Yuji Yamaguchi

US Patent:

7332255, Feb 19, 2008

Filed:

May 7, 2004

Appl. No.:

10/841147

Inventors:

Yuji Yamaguchi - San Antonio TX, US
Pierre Leroux - San Antonio TX, US

Assignee:

NXP B.V. - Eindhoven

International Classification:

G03F 9/00
G01B 11/00
G01B 9/00
G06K 9/00
H01L 23/544

US Classification:

430 30, 430 22, 355 53, 355 77, 356399, 356400, 356401, 382149, 382151

Abstract:

The present invention enables the user to measure process line shortening (PLS) on an overlay tool. In an example embodiment (), to obtain the PLS, the user applies a method to determine the misalignment (MA) of a composite image on a substrate (), from the composite image the user may determine the total line () shortening (TLS) and the equipment line () shortening (ELS). The process line shortening (PLS) is determined () as a function of TLS and ELS.

US Patent:

7337552, Mar 4, 2008

Filed:

Aug 24, 2004

Appl. No.:

10/925745

Inventors:

Adlai H. Smith - Escondido CA, US
Bruce B. McArthur - San Diego CA, US
Thomas K. Khuu - San Diego CA, US
Yuji Yamaguchi - San Diego CA, US

Assignee:

Litel Instruments - San Diego CA

International Classification:

G01D 21/00
G03B 27/42

US Classification:

33645, 33297, 355 53

Abstract:

A method and apparatus for front to back substrate registration is described. Alignment characteristics of features on surfaces of substrates can be used to physically align substrates with a multiplicity of integrated alignment optics. Measurement of offsets of the integral alignment optics are used to compute registration data for use in calibration of the substrate global alignment.

US Patent:

7393619, Jul 1, 2008

Filed:

May 7, 2004

Appl. No.:

10/840922

Inventors:

Yuji Yamaguchi - San Antonio TX, US

International Classification:

G03F 9/00

US Classification:

430 30, 257 48, 257797, 382 53, 382 77

Abstract:

There is a structure and method for measuring the lengths of lines and spaces in semiconductor process. In an example embodiment, a lithographic structure () comprises, a frame (). The frame includes a top inside edge, a top outside edge, a bottom inside edge, a bottom outside edge, a left inside edge, a left outside edge, a right inside edge, and a right outside edge. There is a first array of lines () and spaces, the first array having end of lines () and end of spaces (). The lines have a first line width and the spaces have a first space width; the end of spaces are at a first distance () from the top outside edge of the frame (), the end of lines are at a second distance () from the top outside edge of the frame (). A first opening () is a third distance () from the bottom outside edge of the frame and a second opening () is a fourth distance () from the bottom outside edge of the frame.