, 4272557

Abstract:

Methods for processing a substrate with a boron rich film are provided. A patterned layer of boron rich material is deposited on a substrate and can be used as an etch stop. By varying the chemical composition, the selectivity and etch rate of the boron rich material can be optimized for different etch chemistries. The boron rich materials can be deposited over a layer stack substrate in multiple layers and etched in a pattern. The exposed layer stack can then be etched with multiple etch chemistries. Each of the boron rich layers can have a different chemical composition that is optimized for the multiple etch chemistries.