Zhen Shun Lin

US Patent:

6942779, Sep 13, 2005

Filed:

May 2, 2002

Appl. No.:

10/137548

Inventors:

Brett Matthew Belongia - North Andover MA, US
Zhen Wu Lin - Burlington MA, US
John E. Pillion - Brookline NH, US

Assignee:

Mykrolis Corporation - Billerica MA

International Classification:

C25D021/06

US Classification:

205 98, 205 99, 205101, 210748, 210749, 210758, 210759, 210760, 210765, 210766, 210918

Abstract:

The present invention provides a system and method for selectively removing one or more organic and inorganic and also preferably one or more inorganic contaminants from plating baths. More particularly, the invented method relates to the use of a source of energy in combination with chemical oxidants, alone or in conjunction with a catalyst to oxidize organic contaminants in the plating bath to a level such that the electroplating bath can be recovered and reused after appropriate chemical adjustment. The oxidative treatment method may be a continuous process or a batch process that is performed in a single pass. Residual organics, if desired and chloride ions in the bath are removed from the solution by a chemisorption or physisorption treatment. Inorganic contaminants are removed from the electroplating bath by selective ion exchange resins or electrodialysis, while particulate and suspended colloidal particles are removed by filtration before the treated plating bath is recycled.

US Patent:

56163037, Apr 1, 1997

Filed:

Oct 11, 1994

Appl. No.:

8/321339

Inventors:

Leo A. Smolensky - Concord MA
S. Ronald Wysk - Stow MA
Zhen W. Lin - Acton MA

Assignee:

Gas Research Institute - Chicago IL

International Classification:

F27B 1508
B01J 800

US Classification:

422147

Abstract:

A combination reaction chamber and gas/solids separator is provided in a common reactor vessel. The reactor is capable of carrying out various types of gas/solids reactions within the reaction chamber and, contemporaneously, separates the gas from the particulate solids by way of a separator disposed within the reaction chamber. Gas exits the reaction chamber through an outlet disposed along a central axis of the chamber. Solids exit the chamber through an outlet disposed along the outer periphery of the chamber. The reactor provides improved mass transfer rates as well as selective residence times.

US Patent:

20200376649, Dec 3, 2020

Filed:

Feb 13, 2020

Appl. No.:

16/789752

Inventors:

- Somerville MA, US
Jianing LI - Somerville MA, US
Zhen LIN - Somerville MA, US
Max NEWLON - Somerville MA, US
Sicong SHAN - Somerville MA, US
Lawrence FRANCHINI - Somerville MA, US
Hung-chen YU - Somerville MA, US

International Classification:

B25J 1/02
B25J 3/04
G06F 3/01

Abstract:

The present disclosure provides a system and a method for manipulating a robotic device. The system includes a human interface device for obtaining information associated with a position and/or movement of a user's finger using the human interface device; and a robotic device for simulating the position and/or movement of the user's finger in real time. The robotic device is in communication with the human interface device. The operating system of the robotic device of the present disclosure can accurately simulate the functions of human hand.