Christopher J Robinson

US Patent:

6573514, Jun 3, 2003

Filed:

May 25, 2001

Appl. No.:

09/864244

Inventors:

Michael S. Gordon - Lincolndale NY
Jon E. Lieberman - Hopewell Junction NY
Christopher F. Robinson - Hyde Park NY

Assignee:

Nikon Corporation - Tokyo

International Classification:

H01J 3700

US Classification:

2504911, 25049222

Abstract:

A method of aligning elements of an electron beam beam tool such as an electron beam projection lithography tool utilizes a detector such as a pinhole and scintillator over which an image is rastered to provide a real-time display of a projected image at a target plane. A shaping aperture is projected and the detector centered thereon. A reticle sub-field image is then centered on and aligned with the image of the shaping aperture and the compound image thus formed is rotated using deflectors. The compound image is then aligned with movement of a translation device at the target plane using lenses and compound image orientation is corrected by electrical or mechanical rotation of the deflectors. Sub-field size can then be adjusted and any observed further rotation of the compound image may be corrected by reiteration of rotation adjustment with lenses and deflectors, in sequence.

US Patent:

6639219, Oct 28, 2003

Filed:

Nov 9, 2001

Appl. No.:

10/045445

Inventors:

Rodney A. Kendall - Ridgefield CT
Christopher F. Robinson - Hyde Park NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G01N 2300

US Classification:

250311, 2504911

Abstract:

An electron beam system employs a non-saturating detector for measuring total beam current that comprises a thin membrane of only a few microns thickness placed before a detector and separated from the detector by a drift space of about 10 mm, so that electrons in the beam are not absorbed to any significant extent, but are scattered transversely to spread the beam and avoid local saturation of the detector.

US Patent:

62624253, Jul 17, 2001

Filed:

Mar 11, 1999

Appl. No.:

9/266335

Inventors:

Michael S. Gordon - Lincolndale NY
Paul F. Petric - Pleasanton CA
Christopher F. Robinson - Hyde Park NY
James Rockrohr - Hopewell Junction NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

H01J 37147

US Classification:

2504911

Abstract:

Keyhole shaped slit apertures, sized and oriented to define a desired deflected beam trajectory, such as a planar curvilinear trajectory, are provided for respective deflectors of a charged particle beam system. The beam is statically deflected to a maximum deflection using all deflectors above/prior to a particular slit aperture along the path of the charged particle beam and then scanned in directions orthogonal and parallel to the direction of static deflection while recording current of the charged particle beam intercepted by edges of each slit aperture, in sequence. Correction of deflector alignment and/or driver current (or voltage) is made based on recorded intercepted beam current. The sequence of correction is repeated for calibration, deflection/axis compensation, beam centering and deflection gain and axis compensation parameter adjustment.

US Patent:

59362529, Aug 10, 1999

Filed:

Sep 24, 1997

Appl. No.:

8/936353

Inventors:

Werner Stickel - Ridgefield CT
Christopher Frederick Robinson - Hyde Park NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

H01J 37304

US Classification:

25049223

Abstract:

A charged particle beam performance measurement system includes a charged particle beam generator device for producing a charged particle beam, a test reticle having at least two areas of higher transparency than its surroundings that form a pattern, a reduction projection imaging device, a reference target having an essentially identical pattern as the test reticle, and a beam current detector. A patterned beam is generated by passing the charged particle beam through the pattern areas of the test reticle. The patterned beam is reduced and projected by the reduction projection imaging device and the reduced patterned beam is imaged onto a reference target. The reduced patterned beam is then exposed to the reference target, wherein some of the beam may pass through reference target pattern areas. Beam current detector records and measures the amount of beam current that is absorbed on, back-scattered from, or transmitted by the target reference, and determines from the measured beam current the accuracy of the projection system.

US Patent:

57124884, Jan 27, 1998

Filed:

Oct 1, 1996

Appl. No.:

8/725665

Inventors:

Werner Stickel - Ridgefield CT
Christopher Frederick Robinson - Hyde Park NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

H01J 37304

US Classification:

25049223

Abstract:

A electron beam performance measurement system includes an electron beam generator device for producing an electron beam, a test reticle having a series of openings forming a pattern, a reduction projection imaging device, a reference target having an essentially identical pattern as the test reticle, and a beam current detector. A patterned beam is generated by passing the electron beam through the pattern openings of the test reticle. The patterned beam is reduced and projected by the reduction projection imaging device and the reduced patterned beam is imaged onto a reference target. The reduced patterned beam is then exposed to the reference target, wherein some of the beam may pass through reference target pattern openings. Beam current detector records and measures the amount of beam current that is absorbed on, back-scattered from, or transmitted by the target reference, and determines from the measured beam current the accuracy of the projection system.