Jesse Shan

US Patent:

6533907, Mar 18, 2003

Filed:

Jan 19, 2001

Appl. No.:

09/766463

Inventors:

Richard E. Demaray - Portola Valley CA
Jesse Shan - San Jose CA
Kai-An Wang - Cupertino CA
Ravi B. Mullapudi - San Jose CA

Assignee:

Symmorphix, Inc. - Sunnyvale CA

International Classification:

C23C 1434

US Classification:

20419225, 20419212

Abstract:

A specialized physical vapor deposition process provides dense amorphous semiconducting material with exceptionally smooth morphology. In particular, the process provides dense, smooth amorphous silicon useful as a hard mask for etching optical and semiconductor devices and as a high refractive index material in optical devices. DC sputtering of a planar target of intrinsic crystalline semiconducting material in the presence of a sputtering gas under a condition of uniform target erosion is used to deposit amorphous semiconducting material on a substrate. DC power that is modulated by AC power is applied to the target. The process provides dense, smooth amorphous silicon at high deposition rates. A method of patterning a material layer including forming a hard mask layer of amorphous silicon on a material layer according to the present DC sputtering process is also provided. The low average surface roughness of the amorphous silicon hard mask is reflected in the low average surface roughness of the sidewalls of the etched material layer.

US Patent:

7290407, Nov 6, 2007

Filed:

Dec 19, 2001

Appl. No.:

10/025002

Inventors:

Jesse Chienhua Shan - Los Altos CA, US

International Classification:

C03B 37/018

US Classification:

65386, 65390, 65391

Abstract:

A method for forming an optical waveguide is disclosed. The method comprises first forming a lower cladding layer having at least one waveguide support. Next, a core material is formed onto the waveguide support using a high density plasma chemical vapor deposition (HDPCVD) process. Finally, an upper cladding layer is formed over the core material, such that the upper cladding layer and the lower cladding layer surround the core material.