Zhong M Xiang

US Patent:

7824844, Nov 2, 2010

Filed:

Jan 19, 2007

Appl. No.:

11/624744

Inventors:

Zhong Xiang - Edison NJ, US
Hengpeng Wu - Hillsborough NJ, US
Hong Zhuang - Raritan NJ, US
Eleazar Gonzalez - Bloomfield NJ, US
Mark O. Neisser - Whitehouse Station NJ, US

Assignee:

AZ Electronic Materials USA Corp. - Somerville NJ

International Classification:

G03F 7/40
G03F 7/30
G03F 7/11
C08F 8/30
H01L 21/027

US Classification:

430325, 430326, 430330, 4302711, 4302721, 430313, 430323, 528259, 525154, 522111, 522164, 522166

Abstract:

The invention relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least one primary organic solvent and at least one secondary organic solvent selected from any of structures 1, 2 and 3,.

US Patent:

20090042133, Feb 12, 2009

Filed:

Aug 10, 2007

Appl. No.:

11/836980

Inventors:

Zhong Xiang - Edison NJ, US
Jianhui Shan - Pennington NJ, US
Jian Yin - Bridgewater NJ, US
David Abdallah - Bernardsville NJ, US

International Classification:

G03C 1/04
C08F 283/04
G03C 5/29

US Classification:

4302861, 4302701, 430327, 525473, 525515, 525540

Abstract:

An antireflective coating composition which forms films with high n values is described.

US Patent:

6512087, Jan 28, 2003

Filed:

Oct 27, 2000

Appl. No.:

09/698724

Inventors:

Stanley F. Wanat - Scotch Plains NJ
M. Dalil Rahman - Flemington NJ
Zhong Xiang - Somerset NJ

Assignee:

Clariant Finance (BVI) Limited

International Classification:

C08F 604

US Classification:

528502D, 528129, 528148, 430192, 430193, 210634

Abstract:

Disclosed is a method for producing low molecular weight oligomers of a film forming resin, which involves: a) providing a solution of the film forming resin in a first solvent system comprising a photoresist solvent, and optionally a water-soluble organic solvent; b) providing a second solvent system comprising at least one substantially pure C -C alkane and/or at least one aromatic compound having at least one hydrocarbyl substituent and/or water/C -C alcohol mixture; and performing steps c)-e) in the following order: c) mixing the solutions from a) and second solvent system from b) in a static mixer for a time period sufficient for efficient mixing; d) feeding the mixture from c) and second solvent system from b) through two separate inlet ports into a liquid/liquid centrifuge, one of the inlet ports feeding the mixture from c), the second inlet port feeding the second solvent system from b) into said liquid/liquid centrifuge at a feed ratio of the mixture from c) to the second solvent system from b) of from about 10/90 to about 90/10, at a temperature of from about 0Â C. up to maximum temperature that is less than the boiling point of the lowest boiling solvent in the first or second solvent system; e) rotating the mixture from step d) inside the liquid/liquid centrifuge at a rotational speed sufficient to separate the mixture from step d) into two separate phases, and then collecting the two separate phases, each from two separate outlet ports, into two separate containers, wherein the heavier phase (H) comprises a fractionated film forming resin comprising higher molecular weight fractions of the film forming resin and the lighter phase (L) comprises low molecular weight oligomers of the film forming resin. The present invention also provides a method for producing a photoresist composition, and method for producing a microelectronic device using the aforementioned fractionated resin or low molecular weight oligomers of the film forming resin.