John M Conway

US Patent:

40088740, Feb 22, 1977

Filed:

Oct 23, 1974

Appl. No.:

5/517392

Inventors:

John W. Conway - Silver Spring MD

International Classification:

A01K 9710

US Classification:

248534

Abstract:

An attachment for a motorized cart comprising an adjustable bracket which may be mounted on suitable support arms which extend rearwardly of the cart. The bracket is adapted to retain an umbrella or like canopy in adjusted position so as to extend over the occupants of the cart and also over a storage area which is provided rearwardly of the seating area for the occupants of the cart.

US Patent:

50875370, Feb 11, 1992

Filed:

Oct 11, 1989

Appl. No.:

7/419860

Inventors:

John F. Conway - Sterling VA
Edward C. Fredericks - Manassas VA
Giorgio G. Via - McLean VA

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G03C 300

US Classification:

430 15

Abstract:

An apparatus and method for characterizing lithography imaging to quickly optimize a lithography process is described. The apparatus consists of two lithography masks for use with an optical stepper, ion-beam or x-ray lithography tool. The first mask is used for creating topography on the wafer substrate, and is patterned with groups of large elements arranged in orthogonal and angular directions. The second mask is used for defining a periodic pattern over the large elements. Preferably, the periodic pattern is in the same order of dimension as the critical element on the integrated circuit. A method is provided for characterizing lithography tools which do not have lithography masks such as an electron beam exposure tool.